Semiconductor Devices, Materials, and Processing - Cobalt Metallorganic Chemical Vapor Deposition and Formation of Epitaxial CoSi2 Layer on Si(100) Substrate (English)
- New search for: Rhee, H.S.
- New search for: Rhee, H.S.
- New search for: Ahn, B.T.
In:
Journal of the Electrochemical Society
;
146
, 7
; 2720-2724
;
1999
-
ISSN:
- Article (Journal) / Print
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Title:Semiconductor Devices, Materials, and Processing - Cobalt Metallorganic Chemical Vapor Deposition and Formation of Epitaxial CoSi2 Layer on Si(100) Substrate
-
Contributors:Rhee, H.S. ( author ) / Ahn, B.T.
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Published in:Journal of the Electrochemical Society ; 146, 7 ; 2720-2724
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Publisher:
- New search for: Electrochemical Society
-
Place of publication:Pennington, NJ
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Publication date:1999
-
ISSN:
-
ZDBID:
-
Type of media:Article (Journal)
-
Type of material:Print
-
Language:English
- New search for: 35.00 / 53.00 / 58.00
- Further information on Basic classification
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Keywords:
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Classification:
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Source:
Table of contents – Volume 146, Issue 7
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 2371
-
Charging/Discharging Stability of a Metal Hydride Battery ElectrodeGeng, M. / Han, J. / Feng, F. / Northwood, D. O. et al. | 1999
- 2371
-
Batteries and Energy Conversion - Charging-Discharging Stability of a Metal Hydride Battery ElectrodeGeng, M. et al. | 1999
- 2376
-
Batteries and Energy Conversion - Self-Discharge of the Nickel Electrode in the Presence of Hydrogen. I. Textural StudyEpée, N.Sac et al. | 1999
- 2376
-
Self-Discharge of the Nickel Electrode in the Presence of Hydrogen. I. Textural StudyEpee, N. S. / Beaudoin, B. / Pralong, V. / Jamin, T. / Tarascon, J.-M. / Delabaye-Vidal, A. et al. | 1999
- 2382
-
Batteries and Energy Conversion - Self-Discharge of the Nickel Electrode in the Presence of Hydrogen. II. Electrochemical ApproachPralong, V. et al. | 1999
- 2382
-
Self-discharge of the nickel electrode in presence of hydrogen. II. Electrochemical approachPralong, V. / Sac Epee, N. / Taunier, S. / Beaudoin, B. / Jamin, T. / Delahaye-Vidal, A. / Tarascon, J.M. et al. | 1999
- 2382
-
Self-Discharge of the Nickel Electrode in the Presence of Hydrogen. II. Electrochemical ApproachPralong, V. / Epee, N. S. / Taunier, S. / Beaudoin, B. / Jamin, T. / Delabaye-vidal, A. / Tarascon, J.-M. et al. | 1999
- 2387
-
Batteries and Energy Conversion - In Situ X-Ray Absorption Spectroscopy Characterization of V2O5 Xerogel Cathodes upon Lithium IntercalationGiorgetti, M. et al. | 1999
- 2387
-
In Situ X-Ray Absorption Spectroscopy Characterization of V~2O~5 Xerogel Cathodes upon Lithium IntercalationGiorgetti, M. / Passerini, S. / Smyrl, W. H. / Mukerjee, S. / Yang, X. Q. / McBreen, F. et al. | 1999
- 2393
-
Batteries and Energy Conversion - Poly(5-amino-1,4-naphthoquinone), a Novel Lithium-Inserting Electroactive Polymer with High Specific ChargeHäringer, D. et al. | 1999
- 2393
-
Poly(5-amino-1,4-naphthoquinone), a Novel Lithium-Inserting Electroactive Polymer with High Specific ChargeHaeringer, D. / Novak, P. / Haas, O. / Piro, B. / Pham, M.-C. et al. | 1999
- 2397
-
Physical Properties and Battery Performance of Novel Two-o-Phase Ion-Conducting GelsHikmet, R. A. M. / Peeters, M. P. J. / Lub, J. / Nijssen, W. et al. | 1999
- 2397
-
Batteries and Energy Conversion - Physical Properties and Battery Performance of Novel Two-Phase Ion-Conducting GelsHikmet, R.A.M. et al. | 1999
- 2404
-
Batteries and Energy Conversion - Structural Characterization of Layered LiMnO2 Electrodes by Electron Diffraction and lattice imagingShao-Horn, Y. et al. | 1999
- 2404
-
Structural Characterization of Layered LiMnO~2 Electrodes by Electron Diffraction and Lattice ImagingShao-Horn, Y. / Hackney, S. A. / Armstrong, A. R. / Bruce, P. G. / Gitzendanner, R. / Johnson, C. S. / Thackeray, M. M. et al. | 1999
- 2413
-
Batteries and Energy Conversion - Temperature and Current Distribution in Thin-Film BatteriesBaker, D.R. et al. | 1999
- 2413
-
Temperature and Current Distribution in Thin-Film BatteriesBaker, D. R. / Verbrugge, M. W. et al. | 1999
- 2425
-
Mixed (Oxygen Ion and n-Type) Conductivity and Structural Characterization of Titania-Doped Stabilized Tetragonal ZirconiaDurdn, P. / Capel, F. / Moure, C. / Gonzalez-Elipe, A. R. / Caballero, A. / Ba�ares, M. A. et al. | 1999
- 2425
-
Batteries and Energy Conversion - Mixed (Oxygen Ion and n-Type) Conductivity and Structural Characterization of Titania-Doped Stabilized Tetragonal ZirconiaDurán, P. et al. | 1999
- 2435
-
Batteries and Energy Conversion - Structural and Electrochemical Characterization of Glassy Carbon Prepared from Silicon-Doped Polymethacrylonitrile-Divinylbenzene CopolymerHayes, S.E. et al. | 1999
- 2435
-
Structural and Electrochemical Characterization of Glassy Carbon Prepared from Silicon-Doped Polymethacrylonitrile/Divinylbenzene CopolymerHayes, S. E. / Eckert, H. / Eren, W. R. / Guiddotti, R. et al. | 1999
- 2443
-
Batteries and Energy Conversion - Stage Transformation of Lithium-Graphite Intercalation Compounds Caused by Electrochemical Lithium IntercalationFunabiki, A. et al. | 1999
- 2443
-
Stage Transformation of Lithium-Graphite Intercalation Compounds Caused by Electrochemical Lithium IntercalationFunabiki, A. / Inaba, M. / Abe, T. / Ogumi, Z. et al. | 1999
- 2449
-
Complex Formation during Dissolution of Metal Oxides in Molten Alkali CarbonatesQingfeng, L. / Borup, E. / Petrushina, I. / Bjerrum, N. J. et al. | 1999
- 2449
-
Batteries and Energy Conversion - Complex Formation during Dissolution of Metal Oxides in Molten Alkali CarbonatesQingfeng, L. et al. | 1999
- 2455
-
Nanocrystalline Li~xMn~2~-~yO~4 Cathodes for Solid-State Thin-Film Rechargeable Lithium BatteriesDudney, N. J. / Bates, J. B. / Zuhr, R. A. / Young, S. / Robertson, J. D. / Jun, H. P. / Hackney, S. A. et al. | 1999
- 2455
-
Batteries and Energy Conversion - Nanocrystalline LixMn2-yO4 Cathodes for Solid-State Thin-Film Rechargeable Lithium BatteriesDudney, N.J. et al. | 1999
- 2465
-
Batteries and Energy Conversion - Cyclic Voltammetric Deposition of Hydrous Ruthenium Oxide for Electrochemical CapacitorsHu, C.-C. et al. | 1999
- 2465
-
Cyclic Voltammetric Deposition of Hydrous Ruthenium Oxide for Electrochemical CapacitorsHu, C.-C. / Huang, Y.-H. et al. | 1999
- 2472
-
High-Resolution Electron Microscopy Investigation of Capacity Fade in SnO~2 Electrodes for Lithium-Ion BatteriesRetoux, R. / Brousse, T. / Schleich, D. M. et al. | 1999
- 2472
-
Batteries and Energy Conversion - High-Resolution Electron Microscopy Investigation of Capacity Fade in SnO2 Electrodes for Lithium-Ion BatteriesReloux, R. et al. | 1999
- 2477
-
Evaluation of Raney-Nickel Cathodes Prepared with Aluminum Powder and Titanium Hydride PowderTanaka, S.-I. / Hirose, N. / Tanaki, T. et al. | 1999
- 2477
-
Batteries and Energy Conversion - Evaluation of Raney-Nickel Cathodes Prepared with Aluminum Powder and Titanium Hydride PowderTanaka, S.-i. et al. | 1999
- 2481
-
Batteries and Energy Conversion - Effect of the Steam-Methane Ratio on Reactions Occurring on Ni-Yttria-Stabilized Zirconia Cermet Anodes Used in Solid-Oxide Fuel CellsIbara, M. et al. | 1999
- 2481
-
Effect of the Steam-Methane Ratio on Reactions Occurring on Ni/Yttria-Stabilized Zirconia Cermet Anodes Used in Solid-Oxide Fuel CellsIbara, M. / Yokoyama, C. / Abudula, A. / Kato, R. / Komiyama, H. / Yamada, K. et al. | 1999
- 2488
-
Corrosion, Passivation, and Anodic Films - Coupled Partial Ion-Transfer Steps in the Anodic Dissolution of MetalsVanmaekelbergh, D. et al. | 1999
- 2488
-
Coupled Partial Ion-Transfer Steps in the Anodic Dissolution of MetalsVanmaekelbergh, D. / Erne, B. H. et al. | 1999
- 2495
-
Corrosion, Passivation, and Anodic Films - In Situ High-Resolution Photoclectrochemical Imaging of Precursor Sites for Pitting in Polycrystalline TitaniumGarfias-Mess, L.F. et al. | 1999
- 2495
-
In Situ High-Resolution Photoelectrochemical Imaging of Precursor Sites for Pitting in Polycrystalline TitaniumGarfias-Mesias, L. F. / Smyrl, W. H. et al. | 1999
- 2502
-
Development of Iron-Rich Layers during Anodic Oxidation of Sputter-Deposited Al-4 atom % Fe AlloyHabazaki, H. / Takahiro, K. / Yamaguchi, S. / Shimizu, K. / Skeldon, P. / Thompson, G. E. / Wood, G. C. et al. | 1999
- 2502
-
Corrosion, Passivation, and Anodic Films - Development of Iron-Rich Layers during Anodic Oxidation of Sputter-Deposited Al-4 atom % Fe AlloyHabazaki, H. et al. | 1999
- 2502
-
Electrochemical Synthesis and Engineering - Oxygen Reduction on Pyrolytic Graphite Electrodes Modified with Electropolymerized Cobalt Salen CompoundsOkada, T. et al. | 1999
- 2508
-
Corrosion, Passivation, and Anodic Films - Corrosion of 304 Stainless Steel in Molten-Carbonate Fuel CellsKeijzer, M. et al. | 1999
- 2508
-
Corrosion of 304 Stainless Steel in Molten-Carbonate Fuel CellsKeijzer, M. / Lindbergh, G. / Hemmes, K. / Van der Put, P. J. J. M. / Schoonman, J. / De Wit, J. H. W. et al. | 1999
- 2517
-
Electroless Gold Plating of 316L Stainless Steel BeadsLam, P. / Kumar, K. / Wnek, G. E. / Przybycien, T. M. et al. | 1999
- 2517
-
Electrochemical-Chemical Deposition and Etching - Electroless Gold Plating of 316L Stainless Steel BeadsLam, P. et al. | 1999
- 2522
-
Cyclic Electrodeposition of PbS Thin FilmsSaloniemi, H. / Ritala, M. / Leskelae, M. / Lappalainen, R. et al. | 1999
- 2522
-
Electrochemical-Chemical Deposition and Etching - Cyclic Electrodeposition of PbS Thin FilmsSaloniemi, H. et al. | 1999
- 2526
-
Electrochemical-Chemical Deposition and Etching - Through-Mask Electrochemical Micromachining of TitaniumMadore, C. et al. | 1999
- 2526
-
Through-Mask Electrochemical Micromachining of TitaniumMadore, C. / Piotrouski, O. / Landolt, D. et al. | 1999
- 2533
-
Barrier Characteristics of Chemical Vapor Deposited Amorphous-like Tungsten Silicide with In Situ Nitrogen Plasma TreatmentChang, K.-M. / Deng, I.-C. / Yeh, T.-H. / Shih, C.-W. et al. | 1999
- 2533
-
Electrochemical-Chemical Deposition and Etching - Barrier Characteristics of Chemical Vapor Deposited Amorphous-like Tungsten Silicide with In Situ Nitrogen Plasma TreatmentChang, K.-M. et al. | 1999
- 2540
-
Leveling and Microstructural Effects of Additives for Copper ElectrodepositionKelly, J. J. / Tian, C. / West, A. C. et al. | 1999
- 2540
-
Electrochemical-Chemical Deposition and Etching - Leveling and Microstructural Effects of Additives for Copper ElectrodepositionKelly, J.J. et al. | 1999
- 2546
-
Properties of CdSe Polycrystalline Thin Films Grown by Chemical BathLozada-Morales, R. / Rubin-Falfan, M. / Portillo-Moreno, O. / Perez-Alvarez, J. / Hoyos-Cabrera, R. / Avelino-Flores, C. / Zelaya-Angel, O. / Guzman-Mandujano, O. / Del Angel, P. / Martinez-montes, J. L. et al. | 1999
- 2546
-
Electrochemical-Chemical Deposition and Etching - Properties of CdSe Polycrystalline Thin Films Grown by Chemical BathLozada-Morales, R. et al. | 1999
- 2549
-
Electrochemical-Chemical Deposition and Etching - Underpotential Deposition and Adsorption of Lead on Gold Polycrystalline Electrodes. I. XPS and TOF-SIMS Investigations in 0.1 M NaCl ElectrolytesZeng, X. et al. | 1999
- 2549
-
Underpotential Deposition and Adsorption of Lead on Cold Polycrystalline Electrodes. I. XPS and TOF-SIMS Investigations in 0.1 M NaCl ElectrolytesZeng, X. / Bruckenstein, S. et al. | 1999
- 2555
-
Underpotential Deposition and Adsorption of Lead on Gold Polycrystalline Electrodes. II. EQCM Investigation in Acidic 0.1 M NaClO~4 and 0.1 M NaCl ElectrolytesZeng, X. / Bruckenstein, S. et al. | 1999
- 2555
-
Electrochemical-Chemical Deposition and Etching - Underpotential Deposition and Adsorption of Lead on Gold Polycrystalline Electrodes. II. EQCM Investigation in Acidic 0.1 M NaClO4 and 0.1 M NaCl ElectrolytesZeng, X. et al. | 1999
- 2562
-
Oxygen Reduction on Pyrolytic Graphite Electrodes Modified with Electropolymerized Cobalt Salen CompoundsOkada, T. / Katou, K. / Hirose, T. / Yuasa, M. / Sekine, I. et al. | 1999
- 2569
-
Electrochemical Synthesis and Engineering - Effect of Multivalent Cations upon Reduction of Nitrate Ions at the Ag ElectrodeFedurco, M. et al. | 1999
- 2569
-
Effect of Multivalent Cations upon Reduction of Nitrate Ions at the Ag ElectrodeFedurco, M. / Kedzierzawski, P. / Augustynski, J. et al. | 1999
- 2573
-
Themodynamic Properties for Rare Earths and Americium in Pyropartitioning Process SolventsFusselman, S. P. / Roy, J. J. / Grimmett, D. L. / Grantham, L. F. / Krueger, C. L. / Nabelek, C. R. / Storvick, T. S. / Inoue, T. / Hijikata, T. / Kinoshita, K. et al. | 1999
- 2573
-
Electrochemical Synthesis and Engineering - Thermodynamic Properties for Rare Earths and Americium in Pyropartitioning Process SolventsFusselman, S.P. et al. | 1999
- 2581
-
Electrochemical Synthesis and Engineering - Oxygen Permeability and Phase Transformation of Sr0.9Ca0.1CoO2.5+dMiura, N. et al. | 1999
- 2581
-
Oxygen Permeability and Phase Transformation of Sr~0~.~9Ca~0~.~1CoO~2~.~5~+Miura, N. / Murae, H. / Kusaba, H. / Tamaki, J. / Sakai, G. / Yamazoe, N. et al. | 1999
- 2587
-
Electrochemical Synthesis and Engineering - Development of Trickle-Bed Electrolyzer for On-Site Electrochemical Production of Hydrogen PeroxideYamada, N. et al. | 1999
- 2587
-
Development of Trickle-Bed Electrolyzer for On-Site Electrochemical Production of Hydrogen PeroxideYamada, N. / Yaguchui, T. / Otsuka, H. / Sudoh, M. et al. | 1999
- 2592
-
Physical and Analytical Electrochemistry - The Effect of Temperature on die Impedance of Poly-o-touluidine in 3.7 M H2SO4Florit, M.I. et al. | 1999
- 2592
-
The Effect of Temperature on the Impedance of Poly-o-touluidine in 3.7 M H~2SO~4Florit, M. I. / Posadas, D. / Molina, F. V. / Andrade, E. M. et al. | 1999
- 2598
-
Physical and Analytical Electrochemistry - Electrochemical Studies of the Automotive Lubricant Additive Zinc n-DibutyldithiophosphateJacob, S.R. et al. | 1999
- 2598
-
Electrochemical Studies of the Automotive Lubricant Additive Zinc n-DibutyldithiophosphateJacob, S. R. / Compton, R. G. et al. | 1999
- 2606
-
Physical and Analytical Electrochemistry - Simultaneous Determination of Chemical Diffusion and Surface Exchange Coetricients of Oxygen by the Potential Step TechniqueDiethelm, S. et al. | 1999
- 2606
-
Simultaneons Determination of Chemical Diffusion and Surface Exchange Coefficients of Oxygen by the Potential Step TechniqueDiethelm, S. / Closset, A. / Nisancioglu, K. / Van Berle, J. / McEvoy, A. J. / Guer, T. M. et al. | 1999
- 2613
-
Physical and Analytical Electrochemistry - A Theoretical Analysis of Chronoainperometric Electrochemical Ion IntercalationMattsson, M.Strømme et al. | 1999
- 2613
-
A Theoretical Analysis of Chronoamperometric Electrochemical Ion IntercalationMattsson, M. S. / Isidorsson, J. / Lindstroem, T. et al. | 1999
- 2616
-
Physical and Analytical Electrochemistry - Lithium Deposition on Polycrystalline Silver. A Comparison Between Electrochemical and Gas-Phase EnvironmentsLi, L.-F. et al. | 1999
- 2616
-
Lithium Deposition on Polycrystalline Silver. A Comparison Between Electrochemical and Gas-Phase EnvironmentsLi, L.-F. / Totir, D. A. / Gofer, Y. / Wang, K. / Chottiner, G. S. / Scherson, D. A. et al. | 1999
- 2620
-
Physical and Analytical Electrochemistry - Alkali Cation Diffusion in the Channel System of Hexagonal Nepheline (K,Na)Na3(Al3(Al,Si)Si4O16)Jiménez, R. et al. | 1999
- 2620
-
Alkali Cation Diffusion in the Channel System of Hexagonal Nepheline (K,Na,square)Na~3[Al~3(Al,Si)Si~4O~1~6]Jimenez, R. / Gregorkiewitz, M. et al. | 1999
- 2631
-
Characteristics of Commercial PMMA Sheets Used in the Fabrication of Extreme High-Aspect-Ratio MicrostructuresHenry, A. C. / McCarley, R. L. / Das, S. S. / Malek, C. G. K. et al. | 1999
- 2631
-
Dielectric Science and Materials - Characteristics of Commercial PMMA Sheets Used in the Fabrication of Extreme High-Aspect-Ratio MicrostructuresHenry, A.C. et al. | 1999
- 2637
-
Electrical characterization of interfacial reactions in ultrathin oxides during postmetallization annealRagnarsson, L.A. / Aderstedt, E. / Lundgren, P. et al. | 1999
- 2637
-
Dielectric Science and Materials - Electrical Characterization of Interfacial Reactions in Ultrathin Oxides during Postmetalization AnnealRagnarsson, L.-°A et al. | 1999
- 2637
-
Electrical Characterization of Interfacial Reactions in Ultrathin Oxides during Postmetalization AnnealRagnarsson, L.-A. / Aderstedt, E. / Lundgren, P. et al. | 1999
- 2643
-
Rapid Thermal Annealed Cr Barrier Against Cu DiffusionChuang, J.-C. / Tu, S.-L. / Chen, M.-C. et al. | 1999
- 2643
-
Semiconductor Devices, Materials, and Processing - Rapid Thermal Annealed Cr Barrier Against Cu DiffusionChuang, J.-C. et al. | 1999
- 2648
-
Dry Ex Situ Cleaning Processes for (0001)~S~i 6H-SiC SurfacesKing, S. W. / Nemanich, R. J. / Davis, R. F. et al. | 1999
- 2648
-
Semiconductor Devices, Materials, and Processing - Dry Ex Situ Cleaning Processes for (0001)Si 6H-SiC SurfacesKing, S.W. et al. | 1999
- 2652
-
Solid-Slate Nuclear Magnetic Resonance Spectroscopy of Low Dielectric Constant Films from Pulsed Hydrofluorocarbon PlasmasLau, K. K. S. / Gleason, K. K. et al. | 1999
- 2652
-
Semiconductor Devices, Materials, and Processing - Solid-State Nuclear Magnetic Resonance Spectroscopy of Low Dielectric Constant Films from Pulsed Hydrofluorocarbon PlasmasLau, K.K.S. et al. | 1999
- 2652
-
Solid-state nuclear magnetic resonance spectroscopy of low dielectric constant films from pulsed hydrofluorocarbon plasmasLau, K.K.S. / Gleason, K.K. et al. | 1999
- 2659
-
Surface Chemistry during Porous-Silicon Formation in Dilute Fluoride ElectrolytesBelaiedi, A. / Safi, M. / Ozanam, F. / Chazalviel, J.-W. / Gorochov, O. et al. | 1999
- 2659
-
Semiconductor Devices, Materials, and Processing - Surface Chemistry during Porous-Silicon Formation in Dilute Fluoride ElectrolytesBelai͏̈di, A. et al. | 1999
- 2665
-
Particle Adhesion and Removal in Chemical Mechanical Polishing and Post-CMP CleaningZhang, F. / Busnaina, A. A. / Ahmadi, G. et al. | 1999
- 2665
-
Semiconductor Devices, Materials, and Processing - Particle Adhesion and Removal in Chemical Mechanical Polishing and Post-CMP CleaningZhang, F. et al. | 1999
- 2670
-
Semiconductor Devices, Materials, and Processing - Boron Ultrashallow junction Formation in Silicon by Low-Energy Implantation and Rapid Thermal Annealing in Inert and Oxidizing AmbientLerch, W. et al. | 1999
- 2670
-
Boron Ultrashallow Junction Formation in Silicon by Low-Energy Implantation and Rapid Thermal Annealing in Inert and Oxidizing AmbientLerch, W. / Glueck, M. / Stoluijk, N. A. / Walk, H. / Schaefer, M. / Marcus, S. D. / Downey, D. F. / Chow, J. W. et al. | 1999
- 2679
-
Chemical Beam Epitaxy of InP with Ar^+ Laser IrradiationShi, B. Q. / Tu, C. W. et al. | 1999
- 2679
-
Semiconductor Devices, Materials, and Processing - Chemical Beam Epitaxy of InP with Ar+ Laser IrradiationShi, B.Q. et al. | 1999
- 2683
-
Calculation of Slip Length in 300 mm Silicon Wafers during Thermal ProcessesAkatsuka, M. / Sueoka, K. / Katahama, H. / Adachi, N. et al. | 1999
- 2683
-
Semiconductor Devices, Materials, and Processing - Calculation of Slip Length in 300 mm Silicon Wafers during Thermal ProcessesAkatsuka, M. et al. | 1999
- 2689
-
Polishing Parameter Dependencies and Surface Oxidation of Chemical Mechanical Polishing of M Thin FilmsWrschka, P. / Hernandez, J. / Hsu, Y. / Kuan, T. S. / Oebrlein, G. S. / Sun, H. J. / Hansen, D. A. / King, J. / Fury, M. A. et al. | 1999
- 2689
-
Semiconductor Devices, Materials, and Processing - Polishing Parameter Dependencies and Surface Oxidation of Chemical Mechanical Polishing of Al Thin-FilmsWrschka, P. et al. | 1999
- 2697
-
Semiconductor Devices, Materials, and Processing - Photoluminescence Change of As-Prepared and Aged Porous Silicon with NAOH TreatmentFukuda, Y. et al. | 1999
- 2697
-
Photoluminescence Change of As-Prepared and Aged Porous Silicon with NaOH TreatmentFukuda, Y. / Zhou, W. / Furuya, K. / Suzuki, H. et al. | 1999
- 2702
-
Reduction of Surface Roughness in Photoenhanced Electrochemical Wet-Etched GaNStocker, D. A. / Schuherl, E. F. et al. | 1999
- 2702
-
Semiconductor Devices, Materials, and Processing - Reduction of Surface Roughness in Photoenhanced Electrochemical Wet-Etched GaNStocker, D.A. et al. | 1999
- 2705
-
A Continuum Model for the Inductively Coupled Plasma Reactor in Semiconductor ProcessingBose, D. / Govindan, T. R. / Meyyappan, M. et al. | 1999
- 2705
-
Semiconductor Devices, Materials, and Processing - A Continuum Model for the inductively Coupled Plasma Reactor in Semiconductor ProcessingBose, D. et al. | 1999
- 2712
-
Buried Cobalt Silicide Layer under Thin Silicon Film Fabricated by Wafer Bonding and Hydrogen-Induced Delamination TechniquesZhu, S. / Huang, Y. / Ru, G. / Qu, X. / Li, B. et al. | 1999
- 2712
-
Semiconductor Devices, Materials, and Processing - Buried Cobalt Silicide layer under Thin Silicon Film Fabricated by Wafer Bonding and Hydrogen-induced Delamination TechniquesZhu, S. et al. | 1999
- 2717
-
Semiconductor Devices, Materials, and Processing - Study of NH3 Plasma Damage on GaAs Schottky Diode in Inductively Coupled Plasma SystemMeyer, L.C. et al. | 1999
- 2717
-
Study of NH~3 Plasma Damage on GaAs Schottky Diode in Inductively Coupled Plasma SystemMeyer, L. C. / Lee, J. W. / Johnson, D. / Huang, M. / Ren, F. / Anderson, T. J. / LaRoche, J. R. / Lothian, J. R. / Abernathy, C. R. / Pearton, S. J. et al. | 1999
- 2720
-
Cobalt Metallorganic Chemical Vapor Deposition and Formation of Epitaxial CoSi~2 Layer on Si(100) SubstrateRhee, H. S. / Aim, B. T. et al. | 1999
- 2720
-
Semiconductor Devices, Materials, and Processing - Cobalt Metallorganic Chemical Vapor Deposition and Formation of Epitaxial CoSi2 Layer on Si(100) SubstrateRhee, H.S. et al. | 1999
- 2725
-
Semiconductor Devices, Materials, and Processing - Adsorption Behavior of Organic Contaminants on a Silicon Wafer SurfaceSugimoto, F. et al. | 1999
- 2725
-
Adsorption Behavior of Organic Contaminants on a Silicon Wafer SurfaceSugimoto, F. / Okamura, S. et al. | 1999
- 2730
-
Influence of Coil Power on the Etching Characteristics in a High Density Plasma EtcherAyon, A. A. / Braff, R. A. / Bart, R. / Sawin, H. H. / Schmidt, M. A. et al. | 1999
- 2730
-
Semiconductor Devices, Materials, and Processing - Influence of Coil Power on the Etching Characteristics in a High Density Plasma EtcherAyon, A.A. et al. | 1999
- 2737
-
Doping Measurements in Thin Silicon-On-Insulator FilmsHenaux, S. / Mondon, F. / Gusella, F. / Kling, I. / Reimbold, G. et al. | 1999
- 2737
-
Semiconductor Devices, Materials, and Processing - Doping Measurements in Thin Silicon-On-Insulator FilmsHénaux, S. et al. | 1999
- 2744
-
Sensors and Displays: Principles, Materials, and Processing - Morphology Control of Multicomponent Oxide Phosphor Particles Containing High Ductility Component by High Temperature Spray PyrolysisKang, Y.C. et al. | 1999
- 2744
-
Morphology Control of Multicomponent Oxide Phosphor Particles Containing High Ductility Component by High Temperature Spray PyrolysisKang, Y. C. / Park, S. B. / Lenggoro, I. W. / Okuyama, K. et al. | 1999
- 2748
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Cl~2-Based Dry Etching of Doped Manganate Perovskites: PrBaCaMnO~3 and LaSrMnO~3Lee, K. P. / Jung, K. B. / Cho, H. / Kumar, D. / Pietambaram, S. V. / Singh, R. K. / Hogan, P. H. / Dahmen, K. H. / Hahn, Y. B. / Pearton, S. J. et al. | 1999
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Solid-State Topics: General - Cl2-Based Dry Etching of Doped Manganate Perovskites: PrBaCaMnO3 and LaSrMnO3Lee, K.P. et al. | 1999
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Thermodynamic Study of the Formation of C~6~0 and C~7~0 by Combustion or PyrolysisVahlas, C. / Kacheva, A. / Hitchman, M. L. / Rocabois, P. et al. | 1999
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Solid-State Topics: General - Thermodynamic Study of the Formation of C60 and C70 by Combustion or PyrolysisVahlas, C. et al. | 1999
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Solid-State Topics: General - High-Temperature Oxidation of Tungsten- and Chromium-Alloyed Molybdenum AluminosilicidesKodash, V.Y. et al. | 1999
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High-Temperature Oxidation of Tungsten- and Chromium-Alloyed Molybdenum AluminosilicidesKodash, V. Y. / Fergus, J. W. et al. | 1999