Micro-Auger electron spectroscopy studies of chemical and electronic effects at GaN-sapphire interfaces (English)
- New search for: Sun, X.L.
- New search for: Sun, X.L.
- New search for: Bradley, S.T.
- New search for: Jessen, G.H.
- New search for: Look, D.C.
- New search for: Molnar, R.J.
- New search for: Brillson, L.J.
In:
Journal of vacuum science and technology / A
;
22
, 6
; 2284-2289
;
2004
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ISSN:
- Article (Journal) / Print
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Title:Micro-Auger electron spectroscopy studies of chemical and electronic effects at GaN-sapphire interfaces
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Contributors:
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Published in:Journal of vacuum science and technology / A ; 22, 6 ; 2284-2289
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Publisher:
- New search for: Inst.
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Place of publication:New York, NY
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Publication date:2004
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ISSN:
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ZDBID:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 52.78 / 33.09
- Further information on Basic classification
- New search for: 770/3422
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Keywords:
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Classification:
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Source:
Table of contents – Volume 22, Issue 6
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 2223
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Real-time wetting dynamics and interfacial chemistry in low-melting 57Bi–42Sn–1Ag solder paste on Ni–AuBozack, M. J. et al. | 2004
- 2234
-
-doped sputtered thin films: Microstructure, stoichiometry, and optical propertiesQuartarone, E. / Mustarelli, P. / Marabelli, F. / Battagliarin, M. / Turato, S. et al. | 2004
- 2239
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Reactions of ultrathin hard amorphous carbon films under microbeam laser processingZhang, Li Hong / Gong, Hao / Li, Yuan Qing / Wang, Jian Ping et al. | 2004
- 2246
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Boron surfactant enhanced growth of thin Si films onWang, C. R. / Müller, B. H. / Bugiel, E. / Wietler, T. / Bierkandt, M. / Hofmann, K. R. / Zaumseil, P. et al. | 2004
- 2251
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Origin of in collisions of hydrogen atoms with an adsorbate-covered Cu(100) surfaceDeFazio, J. N. / Peko, B. L. et al. | 2004
- 2256
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Bulk and interface charge in low temperature silicon nitride for thin film transistors on plastic substratesPark, Kie Jin / Parsons, Gregory N. et al. | 2004
- 2261
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Silicide formation at and interfaces induced by ion bombardmentLebedinskii, Yuri / Zenkevich, Andrei et al. | 2004
- 2265
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Suboxide characteristics in ultrathin oxides grown under novel oxidation processesLin, Yen-Po / Hwu, Jenn-Gwo et al. | 2004
- 2273
-
Smoothing of (111) oriented Cu films by post-deposition in situ Ar ion bombardmentKools, J. C. S. / Devasahayam, A. J. et al. | 2004
- 2276
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Etching with electron beam generated plasmasLeonhardt, D. / Walton, S. G. / Muratore, C. / Fernsler, R. F. / Meger, R. A. et al. | 2004
- 2284
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Micro-Auger electron spectroscopy studies of chemical and electronic effects at GaN-sapphire interfacesSun, X. L. / Bradley, S. T. / Jessen, G. H. / Look, D. C. / Molnar, R. J. / Brillson, L. J. et al. | 2004
- 2290
-
Monte Carlo sensitivity analysis of and CF radical densities in a plasmaBose, Deepak / Rauf, Shahid / Hash, D. B. / Govindan, T. R. / Meyyappan, M. et al. | 2004
- 2299
-
Evolution of local texture and grain morphology in metal plasma immersion ion implantation & deposition of TiNManova, D. / Attenberger, W. / Mändl, S. / Stritzker, B. / Rauschenbach, B. et al. | 2004
- 2306
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Simple energy spike model for paracrystalline silicon in ion implantationCheng, Ju-Yin / Gibson, J. M. et al. | 2004
- 2311
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Measurements of desorbed products by plasma beam irradiation onKurihara, Kazuaki / Yamaoka, Yoshikazu / Karahashi, Kazuhiro / Sekine, Makoto et al. | 2004
- 2315
-
Effects of wetting ability of plating electrolyte on Cu seed layer for electroplated copper filmLiu, Chi-Wen / Tsao, Jung-Chih / Tsai, Ming-Shih / Wang, Ying-Lang et al. | 2004
- 2321
-
Effects of thermal annealing on the structural, mechanical, and tribological properties of hard fluorinated carbon films deposited by plasma enhanced chemical vapor depositionMaia da Costa, M. E. H. / Baumvol, I. J. R. / Radke, C. / Jacobsohn, L. G. / Zamora, R. R. M. / Freire, F. L. et al. | 2004
- 2329
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Effect of pressure on the deposition of hydrogen-free amorphous carbon and carbon nitride films by the pulsed cathodic arc discharge methodLiu, Dongping / Benstetter, Günther / Wang, Wenchun / Zhang, Jialiang et al. | 2004
- 2336
-
Influence of cathode material and gas on inductively coupled plasma etching of AlGaN layers with plasmaZhirnov, Evgeny / Stepanov, Sergei / Wang, Wang Nang / Shreter, Y. G. / Takhin, D. V. / Bochkareva, N. I. et al. | 2004
- 2342
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Amorphous silicon nitride films of different composition deposited at room temperature by pulsed glow discharge plasma immersion ion implantation and depositionAfanasyev-Charkin, I. V. / Jacobsohn, L. G. / Averitt, R. D. / Nastasi, M. et al. | 2004
- 2347
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Detection of quasimolecular ion of Cu(hfac)(tmvs) by ion attachment mass spectrometryNakamura, Megumi / Shiokawa, Yoshiro / Fujii, Toshihiro / Takayanagi, Masao / Nakata, Munetaka et al. | 2004
- 2351
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Structure and mechanical properties of Ti–Si–N films deposited by combined DC/RF reactive unbalanced magnetron sputteringDing, X. Z. / Zeng, X. T. / Liu, Y. C. / Yang, Q. / Zhao, L. R. et al. | 2004
- 2356
-
Improvement of electrochemical properties in cathode films grown on substrates by liquid-delivery metalorganic chemical vapor depositionChoi, Woon-Gi / Yoon, Soon-Gil et al. | 2004
- 2361
-
Current-pressure characteristics of planar magnetron discharges in rare gasesEscrivão, M. L. / Pereira, P. J. S. / Cabral, M. H. / Teixeira, M. R. / Maneira, M. J. P. et al. | 2004
- 2365
-
In situ x-ray diffraction observation of multiple texture turnovers in sputtered filmsZhao, Z. B. / Rek, Z. U. / Yalisove, S. M. / Bilello, J. C. et al. | 2004
- 2373
-
Characteristics of organic film deposited by plasma-enhanced chemical-vapor deposition using a benzocyclobutene resinSugitani, Suehiro / Matsuzaki, Hideaki / Enoki, Takatomo et al. | 2004
- 2379
-
Electron trapping in metal-insulator-semiconductor structures on with and dielectricsBae, Choelhwyi / Krug, Cristiano / Lucovsky, Gerald et al. | 2004
- 2384
-
Novel rubidium atomic beam with an alkali dispenser sourceRoach, Timothy M. / Henclewood, Dwayne et al. | 2004
- 2388
-
Dry etching of and multilayers in an inductively coupled plasma of mixtureRa, H.-W. / Hahn, Y. B. / Song, K. S. / Park, M. H. / Hong, Y. K. et al. | 2004
- 2392
-
Infrared spectroscopic study of atomic layer deposition mechanism for hafnium silicate thin films using andKang, Sang-Woo / Rhee, Shi-Woo / George, Steven M. et al. | 2004
- 2398
-
Room temperature preparation of activated and crystallized -type thin film on glass substrate by intense, pulsed, ion beam evaporationHirai, M. / Iwashita, R. / Arikado, T. / Suematsu, H. / Jiang, W. / Yatsui, K. / Takeda, M. / Uchitomi, N. et al. | 2004
- 2402
-
Low-temperature preparation of interfaces with low defect density. I. Two-step remote plasma-assisted oxidation-deposition processBae, Choelhwyi / Lucovsky, Gerald et al. | 2004
- 2411
-
Low-temperature preparation of interfaces with low defect density. II. Remote plasma-assisted oxidation of GaN and nitrogen incorporationBae, Choelhwyi / Lucovsky, Gerald et al. | 2004
- 2419
-
Preparation and characterization of high-quality TiN films at low temperature by filtered cathode arc plasmaZhang, Y. J. / Yan, P. X. / Wu, Z. G. / Xu, J. W. / Zhang, W. W. / Li, X. / Liu, W. M. / Xue, Q. J. et al. | 2004
- 2424
-
Study of preferred orientation of zinc oxide films on the 64(degree) LiNbO3 substrates and their applications as liquid sensorsJian, Shiou-Jen et al. | 2004
- 2424
-
Study of preferred orientation of zinc oxide films on the substrates and their applications as liquid sensorsJian, Shiou-Jen / Chu, Sheng-Yuan / Huang, Tung-Yi / Water, Walter et al. | 2004
- 2424
-
Study of preferred orientation of zinc oxide films on the 64^o LiNbO~3 substrates and their applications as liquid sensorsJian, S.-J. / Chu, S.-Y. / Huang, T.-Y. / Water, W. et al. | 2004
- 2431
-
Electron-cyclotron-resonance sputtering apparatus for multilayered optical bandpass filters applicable to wavelength division multiplexingJin, Yoshito / Shimada, Masaru / Ono, Toshiro et al. | 2004
- 2437
-
In situ composition monitoring using reflection high-energy electron diffraction for thin films grown by reactive coevaporationPeng, Luke S.-J. / Moeckly, Brian H. et al. | 2004
- 2440
-
Structure and electrical properties of thin films deposited by rf magnetron sputteringHuang, Cheng-Liang / Pan, Chung-Long et al. | 2004
- 2446
-
Low temperature epitaxy of reactively sputtered ZnO on sapphireRuthe, K. C. / Cohen, D. J. / Barnett, S. A. et al. | 2004
- 2453
-
Growth and surface characterization of thin films made by pulsed-laser depositionRamana, C. V. / Smith, R. J. / Hussain, O. M. / Julien, C. M. et al. | 2004
- 2459
-
Two-dimensional spatial survey of the plasma potential and electric field in a pulsed bipolar magnetron dischargeVetushka, A. / Karkari, S. K. / Bradley, J. W. et al. | 2004
- 2469
-
Formation and analysis of disk-shaped grains by Ni-mediated crystallization of amorphous siliconKim, Kyung Ho / Oh, Jae Hwan / Kim, Eun Hyun / Jang, Jin et al. | 2004
- 2473
-
Structure characterization and photon absorption analysis of carbon-doped filmLi, Xiaona / Nie, Dong / Dong, Chuang / Xu, Lei / Zhang, Ze et al. | 2004
- 2473
-
Structure characterization and photon absorption analysis of carbon-doped beta-FeSi~2 filmLi, X. / Nie, D. / Dong, C. / Xu, L. / Zhang, Z. et al. | 2004
- 2473
-
Structure characterization and photon absorption analysis of carbon-doped b-FeSi2 filmLi, Xiaona et al. | 2004
- 2479
-
Near-infrared diode laser hydrogen fluoride monitor for dielectric etchXu, Ning / Pirkle, David R. / Jeffries, Jay B. / McMillin, Brian / Hanson, Ronald K. et al. | 2004
- 2487
-
InN epitaxial growths on Yttria stabilized zirconia (111) step substratesHonke, T. et al. | 2004
- 2487
-
InN epitaxial growths on Yttria stabilized zirconia (111) step substratesa)Honke, T. / Fujioka, H. / Ohta, J. / Oshima, M. et al. | 2004
- 2490
-
Interface formation during the yttrium oxide deposition on Si by pulsed liquid-injection plasma enhanced metal-organic chemical vapor depositionDurand, C. / Vallée, C. / Dubourdieu, C. / Gautier, E. / Bonvalot, M. / Joubert, O. et al. | 2004
- 2500
-
Investigation of fluorocarbon plasma deposition from for use as passivation during deep silicon etchingLabelle, Catherine B. / Donnelly, Vincent M. / Bogart, Gregory R. / Opila, Robert L. / Kornblit, Avi et al. | 2004
- 2508
-
Vacuum beam studies of fluorocarbon radicals and argon ions on Si and SiO2 surfacesKimura, Yoshie et al. | 2004
- 2508
-
Vacuum beam studies of fluorocarbon radicals and argon ions on and surfacesa)Kimura, Yoshie / Coburn, J. W. / Graves, David B. et al. | 2004
- 2517
-
Prediction of SiC etching in a plasma using neural networkKim, Byungwhan / Lee, Byung Teak et al. | 2004
- 2523
-
INDEX - Summary of the Physics and Astronomy Classification Scheme -- 2003| 2004
- 2524
-
INDEX - PACS Headings Used in the Present Index| 2004
- 2528
-
INDEX - Subject Index to Volume 22| 2004
- 2556
-
INDEX - Author Index to Volume 22| 2004
- 2577
-
INDEX - Materials Index to Volume 22| 2004
- L11
-
Two-photon absorption laser induced fluorescence on O and in a dc plasma for oxidation of aluminumKnechten, K. / Kniknie, B. J. / Engeln, R. / Swagten, H. J. M. / Koopmans, B. / van de Sanden, M. C. M. / de Jonge, W. J. M. et al. | 2004
-
Letters - Two-photon absorption laser induced fluorescence on O and O3 in a dc plasma for oxidation of aluminumKnechten, K. et al. | 2004