Hydrophilic mechanical buffer layers and stable hydrophilic finishes on polydimethylsiloxane using combined sequential vapor infiltration and atomic/molecular layer deposition (English)
- New search for: Gong, Bo
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In:
Journal of vacuum science and technology / A
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30
, 1
; 1A156
;
2012
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ISSN:
- Article (Journal) / Print
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Title:Hydrophilic mechanical buffer layers and stable hydrophilic finishes on polydimethylsiloxane using combined sequential vapor infiltration and atomic/molecular layer deposition
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Contributors:
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Published in:Journal of vacuum science and technology / A ; 30, 1 ; 1A156
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Publisher:
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Place of publication:New York, NY
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Publication date:2012
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ISSN:
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ZDBID:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 52.78 / 33.09
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Source:
Table of contents – Volume 30, Issue 1
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 10601
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Letters - Elaboration of high aspect ratio monocrystalline silicon suspended nanobridges by low temperature alkaline treatment of dry etched trenchesDefforge, Thomas et al. | 2012
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Elaboration of high aspect ratio monocrystalline silicon suspended nanobridges by low temperature alkaline treatment of dry etched trenchesDefforge, Thomas / Gautier, Gaël / Tillocher, Thomas / Dussart, Rémi / Tran-Van, François et al. | 2012
- 10801
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Review Articles - Atomic layer deposition for nanostructured Li-ion batteriesKnoops, H C M et al. | 2012
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Atomic layer deposition for nanostructured Li-ion batteriesKnoops, H. C. M. / Donders, M. E. / van de Sanden, M. C. M. / Notten, P. H. L. / Kessels, W. M. M. et al. | 2012
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Spatial atomic layer deposition: A route towards further industrialization of atomic layer depositionPoodt, Paul / Cameron, David C. / Dickey, Eric / George, Steven M. / Kuznetsov, Vladimir / Parsons, Gregory N. / Roozeboom, Fred / Sundaram, Ganesh / Vermeer, Ad et al. | 2012
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Atomic layer deposition for electrochemical energy generation and storage systemsPeng, Qing / Lewis, Jay S. / Hoertz, Paul G. / Glass, Jeffrey T. / Parsons, Gregory N. et al. | 2012
- 11201
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Photovoltaics and Energy - Impact of CdSe/ZnS quantum dot spectrum converters on InGaP/GaAs/Ge multi-junction solar cellsHuang, Chun-Yuan et al. | 2012
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Impact of CdSe/ZnS quantum dot spectrum converters on InGaP/GaAs/Ge multi-junction solar cellsHuang, Chun-Yuan et al. | 2012
- 11301
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Plasma Science and Technology - Spatially resolved study of primary electron transport in magnetic cuspsHubble, Aimee A et al. | 2012
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Spatially resolved study of primary electron transport in magnetic cuspsHubble, Aimee A. / Foster, John E. et al. | 2012
- 11302
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Power effect of ZnO:AI film as back reflector on the performance of thin-film solar cellsLin, Yang-Shih et al. | 2012
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Power effect of ZnO:Al film as back reflector on the performance of thin-film solar cellsLin, Yang-Shih / Lien, Shui-Yang / Wang, Chao-Chun / Liu, Chueh-Yang / Nautiyal, Asheesh / Wuu, Dong-Sing / Tsai, Pi-Chuen / Chen, Chia-Fu / Lee, Shuo-Jen et al. | 2012
- 11401
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Surfaces - Substrate grain size and orientation of Cu and Cu-Ni foils used for the growth of graphene filmsRobinson, Zachary R et al. | 2012
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Substrate grain size and orientation of Cu and Cu–Ni foils used for the growth of graphene filmsRobinson, Zachary R. / Tyagi, Parul / Murray, Thomas M. / Ventrice, Carl A. / Chen, Shanshan / Munson, Andrew / Magnuson, Carl W. / Ruoff, Rodney S. et al. | 2012
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Energy calibrations in the x-ray absorption spectroscopy of uranium dioxideYu, Sung Woo / Tobin, J. G. / Olalde-Velasco, Paul / Yang, Wan Li / Siekhaus, Wigbert J. et al. | 2012
- 11501
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Thin Films - Probing compositional disorder in vanadium oxide thin films grown on atomic layer deposited hafnia on silicon by capacitance spectroscopyKo, Changhyun et al. | 2012
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Probing compositional disorder in vanadium oxide thin films grown on atomic layer deposited hafnia on silicon by capacitance spectroscopyKo, Changhyun / Zhou, You / Ramanathan, Shriram et al. | 2012
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Deposition of novel nanocomposite films by a newly developed differential pumping co-sputtering systemNose, Masateru / Kurimoto, Takeshi / Saiki, Atsushi / Matsuda, Kenji / Terayama, Kiyoshi et al. | 2012
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Compact tool for deposition of composition spread alloy filmsPriyadarshini, Deepika / Kondratyuk, Petro / Miller, James B. / Gellman, Andrew J. et al. | 2012
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Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmasPerros, Alexander / Bosund, Markus / Sajavaara, Timo / Laitinen, Mikko / Sainiemi, Lauri / Huhtio, Teppo / Lipsanen, Harri et al. | 2012
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Comparison of wet and dry etching of zinc indium oxide for thin film transistors with an inverted gate structureMarrs, Michael A. / Vogt, Bryan D. / Raupp, Gregory B. et al. | 2012
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Transparent polycrystalline monoclinic HfO2 dielectrics prepared by plasma assisted pulsed laser depositionYing, Zhifeng / Sun, Jian / Hu, Zhigao / Yu, Wenlei / Xu, Ning / Wu, Jiada et al. | 2012
- 11601
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Vacuum Science and Technology - Effects of B18Hx+ and B18Hx dimer ion implantations on crystallinity and retained B dose in siliconKawasaki, Yoji et al. | 2012
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Effects of B18Hx+ and B18Hx dimer ion implantations on crystallinity and retained B dose in siliconKawasaki, Yoji / Shibahara, Kentaro et al. | 2012
- 18501
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Perspectives - Thin-film electronics by atomic layer depositionLevy, David H et al. | 2012
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Thin-film electronics by atomic layer depositionLevy, David H. / Nelson, Shelby F. et al. | 2012
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Paper deacidification and UV protection using ZnO atomic layer depositionHanson, C. A. / Oldham, C. J. / Parsons, G. N. et al. | 2012
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In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl)ruthenium] and molecular oxygenKnaut, Martin / Junige, Marcel / Albert, Matthias / Bartha, Johann W. et al. | 2012
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Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxideLehnert, Wolfgang / Ruhl, Guenther / Gschwandtner, Alexander et al. | 2012
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Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactorYanguas-Gil, Angel / Elam, Jeffrey W. et al. | 2012
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Mechanical response of atomic layer deposition alumina coatings on stiff and compliant substratesBull, Steve J. et al. | 2012
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Atomic layer deposition of Pt growth template for orienting PbZrxTi1−xO3 thin filmsPotrepka, Daniel M. / Sanchez, Luz M. / Polcawich, Ronald G. et al. | 2012
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Atomic layer deposition of titanium phosphate on silica nanoparticlesWiedmann, Monika K. / Jackson, David H. K. / Pagan-Torres, Yomaira J. / Cho, Eunkyung / Dumesic, James A. / Kuech, T. F. et al. | 2012
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Thermal chemistry of copper(I)-N,N ′-di-sec-butylacetamidinate on Cu(110) single-crystal surfacesMa, Qiang / Zaera, Francisco / Gordon, Roy G. et al. | 2012
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Core-shell nanowire arrays of metal oxides fabricated by atomic layer depositionThomas, M. A. / Cui, J. B. et al. | 2012
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Combination of characterization techniques for atomic layer deposition MoO~3 coatings: From the amorphous to the orthorhombic alpha -MoO~3 crystalline phaseDiskus, M. / Nilsen, O. / Fjellvag, H. / Diplas, S. / Beato, P. / Harvey, C. / van Schrojenstein Lantman, E. / Weckhuysen, B.M. et al. | 2012
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Atomic layer deposition of GaN at low temperaturesOzgit, Cagla / Donmez, Inci / Alevli, Mustafa / Biyikli, Necmi et al. | 2012
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Low temperature and roll-to-roll spatial atomic layer deposition for flexible electronicsPoodt, Paul / Knaapen, Raymond / Illiberi, Andrea / Roozeboom, Fred / van Asten, Almie et al. | 2012
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Role of surface intermediates in enhanced, uniform growth rates of TiO2 atomic layer deposition thin films using titanium tetraisopropoxide and ozoneCleveland, Erin R. / Henn-Lecordier, Laurent / Rubloff, Gary W. et al. | 2012
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Wide-angle antireflection ZnO films on bullet-like nanostructures of multi-crystalline siliconChen, Sheng-Hui / Tseng, Shao-Ze / Chen, Wei / Cho, Wen-Hao / Chan, Chia-Hua et al. | 2012
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Chemical passivation of GaSb-based surfaces by atomic layer deposited ZnS using diethylzinc and hydrogen sulfideXu, Runshen / Takoudis, Christos G. et al. | 2012
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Special Issue: Atomic Layer Deposition - Preface| 2012
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Molecular layer deposition of polyethylene terephthalate thin filmsIvanova, Tatyana V. / Maydannik, Philipp S. / Cameron, David C. et al. | 2012
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Growth and electrical properties of silicon oxide grown by atomic layer deposition using Bis(ethyl-methyl-amino)silane and ozoneWon, Seok-Jun / Jung, Hyung-Suk / Suh, Sungin / Jin Choi, Yu / Lee, Nae-In / Seong Hwang, Cheol / Joon Kim, Hyeong et al. | 2012
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Atomic layer deposition fabricated substoichiometric TiOx nanorods as fuel cell catalyst supportsPhillips, Richard / Hansen, Paul / Eisenbraun, Eric et al. | 2012
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Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer depositionPark, Taeyong / Lee, Jaesang / Park, Jingyu / Jeon, Heeyoung / Jeon, Hyeongtag / Lee, Ki-Hoon / Cho, Byung-Chul / Kim, Moo-Sung / Ahn, Heui-Bok et al. | 2012
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Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applicationsSwerts, J. / Armini, S. / Carbonell, L. / Delabie, A. / Franquet, A. / Mertens, S. / Popovici, M. / Schaekers, M. / Witters, T. / Tökei, Z. et al. | 2012
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Selective atomic layer deposition with electron-beam patterned self-assembled monolayersHuang, Jie / Lee, Mingun / Kim, Jiyoung et al. | 2012
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Evaluating operating conditions for continuous atmospheric atomic layer deposition using a multiple slit gas source headRyan Fitzpatrick, P. / Gibbs, Zachary M. / George, Steven M. et al. | 2012
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Process study of gadolinium aluminate atomic layer deposition fromthegadolinium tris-di-isopropylacetamidinate precursorRodriguez, Leonard N. J. / Franquet, A. / Brijs, B. / Tielens, H. / Adelmann, C. et al. | 2012
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Low temperature growth of high-k Hf–La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric propertiesTang, Fu / Zhu, Chiyu / Smith, David J. / Nemanich, Robert J. et al. | 2012
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Resistive switching properties of plasma enhanced-ALD La2O3 for novel nonvolatile memory applicationChen, Lin / Yang, Wen / Li, Ye / Sun, Qing-Qing / Zhou, Peng / Lu, Hong-Liang / Ding, Shi-Jin / Zhang, David Wei et al. | 2012
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Effects of atomic layer deposited thin films on dye sensitized solar cell performanceCampbell, Jonathan A. / deBorniol, Mervyn / Mozer, Attila J. / Evans, Peter J. / Burford, Robert P. / Triani, Gerry et al. | 2012
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Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmasKnoops, H. C. M. / Langereis, E. / van de Sanden, M. C. M. / Kessels, W. M. M. et al. | 2012
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Room temperature atomic layer deposition of Al2O3 and replication of butterfly wings for photovoltaic applicationTang, X. / Francis, L. A. / Simonis, P. / Haslinger, M. / Delamare, R. / Deschaume, O. / Flandre, D. / Defrance, P. / Jonas, A. M. / Vigneron, J. P. et al. | 2012
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Preface| 2012
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Wetting properties induced in nano-composite POSS-MA polymer films by atomic layer deposited oxidesVasquez, Kyle A. / Vincent-Johnson, Anita J. / Christopher Hughes, W. / Augustine, Brian H. / Lee, Kyoungmi / Parsons, Gregory N. / Scarel, Giovanna et al. | 2012
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Evaluation of high thermal stability cyclopentadienyl Hf precursors with H2O as a co-reactant for advanced gate logic applicationsConsiglio, Steven / Clark, Robert D. / Nakamura, Genji / Wajda, Cory S. / Leusink, Gert J. et al. | 2012
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Nanoscratch testing of atomic layer deposition and magnetron sputtered TiO2 and Al2O3 coatings on polymeric substratesKääriäinen, Tommi O. / Kelly, Peter J. / Cameron, David C. / Beake, Ben / Li, Heqing / Barker, Paul M. / Struller, Carolin F. et al. | 2012
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Initiation of atomic layer deposition of metal oxides on polymer substrates by water plasma pretreatmentSteven Brandt, E. / Grace, Jeremy M. et al. | 2012
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Mechanical masking of films deposited by atomic layer depositionLangston, Michael C. / Usui, Takane / Prinz, Fritz B. et al. | 2012
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Cathode encapsulation of organic light emitting diodes by atomic layer deposited Al2O3 films and Al2O3/a-SiNx:H stacksKeuning, W. / van de Weijer, P. / Lifka, H. / Kessels, W. M. M. / Creatore, M. et al. | 2012
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Temperature induced changes in a AgPt nanofilm on Ru(0001)Onsgaard, Jens / Jan Godowski, P. / Shen Li, Zhe et al. | 2012
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Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formationShimizu, Hideharu / Sakoda, Kaoru / Momose, Takeshi / Koshi, Mitsuo / Shimogaki, Yukihiro et al. | 2012
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Atomic layer deposition of Ru onto organic monolayers: Shifting metal effective work function using monolayer structurePark, Kie Jin / Parsons, Gregory N. et al. | 2012
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Nucleation delay in atomic layer deposition on a thin organic layer and the role of reaction thermochemistryHughes, Kevin J. / Engstrom, James R. et al. | 2012
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Cycle time effects on growth and transistor characteristics of spatial atomic layer deposition of zinc oxideNelson, Shelby F. / Levy, David H. / Tutt, Lee W. / Burberry, Mitchell et al. | 2012
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In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer depositionRai, Vikrant R. / Agarwal, Sumit et al. | 2012
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Atomic layer deposition of Al2O3 on V2O5 xerogel film for enhanced lithium-ion intercalation stabilityLiu, Dawei / Liu, Yanyi / Candelaria, Stephanie L. / Cao, Guozhong / Liu, Jun / Jeong, Yoon-Ha et al. | 2012
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Growth characteristics, material properties, and optical properties of zinc oxysulfide films deposited by atomic layer depositionBakke, Jonathan R. / Tanskanen, Jukka T. / Hägglund, Carl / Pakkanen, Tapani A. / Bent, Stacey F. et al. | 2012
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Impact of electrode roughness on metal-insulator-metal tunnel diodes with atomic layer deposited Al2O3 tunnel barriersAlimardani, Nasir / William Cowell, E. / Wager, John F. / Conley, John F. / Evans, David R. / Chin, Matthew / Kilpatrick, Stephen J. / Dubey, Madan et al. | 2012
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Reaction mechanisms for atomic layer deposition of aluminum oxide on semiconductor substratesDelabie, Annelies / Sioncke, Sonja / Rip, Jens / Van Elshocht, Sven / Pourtois, Geoffrey / Mueller, Matthias / Beckhoff, Burkhard / Pierloot, Kristine et al. | 2012
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Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental studyKariniemi, Maarit / Niinistö, Jaakko / Vehkamäki, Marko / Kemell, Marianna / Ritala, Mikko / Leskelä, Markku / Putkonen, Matti et al. | 2012
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Impact of precursor chemistry on atomic layer deposition of lutetium aluminatesNyns, Laura / Shi, Xiaoping / Tielens, Hilde / Van Elshocht, Sven / Date, Lucien / Schreutelkamp, Robert et al. | 2012
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Nanocoating zinc alkoxide (zincone) hybrid polymer films on particles using a fluidized bed reactorLiang, Xinhua / Jiang, Ying-Bing / Weimer, Alan W. et al. | 2012
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Study of amorphous lithium silicate thin films grown by atomic layer depositionHämäläinen, Jani / Munnik, Frans / Hatanpää, Timo / Holopainen, Jani / Ritala, Mikko / Leskelä, Markku et al. | 2012
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Use of a high-flow diaphragm valve in the exhaust line of atomic layer deposition reactorsDasgupta, Neil P. / Trejo, Orlando / Prinz, Fritz B. et al. | 2012
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Thermal chemistry of Mn2(CO)10 during deposition of thin manganese films on silicon oxide and on copper surfacesQin, Xiangdong / Sun, Huaxing / Zaera, Francisco et al. | 2012
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Hydrophilic mechanical buffer layers and stable hydrophilic finishes on polydimethylsiloxane using combined sequential vapor infiltration and atomic/molecular layer depositionGong, Bo / Spagnola, Joseph C. / Parsons, Gregory N. et al. | 2012
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Effect of pulsed deposition of Al2O3 for native oxides reduction of GaAs by atomic layer deposition techniqueKonda, R. B. / Mundle, R. / Bamiduro, O. / Dondapati, H. / Bahoura, M. / Pradhan, A. K. / Donley, C. et al. | 2012
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Continuous atomic layer deposition: Explanation for anomalous growth rate effectsMaydannik, Philipp S. / Kaariainen, Tommi O. / Cameron, David. C. et al. | 2012
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Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applicationsLee, Jaesang / Kim, Hyungchul / Park, Taeyong / Ko, Youngbin / Ryu, Jaehun / Jeon, Heeyoung / Park, Jingyu / Jeon, Hyeongtag et al. | 2012
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Mechanisms for hydrophilic/hydrophobic wetting transitions on cellulose cotton fibers coated using Al2O3 atomic layer depositionLee, Kyoungmi / Jur, Jesse S. / Kim, Do Han / Parsons, Gregory N. et al. | 2012
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Plasma and vacuum ultraviolet induced charging of SiO2 and HfO2 patterned structuresLauer, J. L. / Upadhyaya, G. S. / Sinha, H. / Kruger, J. B. / Nishi, Y. / Shohet, J. L. et al. | 2012
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In situ study of the atomic layer deposition of HfO2 on SiKolanek, Krzysztof / Tallarida, Massimo / Michling, Marcel / Schmeisser, Dieter et al. | 2012
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Fluorine contamination in yttrium-doped barium zirconate film deposited by atomic layer depositionAn, Jihwan / Beom Kim, Young / Sun Park, Joong / Hyung Shim, Joon / Gür, Turgut M. / Prinz, Fritz B. et al. | 2012
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Real-time spectroscopic ellipsometric investigation of adsorption and desorption in atomic layer deposition: A case study for the strontium bis(tri-isopropylcyclopentadienyl)/water processWang, Han / Jiang, Xiaoqiang / Willis, Brian G. / 王瀚 / 蒋晓强 et al. | 2012
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Atomic layer deposition of Al-doped ZnO films using ozone as the oxygen source: A comparison of two methods to deliver aluminumYuan, Hai / Luo, Bing / Yu, Dan / Cheng, An-jen / Campbell, Stephen A. / Gladfelter, Wayne L. et al. | 2012
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Combination of characterization techniques for atomic layer deposition MoO3 coatings: From the amorphous to the orthorhombic α-MoO3 crystalline phaseDiskus, Madeleine / Nilsen, Ola / Fjellvåg, Helmer / Diplas, Spyros / Beato, Pablo / Harvey, Clare / van Schrojenstein Lantman, Evelien / Weckhuysen, Bert M. et al. | 2012
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Atomic layer deposition of ZnO/Al2O3/ZrO2 nanolaminates for improved thermal and wear resistance in carbon-carbon compositesMohseni, H. / Scharf, T. W. et al. | 2012
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Plasma-enhanced atomic layer deposition and etching of high-k gadolinium oxideVitale, Steven A. / Wyatt, Peter W. / Hodson, Chris J. et al. | 2012
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Atomic layer deposition of ZnO/A2lO3/ZrO2 nanolaminates for improved thermal and wear resistance in carbon-carbon compositesMohseni, H et al. | 2012
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Effect of temperature and gas velocity on growth per cycle during Al2O3 and ZnO atomic layer deposition at atmospheric pressureMousa, Moataz Bellah M. / Oldham, Christopher J. / Jur, Jesse S. / Parsons, Gregory N. et al. | 2012
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Information for Contributors| 2012
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CUMULATIVE AUTHOR INDEX| 2012