Simulation of deep UV lithography with SU-8 resist by using 365 nm light source (English)
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In:
Microsystem Technologies
;
11
, 4-5
; 265-270
;
2005
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ISSN:
- Article (Journal) / Print
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Title:Simulation of deep UV lithography with SU-8 resist by using 365 nm light source
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Contributors:
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Published in:Microsystem Technologies ; 11, 4-5 ; 265-270
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Publisher:
- New search for: Springer-Verlag
- New search for: Springer
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Place of publication:Berlin
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Publication date:2005
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ISSN:
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ZDBID:
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DOI:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 50.94
- Further information on Basic classification
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Keywords:
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Classification:
BKL: 50.94 Mikrosystemtechnik, Nanotechnologie -
Source:
Table of contents – Volume 11, Issue 4-5
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 225
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Preface: Harmst2003Hruby, Jill et al. | 2005
- 226
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Friction stir microforming of superplastic alloysMohan, S. / Mishra, R.S. et al. | 2005
- 230
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3D microstructure fabrication for a high luminosity lighting-panel for LCD using synchrotron radiationMinamitani, M. / Utsumi, Y. / Hattori, T. et al. | 2005
- 235
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Improvement of capillary electrophoresis property for microchannels fabricated by deep X-ray lithographyUtsumi, Y. / Ozaki, M. / Terabe, S. / Hattori, T. et al. | 2005
- 240
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MODULIGA: The LIGA process as a modular production method-current standardization status in GermanyHahn, L. / Meyer, P. / Bade, K. / Hein, H. / Schulz, J. / Löchel, B. / Scheunemann, H.U. / Schondelmaier, D. / Singleton, L. et al. | 2005
- 246
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Micro-ECM for production of microsystems with a high aspect ratioFörster, R. / Schoth, A. / Menz, W. et al. | 2005
- 250
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Micro wire EDM for high aspect ratio 3D microstructuring of ceramics and metalsSchoth, A. / Förster, R. / Menz, W. et al. | 2005
- 254
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Knowledge-based design environment for primary shaped micro partsAlbers, A. / Burkardt, N. / Hauser, S. / Marz, J. et al. | 2005
- 261
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The lifetime comparison of Ni and Ni-PTFE moulding inserts with high aspect-ratio structureTian, Y. / Zhang, P. / Liu, G. / Tian, X. et al. | 2005
- 265
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Simulation of deep UV lithography with SU-8 resist by using 365 nm light sourceTian, X. / Liu, G. / Tian, Y. / Zhang, P. / Zhang, X. et al. | 2005
- 271
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Fabrication of ceramic microcomponents using deep X-ray lithographyMüller, C. / Hanemann, T. / Wiche, G. / Kumar, C. / Goettert, J. et al. | 2005
- 278
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Fabrication of diamond micro tools for ultra precision machiningRitzhaupt-Kleissl, E. / Müller, C. / Sossalla, A. / Ertl, S. / Gluche, P. et al. | 2005
- 280
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Carbon paper flow fields made by WEDM for small fuel cellsMüller, M. A. / Müller, C. / Förster, R. / Menz, W. et al. | 2005
- 282
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Deep photo-lithography characterization of SU-8 resist layersReznikova, E. F. / Mohr, J. / Hein, H. et al. | 2005
- 292
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LIGA fabrication of X-ray Nickel lensesNazmov, V. / Reznikova, E. / Snigirev, A. / Snigireva, I. / DiMichiel, M. / Grigoriev, M. / Mohr, J. / Matthis, B. / Saile, V. et al. | 2005
- 298
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Coupling bulge testing and nanoindention to characterize materials properties of bulk micromachined structuresKennedy, M. S. / Olson, A. L. / Raupp, J. C. / Moody, N. R. / Bahr, D. F. et al. | 2005
- 303
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Optimisation of SU-8 processing parameters for deep X-ray lithographyBarber, R. L. / Ghantasala, M. K. / Divan, R. / Vora, K. D. / Harvey, E. C. / Mancini, D. C. et al. | 2005
- 311
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Fabrication of microneedle array using LIGA and hot embossing processMoon, Sang Jun / Lee, Seung S. / Lee, H. S. / Kwon, T. H. et al. | 2005
- 319
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Corrosion behavior of a structural nickel electrodepositWall, F. D. / Martinez, M. A. / Vandenavyle, J. J. et al. | 2005
- 331
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Experimental study of NiFe and CoFe throughmask electrodeposition of high aspect ratio featuresKelly, J. J. / Yang, N. Y. C. et al. | 2005
- 335
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Design and simulation of an asymmetric variable reluctance stepping millimotorLu, W.-Y. / Garcia, E.J. / Greenwood, W.H. / Oliver, A.D. / Korellis, J.S. et al. | 2005
- 343
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Fabrication of high-aspect-ratio microstructures using SU8 photoresistLiu, G. / Tian, Y. / Kan, Y. et al. | 2005
- 347
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Fabrication of high-aspect-ratio hydrogel microstructuresTirumala, V. R. / Divan, R. / Mancini, D. C. / Caneba, G. T. et al. | 2005
- 353
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Effects of contact-stress on hot-embossed PMMA microchannel wall profileLei, K. F. / Li, W. J. / Yam, Y. et al. | 2005
- 358
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Deep X-ray lithography using mask with integrated electrothermal actuatorLee, K.-C. / Lee, S.S. et al. | 2005
- 365
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Application of 3D gray mask for the fabrication of curved SU-8 structuresHung, Kuo-Yung / Tseng, Fan-Gang / Chou, Hwai-Pwu et al. | 2005
- 370
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Low cost transparent SU-8 membrane mask for deep X-ray lithographyCabrini, S. / Pérennès, F. / Marmiroli, B. / Olivo, A. / Carpentiero, A. / Kumar, R. / Candeloro, P. / Fabrizio, E.Di. et al. | 2005
- 374
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Micro-Structures of TiC/$ Ti_{5} $$ Si_{3} $ composite produced by powder metallurgy and LIGA processMiyano, N. / Iwasa, H. / Matsumoto, M. / Ameyama, K. / Sugiyama, S. et al. | 2005
- 379
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Large batch dimensional metrology demonstrated in the example of a LIGA fabricated springAigeldinger, G. / Ceremuga, J. T. / Skala, D. M. et al. | 2005