Carbon Dioxide Reforming of Methane Using a Dielectric Barrier Discharge Reactor: Effect of Helium Dilution and Kinetic Model (English)
- New search for: Goujard, Valentin
- New search for: Tatibouët, Jean-Michel
- New search for: Batiot-Dupeyrat, Catherine
- New search for: Goujard, Valentin
- New search for: Tatibouët, Jean-Michel
- New search for: Batiot-Dupeyrat, Catherine
In:
Plasma Chemistry and Plasma Processing
;
31
, 2
; 315-325
;
2011
-
ISSN:
- Article (Journal) / Print
-
Title:Carbon Dioxide Reforming of Methane Using a Dielectric Barrier Discharge Reactor: Effect of Helium Dilution and Kinetic Model
-
Contributors:Goujard, Valentin ( author ) / Tatibouët, Jean-Michel ( author ) / Batiot-Dupeyrat, Catherine ( author )
-
Published in:Plasma Chemistry and Plasma Processing ; 31, 2 ; 315-325
-
Publisher:
- New search for: Springer US
- New search for: Plenum Publ. Corp.
-
Place of publication:New York, NY
-
Publication date:2011
-
ISSN:
-
ZDBID:
-
DOI:
-
Type of media:Article (Journal)
-
Type of material:Print
-
Language:English
- New search for: 770/3635
- New search for: 33.00
- Further information on Basic classification
-
Keywords:
-
Classification:
-
Source:
Table of contents – Volume 31, Issue 2
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 251
-
Thin Film Growth of Germanium Selenides from PECVD of GeCl4 and Dimethyl SelenideWhitham, Patrick J. / Strommen, Dennis P. / Lau, Lisa D. / Rodriguez, René G. et al. | 2010
- 257
-
Erratum to: Thin Film Growth of Germanium Selenides from PECVD of GeCl4 and Dimethyl SelenideWhitham, Patrick J. / Strommen, Dennis P. / Lau, Lisa D. / Rodriguez, René G. et al. | 2011
- 259
-
A Comparative Study of HBr-Ar and HBr-Cl2 Plasma Chemistries for Dry Etch ApplicationsEfremov, Alexander / Kim, Youngkeun / Lee, Hyun-Woo / Kwon, Kwang-Ho et al. | 2010
- 273
-
Ethylene Epoxidation over Alumina- and Silica-Supported Silver Catalysts in Low-Temperature AC Dielectric Barrier DischargeSuttikul, Thitiporn / Sreethawong, Thammanoon / Sekiguchi, Hidetoshi / Chavadej, Sumaeth et al. | 2010
- 291
-
Oxidative Conversion of Hexane to Olefins-Influence of Plasma and Catalyst on Reaction PathwaysBoyadjian, C. / Ağıral, A. / Gardeniers, J. G. E. / Lefferts, L. / Seshan, K. et al. | 2011
- 307
-
Principal Limitations in Homogeneous Gas Phase Chemistry in Non-Thermal PlasmasHolzer, F. / Köhler, R. / Roland, U. / Stelter, E. / Kopinke, F.-D. et al. | 2011
- 315
-
Carbon Dioxide Reforming of Methane Using a Dielectric Barrier Discharge Reactor: Effect of Helium Dilution and Kinetic ModelGoujard, Valentin / Tatibouët, Jean-Michel / Batiot-Dupeyrat, Catherine et al. | 2011
- 327
-
Methane Decomposition Leading to Deposit Formation in a DC Positive CH4–N2 Corona DischargeHorvath, G. / Zahoran, M. / Mason, N. J. / Matejcik, S. et al. | 2011
- 337
-
Formation and Excitation of CN Molecules in He–CO–N2–O2 Discharge PlasmasGrigorian, G. / Cenian, A. et al. | 2011
- 353
-
Atmospheric Pressure Plasma Discharge for Polysiloxane Thin Films Deposition and Comparison with Low Pressure ProcessSiliprandi, Riccardo A. / Zanini, Stefano / Grimoldi, Elisa / Fumagalli, Francesco S. / Barni, Ruggero / Riccardi, Claudia et al. | 2011
- 373
-
Modeling on the Momentum and Heat/Mass Transfer Characteristics of an Argon Plasma Jet Issuing into Air Surroundings and Interacting with a Counter-Injected Argon JetWang, Hai-Xing / Chen, Xi / Li, He-Ping et al. | 2011
- 393
-
Carbon Nano-Flakes Produced by an Inductively Coupled Thermal Plasma System for Catalyst ApplicationsPristavita, Ramona / Meunier, Jean-Luc / Berk, Dimitrios et al. | 2011