Adsorption characteristics of lithography filters in various solvents using application-specific ratings (English)
- New search for: Umeda, Toru
- New search for: Tsuzuki, Shuichi
- New search for: Umeda, Toru
- New search for: Tsuzuki, Shuichi
In:
Proc. SPIE
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9051
; 90511G
;
2014
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ISBN:
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ISSN:
- Conference paper / Electronic Resource
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Title:Adsorption characteristics of lithography filters in various solvents using application-specific ratings
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Contributors:Umeda, Toru ( author ) / Tsuzuki, Shuichi ( author )
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Conference:Advances in Patterning Materials and Processes XXXI ; 2014 ; San Jose,California,USA
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Published in:Proc. SPIE ; 9051 ; 90511G
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Publisher:
- New search for: SPIE
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Publication date:2014-03-26
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ISBN:
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ISSN:
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DOI:
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Type of media:Conference paper
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Type of material:Electronic Resource
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Language:English
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Source:
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 90510A
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Assessing SEM contour based OPC models quality using rigorous simulationWeisbuch, Francois / Samy Naranaya, Aravind et al. | 2014
- 90510B
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SEM simulation for 2D and 3D inspection metrology and defect reviewLevi, Shimon / Schwartsband, Ishai / Khristo, Sergey / Ivanchenko, Yan / Adan, Ofer et al. | 2014
- 90510D
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Chiral nanomaterial fabrication by means of on-edge lithographyDietrich, Kay / Lehr, Dennis / Puffky, Oliver / Kley, Ernst-Bernhard / Tünnermann, Andreas et al. | 2014
- 90510E
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Positive tone cross-linked resists based on photoacid inhibition of cross linkingLawson, Richard A. / Chun, Jun Sung / Neisser, Mark / Tolbert, Laren M. / Henderson, Clifford L. et al. | 2014
- 90510G
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Nanopatterning with tailored moleculesWieberger, Florian / Kolb, Tristan / Neuber, Christian / Ober, Christopher K. / Schmidt, Hans-Werner et al. | 2014
- 90510H
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Line width roughness reduction by rational design of photoacid generator for sub-millisecond laser post-exposure bakeJiang, Jing / Thompson, Michael O. / Ober, Christopher K. et al. | 2014
- 90510I
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Process optimization of templated DSA flowsGronheid, Roel / Bekaert, Joost / Murugesan Kuppuswamy, Vijaya-Kumar / Vandenbroeck, Nadia / Doise, Jan / Cao, Yi / Lin, Guanyang / Sayan, Safak / Parnell, Doni / Somervell, Mark et al. | 2014
- 90510J
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Anin-situhard mask block copolymer approach for the fabrication of ordered, large scale, horizontally aligned, Si nanowire arrays on Si substrateGhoshal, Tandra / Senthamaraikannan, Ramsankar / Shaw, Matthew T. / Holmes, Justin D. / Morris, Michael A. et al. | 2014
- 90510K
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Investigation of cross-linking poly(methyl methacrylate) as a guiding material in block copolymer directed self-assemblySeidel, Robert / Rincon Delgadillo, Paulina / Ramirez-Hernandez, Abelardo / Wu, Hengpeng / Her, Youngjun / Yin, Jian / Nealey, Paul / de Pablo, Juan / Gronheid, Roel et al. | 2014
- 90510L
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Novel surface treatment materials for aligning block-co-polymer in directed self-assembly processesSomeya, Yasunobu / Wakayama, Hiroyuki / Endo, Takafumi / Sakamoto, Rikimaru et al. | 2014
- 90510M
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Directed self-assembly process integration: Fin patterning approaches and challengesSayan, Safak / Chan, B. T. / Gronheid, Roel / Van Roey, Frieda / Kim, Min-Soo / Williamson, Lance / Nealey, Paul et al. | 2014
- 90510N
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High-volume manufacturing equipment and processing for directed self-assembly applicationsSomervell, Mark / Yamauchi, Takashi / Okada, Soichiro / Tomita, Tadatoshi / Nishi, Takanori / Iijima, Etsuo / Nakano, Takeo / Ishiguro, Takumi / Nagahara, Seiji / Iwaki, Hiroyuki et al. | 2014
- 90510O
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Anin situanalysis of resist dissolution in alkali-based and organic solvent-based developers using high speed atomic force microscopySantillan, Julius Joseph / Shichiri, Motoharu / Itani, Toshiro et al. | 2014
- 90510P
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In-situ analysis of defect formation in coat develop track processHarumoto, Masahiko / Stokes, Harold / Tamada, Osamu / Miyagi, Tadashi / Kaneyama, Koji / Pieczulewski, Charles / Asai, Masaya et al. | 2014
- 90510Q
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Methods of controlling cross-linking in negative-tone resistsLawson, Richard A. / Chun, Jun Sung / Neisser, Mark / Tolbert, Laren M. / Henderson, Clifford L. et al. | 2014
- 90510R
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How to design a good photoresist solvent package using solubility parameters and high-throughput researchTate, Michael P. / Cutler, Charlotte / Sakillaris, Mike / Kaufman, Michael / Estelle, Thomas / Mohler, Carol / Tucker, Chris / Thackeray, Jim et al. | 2014
- 90510S
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ICE: Ionic contrast enhancement for organic solvent negative tone developSundberg, Linda K. / Wallraff, Gregory M. / Bozano, Luisa D. / Truong, Hoa D. / Sanchez, Martha I. / Goldfarb, Dario L. / Petrillo, Karen E. / Hinsberg, William D. et al. | 2014
- 90510T
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Introduction of an innovative water based photoresist stripping process using intelligent fluidsRudolph, Matthias / Thrun, Xaver / Schumann, Dirk / Hoehne, Anita / Esche, Silvio / Hohle, Christoph et al. | 2014
- 90510U
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Reduction of image placement error on photomask-making for multiple patterningHiromatsu, Takahiro / Fukui, Toru / Tsukagoshi, Kenta / Ono, Kazunori / Hashimoto, Masahiro et al. | 2014
- 90510V
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Robust complementary technique with multiple-patterning for sub-10 nm node deviceOyama, Kenichi / Yamauchi, Shohei / Natori, Sakurako / Hara, Arisa / Yamato, Masatoshi / Yaegashi, Hidetami et al. | 2014
- 90510W
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Advanced develop processes for reducing defects related with e-beam resistsLee, Byunghoon / Han, Sung-Jae / Moon, Se-Gun / Kim, Hee Bom et al. | 2014
- 90510X
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Recent progress on multiple-patterning processYaegashi, Hidetami / Oyama, Kenichi / Hara, Arisa / Natori, Sakurako / Yamauchi, Shohei / Yamato, Masatoshi et al. | 2014
- 90510Y
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Novel and cost-effective multiple patterning technology by means of invisible SiOxNy hardmaskJang, Linus / Moon, Young Joon / Kim, Ryoung-Han / Bencher, Christopher / Dai, Huixiong / Xie, Peng / Diehl, Daniel L. / Cao, Yong / Zeng, Wilson / Ngai, Christopher S. et al. | 2014
- 90510Z
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Manufacturability considerations for DSAFarrell, Richard A. / Hosler, Erik R. / Schmid, Gerard M. / Xu, Ji / Preil, Moshe E. / Rastogi, Vinayak / Mohanty, Nihar / Kumar, Kaushik / Cicoria, Michael J. / Hetzer, David R. et al. | 2014
- 90511A
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Patterning chemistry of HafSOx resistAmador, Jenn M. / Decker, Shawn R. / Lucchini, Stefan E. / Ruther, Rose E. / Keszler, Douglas A. et al. | 2014
- 90511B
-
EUV resists based on tin-oxo clustersCardineau, Brian / Del Re, Ryan / Al-Mashat, Hashim / Marnell, Miles / Vockenhuber, Michaela / Ekinci, Yasin / Sarma, Chandra / Neisser, Mark / Freedman, Daniel A. / Brainard, Robert L. et al. | 2014
- 90511C
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Inhomogeneity of PAGs in resist film studied by molecular-dynamics simulations for EUV lithographyToriumi, Minoru / Itani, Toshiro et al. | 2014
- 90511E
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Innovative solutions on 193 immersion-based self-aligned multiple patterningNatori, Sakurako / Yamauchi, Shohei / Hara, Arisa / Yamato, Masatoshi / Oyama, Kenichi / Yaegashi, Hidetami et al. | 2014
- 90511F
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Wet particle source identification and reduction using a new filter cleaning processUmeda, Toru / Morita, Akihiko / Shimizu, Hideki / Tsuzuki, Shuichi et al. | 2014
- 90511G
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Adsorption characteristics of lithography filters in various solvents using application-specific ratingsUmeda, Toru / Tsuzuki, Shuichi et al. | 2014
- 90511H
-
Removal of highly crosslinked resists and hybrid polymers for single micro parts fabrication and nanoimprint stamp reworkVoigt, Anja / Engelke, Rainer / Ahrens, Gisela / Bullerjahn, Franziska / Schleunitz, Arne / Klein, Jan J. / Grützner, Gabi et al. | 2014
- 90511J
-
Characterization of chemically amplified resists for electron beam lithographyYamazaki, Tomoharu / Yamamoto, Hiroki / Kozawa, Takahiro / Wang, Wen-Chuan et al. | 2014
- 90511K
-
Improved adhesion of novolac and epoxy based resists by cationic organic materials on critical substrates for high volume patterning applicationsVoigt, Anja / Ahrens, Gisela / Heinrich, Marina / Thompson, Andrew / Gruetzner, Gabi et al. | 2014
- 90511L
-
Spin on lithographic resist trim process optimization and process window evaluationKaranikas, Christos F. / Taylor, J. C. / Vaduri, Naveen / Islam, Tafsirul et al. | 2014
- 90511M
-
Modeling acid transport in chemically amplified resist filmsPatil, Abhijit A. / Doxastakis, Manolis / Stein, Gila E. et al. | 2014
- 90511O
-
Deprotonation mechanism of ionized poly(4-hydroxystyrene)Susa, Toshihiko / Okamoto, Kazumasa / Ishida, Takuya / Yamamoto, Hiroki / Kozawa, Takahiro / Fujiyoshi, Ryoko / Umegaki, Kikuo et al. | 2014
- 90511P
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Numerical analysis for resist profile after thermal process in display manufacturingDomnenko, Vitaliy / Stock, Hans-Jürgen / Shin, Sangmin / Ryu, Jonghyoek / Choi, Sung Won / Cho, Hyunwoo / Jeong, Eun-Soo / Choi, Jung-Hoe et al. | 2014
- 90511Q
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Photoresist analysis to investigate LWR generation mechanismMochida, Kenji / Nakamura, Shinichi / Kimura, Tooru / Kawai, Kazuki / Taguchi, Yoshihiko / Man, Naoki / Hashimoto, Hideki et al. | 2014
- 90511R
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Decreasing curing temperature of spin-on dielectrics by using additivesBae, Jin Hee / Han, Kwen Woo / Park, Eun Su / Yoon, Hui Chan / Na, Yoong Hee / Seo, Jin Woo / Lim, Wan Hee / Kim, Bo Sun / Jang, Jun Young / Cho, Younjin et al. | 2014
- 90511S
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Study of acid diffusion behaves form PAG by using top coat methodSekiguchi, Atsushi / Matsumoto, Yoko et al. | 2014
- 90511T
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Fluidity dependence of deprotonation kinetics of chemically amplified resistOkamoto, Kazumasa / Ishida, Takuya / Yamamoto, Hiroki / Kozawa, Takahiro / Fujiyoshi, Ryoko / Umegaki, Kikuo et al. | 2014
- 90511U
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Inorganic resist materials based on zirconium phosphonate for atomic force microscope lithographyKang, Mankyu / Kim, Seonae / Jung, JinHyuck / Kim, Heebom / Shin, Inkyun / Jeon, Chanuk / Lee, Haiwon et al. | 2014
- 90511W
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Organic-inorganic hybrid resists for EUVLSingh, Vikram / Kalyani, Vishwanath / Satyanarayana, V. S. V. / Pradeep, Chullikkattil P. / Ghosh, Subrata / Sharma, Satinder / Gonsalves, Kenneth E. et al. | 2014
- 90511X
-
Development of spin-on-carbon hard mask for advanced nodeKudo, Takanori / Rahman, M. Dalil / McKenzie, Douglas / Anyadiegwu, Clement / Doerrenbaecher, Sandra / Zahn, Wolfgang / Padmanaban, Munirathna et al. | 2014
- 90511Y
-
Effective resist profile controlLiu, Chen-Yu / Wang, Chien-Wei / Huang, Chun-Ching / Chang, Ching-Yu / Ku, Yao-Ching et al. | 2014
- 90511Z
-
Study on resist performance of chemically amplified molecular resist based on noria derivative and calixarene derivativeYamamoto, Hiroki / Kudo, Hiroto / Kozawa, Takahiro et al. | 2014
- 90512A
-
EUV resists comprised of main group organometallic oligomeric materialsPassarelli, James / Cardineau, Brian / Del Re, Ryan / Sortland, Miriam / Vockenhuber, Michaela / Ekinci, Yasin / Sarma, Chandra / Neisser, Mark / Freedman, Daniel A. / Brainard, Robert L. et al. | 2014
- 90512B
-
Novel spin-on metal hardmask materials for filling applicationsDioses, Alberto D. / Chada, Venkata / Wolfer, Elizabeth / Ng, Edward / Mullen, Salem / Yao, Huirong / Cho, JoonYeon / Padmanaban, Munirathna et al. | 2014
- 905101
-
Front Matter: Volume 9051| 2014
- 905106
-
Novel non-chemically amplified (n-CARs) negative resists for EUVLSingh, Vikram / Satyanarayana, V. S. V. / Sharma, Satinder K. / Ghosh, Subrata / Gonsalves, Kenneth E. et al. | 2014
- 905107
-
Evaluation of vacancies in positive-tone non-chemically and chemically amplified EUV / EB resists: relationship between free-volume and LEROshima, Akihiro / Hinata, Toru / Nakamura, Hirotaka / Oka, Toshitaka / Oshima, Nagayasu / O'Rourke, Brian E. / Suzuki, Ryoichi / Washio, Masakazu / Tagawa, Seiichi et al. | 2014
- 905108
-
Manufacturability improvements in EUV resist processing toward NXE:3300 processingKuwahara, Yuhei / Matsunaga, Koichi / Shimoaoki, Takeshi / Kawakami, Shinichiro / Nafus, Kathleen / Foubert, Philippe / Goethals, Anne-Marie / Shimura, Satoru et al. | 2014
- 905109
-
Investigation of interactions between metrology and lithography with a CD SEM simulatorSmith, Mark D. / Fang, Chao / Biafore, John J. / Vaglio Pret, Alessandro / Robertson, Stewart A. et al. | 2014
- 905110
-
Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour processChaudhari, Atul / Ghoshal, Tandra / Shaw, Matthew T. / Cummins, Cian / Borah, Dipu / Holmes, Justin D. / Morris, Michael A. et al. | 2014
- 905111
-
New materials for directed self-assembly for advanced patterningZhang, Jieqian / Wu, Janet / Li, Mingqi / Ginzburg, Valeriy V. / Weinhold, Jeffrey D. / Clark, Michael B. / Trefonas, Peter / Hustad, Phillip D. et al. | 2014
- 905114
-
Extending lithography with advanced materialsGuerrero, Douglas J. et al. | 2014
- 905115
-
Spin-on organic hardmask for topo-patterned substrateKomura, Kazuhiko / Hishiro, Yoshi / Wakamatsu, Goji / Takimoto, Yoshio / Nagai, Tomoki / Kimura, Tooru / Yamaguchi, Yoshikazu / Shimokawa, Tsutomu / Breyta, Greg / Arellano, Noel et al. | 2014
- 905116
-
EUV lithography and etching performance enhancement by EUV sensitive Si hard mask (EUV Si-HM) for 1Xnm hp generationShibayama, Wataru / Shigaki, Shuhei / Fujitani, Noriaki / Onishi, Ryuji / Sakamoto, Rikimaru et al. | 2014
- 905117
-
A chemical underlayer approach to mitigate shot noise in EUV contact hole patterningLi, Jin / Yasuaki, Ide / Nakasugi, Shigemasa / Misumi, Motoki / Yanagita, Hiroshi / Suzuki, Fumihiro / Pawlowski, Georg / Cho, JoonYeon / Yao, Huirong / Kudo, Takanori et al. | 2014
- 905118
-
Anti-spacer double patterningHyatt, Michael / Huang, Karen / DeVilliers, Anton / Slezak, Mark / Liu, Zhi et al. | 2014
- 905119
-
Optimization of fullerene-based negative tone chemically amplified fullerene resist for extreme ultraviolet lithographyFrommhold, A. / Yang, D. X. / McClelland, A. / Xue, X. / Ekinci, Y. / Palmer, R. E. / Robinson, A. P. G. et al. | 2014
- 905120
-
SRAF window improvement with under-coating layerHiromatsu, Takahiro / Fukui, Toru / Tsukagoshi, Kenta / Ono, Kazunori / Hashimoto, Masahiro et al. | 2014
- 905121
-
Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVLSato, Takashi / Yamakawa, Masako / Ochiai, Yumi / Okada, Yu / Makinoshima, Takashi / Takasuka, Masaaki / Echigo, Masatoshi et al. | 2014
- 905123
-
Chemical shrink materials and process for negative tone development (NTD) resistMiyamoto, Yoshihiro / Sagan, John / Padmanaban, Munirathna / Pawlowski, Georg / Nagahara, Tatsuro et al. | 2014
- 905124
-
Novel polymeric sulfonium photoacid generator and its application for chemically amplified photoresistsLiu, Juan / Qiao, Yu / Wang, Liyuan et al. | 2014
- 905125
-
Evaluation of novel hydrophilic derivatives for chemically amplified EUV resistsTanagi, Hiroyuki / Tanaka, Hiroyasu / Hayakawa, Shoichi / Furukawa, Kikuo / Yamamoto, Hiroki / Kozawa, Takahiro et al. | 2014
- 905126
-
ArF photoresist polymers with nitrogen or sulfone moieties for negative tone development processKim, Dong-Gyun / Kwon, Su-Jee / Hong, Suk-Koo / Lee, Joon Je / Lee, Hyung Rae / Yun, Hyo-jin / Baik, Ji-Hoon / Im, Dohyuk / Jang, Eujean / Lee, Jae-Woo et al. | 2014
- 905127
-
Development of novel protecting derivatives for chemically amplified extreme ultraviolet resistTanaka, Hiroyasu / Tanagi, Hiroyuki / Hayakawa, Shoichi / Furukawa, Kikuo / Yamamoto, Hiroki / Kozawa, Takahiro et al. | 2014
-
How to design a good photoresist solvent package using solubility parameters and high-throughput research [9051-26]Tate, M.P. / Cutler, C. / Sakillaris, M. / Kaufman, M. / Estelle, T. / Mohler, C. / Tucker, C. / Thackeray, J. et al. | 2014
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ICE: Ionic contrast enhancement for organic solvent negative tone develop [9051-27]Sundberg, L.K. / Wallraff, G.M. / Bozano, L.D. / Truong, H.D. / Sanchez, M.I. / Goldfarb, D.L. / Watson, J. / Petrillo, K.E. / Hinsberg, W.D. et al. | 2014
-
Effective resist profile control [9051-73]Liu, C.-Y. / Wang, C.-W. / Huang, C.-C. / Chang, C.-Y. / Ku, Y.-C. et al. | 2014
-
Evaluation of novel hydrophilic derivatives for chemically amplified EUV resists [9051-81]Tanagi, H. / Tanaka, H. / Hayakawa, S. / Furukawa, K. / Yamamoto, H. / Kozawa, T. et al. | 2014
-
Investigation of interactions between metrology and lithography with a CD SEM simulator [9051-8]Smith, M.D. / Fang, C. / Biafore, J.J. / Pret, A.V. / Robertson, S.A. et al. | 2014
-
Novel surface treatment materials for aligning block-co-polymer in directed self-assembly processes [9051-20]Someya, Y. / Wakayama, H. / Endo, T. / Sakamoto, R. et al. | 2014
-
High-volume manufacturing equipment and processing for directed self-assembly applications (Invited Paper) [9051-22]Somervell, M. / Yamauchi, T. / Okada, S. / Tomita, T. / Nishi, T. / Iijima, E. / Nakano, T. / Ishiguro, T. / Nagahara, S. / Iwaki, H. et al. | 2014
-
Directed self-assembly process integration: Fin patterning approaches and challenges [9051-21]Sayan, S. / Chan, B.T. / Gronheid, R. / Van Roey, F. / Kim, M.-S. / Williamson, L. / Nealey, P. et al. | 2014
-
Removal of highly crosslinked resists and hybrid polymers for single micro parts fabrication and nanoimprint stamp rework [9051-56]Voigt, A. / Engelke, R. / Ahrens, G. / Bullerjahn, F. / Schleunitz, A. / Klein, J.J. / Gruetzner, G. et al. | 2014
-
Modeling acid transport in chemically amplified resist films [9051-60]Patil, A.A. / Doxastakis, M. / Stein, G.E. et al. | 2014
-
Numerical analysis for resist profile after thermal process in display manufacturing [9051-63]Domnenko, V. / Stock, H.-J. / Shin, S. / Ryu, J. / Choi, S.W. / Cho, H. / Jeong, E.-S. / Choi, J.-H. et al. | 2014
-
Novel spin-on metal hardmask materials for filling applications [9051-87]Dioses, A.D. / Chada, V. / Wolfer, E. / Ng, E. / Mullen, S. / Yao, H. / Cho, J. / Padmanaban, M. et al. | 2014
-
An in-situ hard mask block copolymer approach for the fabrication of ordered, large scale, horizontally aligned, Si nanowire arrays on Si substrate [9051-18]Ghoshal, T. / Senthamaraikannan, R. / Shaw, M.T. / Holmes, J.D. / Morris, M.A. et al. | 2014
-
Investigation of cross-linking poly(methyl methacrylate) as a guiding material in block copolymer directed self-assembly [9051-19]Seidel, R. / Delgadillo, P.R. / Ramirez-Hernandez, A. / Wu, H. / Her, Y. / Yin, J. / Nealey, P. / de Pablo, J. / Gronheid, R. et al. | 2014
-
New materials for directed self-assembly for advanced patterning [9051-37]Zhang, J. / Wu, J. / Li, M. / Ginzburg, V.V. / Weinhold, J.D. / Clark, M.B. / Trefonas, P. / Hustad, P.D. et al. | 2014
-
EUV lithography and etching performance enhancement by EUV sensitive Si hard mask (EUV Si-HM) for 1Xnm hp generation [9051-42]Shibayama, W. / Shigaki, S. / Fujitani, N. / Onishi, R. / Sakamoto, R. et al. | 2014
-
Anti-spacer double patterning [9051-45]Hyatt, M. / Huang, K. / DeVilliers, A. / Slezak, M. / Liu, Z. et al. | 2014
-
Development of spin-on-carbon hard mask for advanced node [9051-72]Kudo, T. / Rahman, M.D. / McKenzie, D. / Anyadiegwu, C. / Doerrenbaecher, S. / Zahn, W. / Padmanaban, M. et al. | 2014
-
Novel non-chemically amplified (n-CARs) negative resists for EUVL [9051-5]Singh, V. / Satyanarayana, V.S.V. / Sharma, S.K. / Ghosh, S. / Gonsalves, K.E. et al. | 2014
-
Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process [9051-36]Chaudhari, A. / Ghoshai, T. / Shaw, M.T. / Cummins, C. / Borah, D. / Holmes, J.D. / Morris, M.A. et al. | 2014
-
Deprotonation mechanism of ionized poly(4-hydroxystyrene) [9051-62]Susa, T. / Okamoto, K. / Ishida, T. / Yamamoto, H. / Kozawa, T. / Fujiyoshi, R. / Umegaki, K. et al. | 2014
-
Study on resist performance of chemically amplified molecular resist based on noria derivative and calixarene derivative [9051-74]Yamamoto, H. / Kudo, H. / Kozawa, T. et al. | 2014
-
Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL [9051-77]Sato, T. / Yamakawa, M. / Ochiai, Y. / Okada, Y. / Makinoshima, T. / Takasuka, M. / Echigo, M. et al. | 2014
-
Chemical shrink materials and process for negative tone development (NTD) resist [9051-79]Miyamoto, Y. / Sagan, J. / Padmanaban, M. / Pawlowski, G. / Nagahara, T. et al. | 2014
-
Line width roughness reduction by rational design of photoacid generator for submillisecond laser post-exposure bake [9051-16]Jiang, J. / Thompson, M.O. / Ober, C.K. et al. | 2014
-
Positive tone cross-linked resists based on photoacid inhibition of cross linking [9051-13]Lawson, R.A. / Chun, J.S. / Neisser, M. / Tolbert, L.M. / Henderson, C.L. et al. | 2014
-
Robust complementary technique with multiple-patterning for sub-10 nm node device [9051-30]Oyama, K. / Yamauchi, S. / Natori, S. / Hara, A. / Yamato, M. / Yaegashi, H. et al. | 2014
-
Extending lithography with advanced materials (Invited Paper) [9051-40]Guerrero, D.J. et al. | 2014
-
Inhomogeneity of PAGs in resist film studied by molecular-dynamics simulations for EUV lithography [9051-49]Toriumi, M. / Itani, T. et al. | 2014
-
Improved adhesion of novolac and epoxy based resists by cationic organic materials on critical substrates for high volume patterning applications [9051-59]Voigt, A. / Ahrens, G. / Heinrich, M. / Thompson, A. / Gruetzner, G. et al. | 2014
-
SRAF window improvement with under-coating layer [9051-76]Hiromatsu, T. / Fukui, T. / Tsukagoshi, K. / Ono, K. / Hashimoto, M. et al. | 2014
-
Assessing SEM contour based OPC models quality using rigorous simulation [9051-9]Weisbuch, F. / Narayana, A.S. et al. | 2014
-
Methods of controlling cross-linking in negative-tone resists [9051-25]Lawson, R.A. / Chun, J.S. / Neisser, M. / Tolbert, L.M. / Henderson, C.L. et al. | 2014
-
Recent progress on multiple-patterning process [9051-33]Yaegashi, H. / Oyama, K. / Hara, A. / Natori, S. / Yamauchi, S. / Yamato, M. et al. | 2014
-
Characterization of chemically amplified resists for electron beam lithography [9051-58]Yamazaki, T. / Yamamoto, H. / Kozawa, T. / Wang, W.-C. et al. | 2014
-
Development of novel protecting derivatives for chemically amplified extreme ultraviolet resist [9051-83]Tanaka, H. / Tanagi, H. / Hayakawa, S. / Furukawa, K. / Yamamoto, H. / Kazawa, T. et al. | 2014
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SEM simulation for 2D and 3D inspection metrology and defect review [9051-10]Levi, S. / Schwarzband, I. / Khristo, S. / Ivanchenko, Y. / Adan, O. et al. | 2014
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Process optimization of templated DSA flows [9051-17]Gronheid, R. / Bekaert, J. / Kuppuswamy, V.-K.M. / Vandenbroeck, N. / Doise, J. / Cao, Y. / Lin, G. / Sayan, S. / Parnell, D. / Somervell, M. et al. | 2014
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In-situ analysis of defect formation in coat develop track process [9051-24]Harumoto, M. / Stokes, H. / Tamada, O. / Miyagi, T. / Kaneyama, K. / Pieczulewski, C. / Asai, M. et al. | 2014
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Novel and cost-effective multiple patterning technology by means of invisible SiO~xN~y hardmask [9051-34]Jang, L. / Moon, Y.J. / Kim, R.-H. / Bencher, C. / Dai, H. / Xie, P. / Diehl, D.L. / Cao, Y. / Zeng, W. / Ngai, C.S. et al. | 2014
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Spin-on organic hardmask for topo-patterned substrate [9051-41]Komura, K. / Hishiro, Y. / Wakamatsu, G. / Takimoto, Y. / Nagai, T. / Kimura, T. / Yamaguchi, Y. / Shimokawa, T. / Breyta, G. / Arellano, N. et al. | 2014
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Study of acid diffusion behaves form PAG by using top coat method [9051-67]Sekiguchi, A. / Matsumoto, Y. et al. | 2014
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Novel polymeric sulfonium photoacid generator and its application for chemically amplified photoresists [9051-80]Liu, J. / Qiao, Y. / Wang, L. et al. | 2014
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ArF photoresist polymers with nitrogen or sulfone moieties for negative tone development process [9051-82]Kim, D.-G. / Kwon, S.-J. / Hong, S.-K. / Lee, J.J. / Lee, H.R. / Yun, H.J. / Baik, J.-H. / Im, D. / Jang, E. / Lee, J.-W. et al. | 2014
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Nanopatterning with tailored molecules [9051-15]Wieberger, F. / Kolb, T. / Neuber, C. / Ober, C.K. / Schmidt, H.-W. et al. | 2014
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Manufacturability considerations for DSA [9051-35]Farrell, R.A. / Hosler, E.R. / Schmid, G.M. / Xu, J. / Preil, M.E. / Rastogi, V. / Mohanty, N. / Kumar, K. / Cicoria, M.J. / Hetzer, D.R. et al. | 2014
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EUV resists comprised of main group organometallic oligomeric materials [9051-86]Passarelli, J. / Cardineau, B. / Del Re, R. / Sortland, M. / Vockenhuber, M. / Ekinci, Y. / Sarma, C. / Neisser, M. / Freedman, D.A. / Brainard, R.L. et al. | 2014
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Manufacturability improvements in EUV resist processing toward NXE:3300 processing [9051-7]Kuwahara, Y. / Matsunaga, K. / Shimoaoki, T. / Kawakami, S. / Nafus, K. / Foubert, P. / Goethals, A.-M. / Shimura, S. et al. | 2014
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Wet particle source identification and reduction using a new filter cleaning process [9051-53]Umeda, T. / Morita, A. / Shimizu, H. / Tsuzuki, S. et al. | 2014
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Photoresist analysis to investigate LWR generation mechanism [9051-64]Mochida, K. / Nakamura, S. / Kimura, T. / Kawai, K. / Taguchi, Y. / Man, N. / Hashimoto, H. et al. | 2014
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Organic-inorgnaic hybrid resists for EUVL [9051-71]Singh, V. / Kalyani, V. / Satyanarayana, V.S.V. / Pradeep, C.P. / Ghosh, S. / Sharma, S. / Gonsalves, K.E. et al. | 2014
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EUV resists based on tin-oxo clusters [9051-48]Cardineau, B. / Del Re, R. / Al-Mashat, H. / Marnell, M. / Vockenhuber, M. / Ekinci, Y. / Sarma, C. / Neisser, M. / Freedman, D.A. / Brainard, R.L. et al. | 2014
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Fluidity dependence of deprotonation kinetics of chemically amplified resist [9051-68]Okamoto, K. / Ishida, T. / Yamamoto, H. / Kozawa, T. / Fujiyoshi, R. / Umegaki, K. et al. | 2014
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Chiral nanomaterial fabrication by means of on-edge lithography [9051-12]Dietrich, K. / Lehr, D. / Puffky, O. / Kley, E.-B. / Tunnermann, A. et al. | 2014
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An in situ analysis of resist dissolution in alkali-based and organic solvent-based developers using high speed atomic force microscopy [9051-23]Santillan, J.J. / Shichiri, M. / Itani, T. et al. | 2014
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Introduction of an innovative water based photoresist stripping process using intelligent fluids [9051-28]Rudolph, M. / Thrun, X. / Schumann, D. / Hohne, A. / Esche, S. / Hohle, C. et al. | 2014
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Reduction of image placement error on photomask-making for multiple patterning [9051-29]Hiromatsu, T. / Fukui, T. / Tsukagoshi, K. / Ono, K. / Hashimoto, M. et al. | 2014
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Advanced develop processes for reducing defects related with e-beam resists [9051-31]Lee, B. / Han, S.-J. / Moon, S.-G. / Kim, H.B. et al. | 2014
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Spin on lithographic resist trim process optimization and process window evaluation [9051-43]Karanikas, C.F. / Taylor, J.C. / Vaduri, N. / Islam, T. et al. | 2014
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Decreasing curing temperature of spin-on dielectrics by using additives [9051-65]Bae, J.H. / Han, K.W. / Park, E.S. / Yoon, H.C. / Na, Y.H. / Seo, J.W. / Lim, W.H. / Kim, B.S. / Jang, J.Y. / Cho, Y. et al. | 2014
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Evaluation of vacancies in positive-tone non-chemically and chemically amplified EUV / EB resists: relationship between free-volume and LER [9051-6]Oshima, A. / Hinata, T. / Nakamura, H. / Oka, T. / Oshima, N. / O Rourke, B.E. / Suzuki, R. / Washio, M. / Tagawa, S. et al. | 2014
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A chemical underlayer approach to mitigate shot noise in EUV contact hole patterning [9051-44]Li, J. / Yasuaki, I. / Nakasugi, S. / Misumi, M. / Yanagita, H. / Suzuki, F. / Pawlowski, G. / Cho, J. / Yao, H. / Kudo, T. et al. | 2014
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Optimization of fullerene-based negative tone chemically amplified fullerene resist for extreme ultraviolet lithography [9051-46]Frommhold, A. / Yang, D.X. / McClelland, A. / Xue, X. / Ekinci, Y. / Palmer, R.E. / Robinson, A.P.G. et al. | 2014
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Patterning chemistry of HafSOx resist [9051-47]Amador, J.M. / Decker, S.R. / Lucchini, S.E. / Ruther, R.E. / Keszler, D.A. et al. | 2014
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Innovative solutions on 193 immersion-based self-aligned multiple patterning [9051-52]Natori, S. / Yamauchi, S. / Hara, A. / Yamato, M. / Oyama, K. / Yaegashi, H. et al. | 2014
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Adsorption characteristics of lithography filters in various solvents using application-specific ratings [9051-54]Umeda, T. / Tsuzuki, S. et al. | 2014
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Inorganic resist materials based on zirconium phosphonate for atomic force microscope lithography [9051-69]Kang, M. / Kim, S. / Jung, J. / Kim, H. / Shin, I. / Jeon, C. / Lee, H. et al. | 2014