Optical inspection of photomasks: What's next? (English)
- New search for: Brooks, George W.
- New search for: Brooks, George W.
In:
Proc. SPIE
;
12806
; 1280607
;
2023
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ISBN:
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ISSN:
- Conference paper / Electronic Resource
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Title:Optical inspection of photomasks: What's next?
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Contributors:Brooks, George W. ( author )
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Conference:Bay Area Chrome Users Society Symposium 1982 ; 1982 ; Santa Clara, CA, United States
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Published in:Proc. SPIE ; 12806 ; 1280607
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Publisher:
- New search for: SPIE
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Publication date:2023-10-10
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ISBN:
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ISSN:
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DOI:
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Type of media:Conference paper
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Type of material:Electronic Resource
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Language:English
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Source:
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 128060A
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Functional testing of chrome materialsHedgcoth, Virgle et al. | 2023
- 128060B
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Process chemistry applicable to chrome materialCaple, Ken et al. | 2023
- 128060C
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Photoresist thickness measurementQuinn, Robert et al. | 2023
- 128060D
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Mask requirements for 1:1 lithographyKing, Michael C. et al. | 2023
- 128060E
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Correlation of visual vs machine inspection of chrome blanks and finished masksHisano, T. / Shinozaki, T. et al. | 2023
- 128060F
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Panel discussion: Quality at what price?| 2023
- 128060G
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BACUS 1982 Guest SpeakerAngel, David et al. | 2023
- 1280601
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Front Matter: Volume 12806| 2023
- 1280602
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BACUS Keynote AddressLamey, Pat et al. | 2023
- 1280603
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Panel discussion: So, where do we go from here?| 2023
- 1280604
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Glass and quartz substrates for photomask fabricationZinsmeister, Gilbert J. et al. | 2023
- 1280605
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The performance of chrome material with useNoll, Humbert / Johnson, Paul et al. | 2023
- 1280606
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High quality blanksHarada, Shoichi et al. | 2023
- 1280607
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Optical inspection of photomasks: What's next?Brooks, George W. et al. | 2023
- 1280608
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E-beam materialsLierman, Steve / Hecht, Marta et al. | 2023
- 1280609
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Pellicles and alternative mask materialsHerschel, Ron et al. | 2023