Exposure dose dependence on line edge roughness of a latent image in electron beam/extreme ultraviolet lithographies studied by Monte Carlo technique (Unknown)
- New search for: Saeki, Akinori
- New search for: Kozawa, Takahiro
- New search for: Tagawa, Seiichi
- New search for: Cao, Heidi B.
- New search for: Deng, Hai
- New search for: Leeson, Michael J.
- New search for: Saeki, Akinori
- New search for: Kozawa, Takahiro
- New search for: Tagawa, Seiichi
- New search for: Cao, Heidi B.
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In:
Journal of Micro/Nanolithography, MEMS and MOEMS
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6
, 4
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043004
;
2007
- Article (Journal) / Electronic Resource
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Title:Exposure dose dependence on line edge roughness of a latent image in electron beam/extreme ultraviolet lithographies studied by Monte Carlo technique
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Additional title:J. Micro/Nanolith. MEMS MOEMS
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Contributors:Saeki, Akinori ( author ) / Kozawa, Takahiro ( author ) / Tagawa, Seiichi ( author ) / Cao, Heidi B. ( author ) / Deng, Hai ( author ) / Leeson, Michael J. ( author )
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Published in:Journal of Micro/Nanolithography, MEMS and MOEMS ; 6, 4 ; 043004
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Publisher:
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Publication date:2007-10-18
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ISSN:
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Coden:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:Unknown
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Keywords:
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Source:
Table of contents – Volume 6, Issue 4
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 040101
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Next-Generation LithographyLin, Burn J. et al. | 2007
- 043001
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Double-exposure mask synthesis using inverse lithographyPoonawala, Amyn / Milanfar, Peyman et al. | 2007
- 043002
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Optical designs of grazing incidence collector for extreme ultraviolet lithographyZocchi, Fabio E. / Benedetti, Enrico et al. | 2007
- 043003
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Modeling and optimization of debris mitigation systems for laser and discharge-produced plasma in extreme ultraviolet lithography devicesSizyuk, Valeryi / Hassanein, Ahmed / Bakshi, Vivek et al. | 2007
- 043004
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Exposure dose dependence on line edge roughness of a latent image in electron beam/extreme ultraviolet lithographies studied by Monte Carlo techniqueSaeki, Akinori / Kozawa, Takahiro / Tagawa, Seiichi / Cao, Heidi B. / Deng, Hai / Leeson, Michael J. et al. | 2007
- 043005
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Impact of photoresist composition and polymer chain length on line edge roughness probed with a stochastic simulatorPhilippou, Alexander / Mülders, Thomas / Schöll, Eckehard et al. | 2007
- 043006
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Limiting factors for electron beam lithography when using ultra-thin hydrogen silsesquioxane layersGrigorescu, Anda E. / van der Krogt, Marco C. / Hagen, Cornelis W. et al. | 2007
- 043007
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Micro–Rayleigh-Bénard convection polymerase chain reaction systemYao, Da-Jeng / Chen, Jhao-Ronga / Ju, Woan-Tying et al. | 2007
- 043008
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Governing equation and fabrication techniques for ionic conductive polymer filmsTsai, Nan-Chyuan / Sue, Chung-Yang et al. | 2007
- 043009
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Ultra-high-resolution monolithic thermal bubble inkjet print headWang, Yan / Bokor, Jeffrey et al. | 2007
- 043010
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Lens-cementing technology used in optical systems of deep-ultroviolet wavelength regionsTakahashi, Takashi / Okumura, Toshiki / Suzuki, Etsuya / Kojima, Tatsuya / Suzuki, Hitoshi / Tojo, Toru / Machida, Koji et al. | 2007
- 043011
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Comparison of three ANSYS finite element tools for analysis of MEMS micromirrorsJafari, Reza / Kirk, Andrew G. et al. | 2007
- 043012
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Analytic torque model for two-axis microelectromechanical system mirrorsEdwards, Clinton L. / Boone, Bradley G. / Levine, William S. / Davis, Christopher C. et al. | 2007
- 043013
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Parameter extraction from simple electrical measurements on surface micromachined cantileversBhat, Somashekara / Bhattacharya, Enakshi et al. | 2007
- 043014
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Wafer scale integration of catalyst dots into nonplanar microsystemsGjerde, Kjetil / Kjelstrup-Hansen, Jakob / Gammelgaard, Lauge / Bøggild, Peter et al. | 2007
- 043015
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Photolithographic patterning of bihelical tracks onto conical substratesPurvis, Alan / McWilliam, Richard / Johnson, Simon / Seed, N. Luke / Williams, Gavin L. / Maiden, Andrew / Ivey, Peter A. et al. | 2007
- 049701
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Identification of process parameters for microfabrication with excimer laserAgrawal, Vikas / Devani, Ritesh / Mitra, Sushanta K. et al. | 2007