Layout dependent effects analysis on 28nm process (English)
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- New search for: Wong, Waisum
- New search for: Song, Huiyuan
- New search for: Xu, Wei
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- New search for: Li, Helen
- New search for: Zhang, Mealie
- New search for: Wong, Waisum
- New search for: Song, Huiyuan
- New search for: Xu, Wei
- New search for: Hurat, Philippe
- New search for: Ding, Hua
- New search for: Zhang, Yifan
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In:
Proc. SPIE
;
9427
; 94270F
;
2015
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ISBN:
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ISSN:
- Conference paper / Electronic Resource
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Title:Layout dependent effects analysis on 28nm process
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Contributors:Li, Helen ( author ) / Zhang, Mealie ( author ) / Wong, Waisum ( author ) / Song, Huiyuan ( author ) / Xu, Wei ( author ) / Hurat, Philippe ( author ) / Ding, Hua ( author ) / Zhang, Yifan ( author ) / Cote, Michel ( author ) / Huang, Jason ( author )
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Conference:Design-Process-Technology Co-optimization for Manufacturability IX ; 2015 ; San Jose,California,United States
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Published in:Proc. SPIE ; 9427 ; 94270F
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Publisher:
- New search for: SPIE
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Publication date:2015-03-18
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ISBN:
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ISSN:
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DOI:
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Type of media:Conference paper
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Type of material:Electronic Resource
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Language:English
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Source:
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 94270A
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An efficient auto TPT stitch guidance generation for optimized standard cell designSamboju, Nagaraj C. / Choi, Soo-Han / Arikati, Srini / Cilingir, Erdem et al. | 2015
- 94270B
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Yield-aware mask assignment using positive semi-definite relaxation in LELECUT triple patterningKohira, Yukihide / Kodama, Chikaaki / Matsui, Tomomi / Takahashi, Atsushi / Nojima, Shigeki / Tanaka, Satoshi et al. | 2015
- 94270C
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DTCO at N7 and beyond: patterning and electrical compromises and opportunitiesRyckaert, Julien / Raghavan, Praveen / Schuddinck, Pieter / Trong, Huynh Bao / Mallik, Arindam / Sakhare, Sushil S. / Chava, Bharani / Sherazi, Yasser / Leray, Philippe / Mercha, Abdelkarim et al. | 2015
- 94270D
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Layout optimization with assist features placement by model based rule tables for 2x node random contactJun, Jinhyuck / Park, Minwoo / Park, Chanha / Yang, Hyunjo / Yim, Donggyu / Do, Munhoe / Lee, Dongchan / Kim, Taehoon / Choi, Junghoe / Luk-Pat, Gerard et al. | 2015
- 94270E
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Standard cell design in N7: EUV vs. immersionChava, Bharani / Rio, David / Sherazi, Yasser / Trivkovic, Darko / Gillijns, Werner / Debacker, Peter / Raghavan, Praveen / Elsaid, Ahmad / Dusa, Mircea / Mercha, Abdelkarim et al. | 2015
- 94270F
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Layout dependent effects analysis on 28nm processLi, Helen / Zhang, Mealie / Wong, Waisum / Song, Huiyuan / Xu, Wei / Hurat, Philippe / Ding, Hua / Zhang, Yifan / Cote, Michel / Huang, Jason et al. | 2015
- 94270G
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Breaking through 1D layout limitations and regaining 2D design freedom Part I: 2D layout decomposition and stitching techniques for hybrid optical and self-aligned multiple patterningLiu, Hongyi / Zhou, Jun / Chen, Yijian et al. | 2015
- 94270H
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Full chip two-layer CD and overlay process window analysisGupta, Rachit / Shang, Shumay / Sturtevant, John et al. | 2015
- 94270I
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Quantitative evaluation of manufacturability and performance for ILT produced mask shapes using a single-objective functionChoi, Heon / Wang, Wei-long / Kallingal, Chidam et al. | 2015
- 94270J
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Akaike information criterion to select well-fit resist modelsBurbine, Andrew / Fryer, David / Sturtevant, John et al. | 2015
- 94270K
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Fast source optimization by clustering algorithm based on lithography propertiesTawada, Masashi / Hashimoto, Takaki / Sakanushi, Keishi / Nojima, Shigeki / Kotani, Toshiya / Yanagisawa, Masao / Togawa, Nozomu et al. | 2015
- 94270M
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Statistical modeling of SRAM yield performance and circuit variabilityCheng, Qi / Chen, Yijian et al. | 2015
- 94270O
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Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and process variability at 7nm technology nodeSakhare, Sushil / Trivkovic, Darko / Mountsier, Tom / Kim, Min-Soo / Mocuta, Dan / Ryckaert, Julien / Mercha, Abdelkarim / Verkest, Diederik / Thean, Aaron / Dusa, Mircea et al. | 2015
- 94270P
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Incorporating DSA in multipatterning semiconductor manufacturing technologiesBadr, Yasmine / Torres, J. A. / Ma, Yuansheng / Mitra, Joydeep / Gupta, Puneet et al. | 2015
- 94270Q
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Design layout analysis and DFM optimization using topological patternsXu, Ji / Krishnamoorthy, Karthik N. / Teoh, Edward / Dai, Vito / Capodieci, Luigi / Sweis, Jason / Lai, Ya-Chieh et al. | 2015
- 94270R
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Automation for pattern library creation and in-design optimizationDeng, Rock / Zou, Elain / Hong, Sid / Wang, Jinyan / Zhang, Yifan / Sweis, Jason / Lai, Ya-Chieh / Ding, Hua / Huang, Jason et al. | 2015
- 94270S
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A new lithography hotspot detection framework based on AdaBoost classifier and simplified feature extractionMatsunawa, Tetsuaki / Gao, Jhih-Rong / Yu, Bei / Pan, David Z. et al. | 2015
- 94270T
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A methodology to optimize design pattern context size for higher sensitivity to hotspot detection using pattern association tree (PAT)Somani, Shikha / Pathak, Piyush / Verma, Piyush / Madhavan, Sriram / Capodieci, Luigi et al. | 2015
- 94270U
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20nm CMP model calibration with optimized metrology data and CMP model applicationsKatakamsetty, Ushasree / Koli, Dinesh / Yeo, Sky / Hui, Colin / Ghulghazaryan, Ruben / Aytuna, Burak / Wilson, Jeff et al. | 2015
- 94270V
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Topography aware DFM rule based scoring for silicon yield modelingTripathi, Vikas / Katakamsetty, Ushasree / Yeo, Sky / Hui, Colin et al. | 2015
- 94270W
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A compact model to predict pillar-edge-roughness effects on 3D vertical nanowire MOSFETs using the perturbation methodWang, Pu / Hong, Chuyang / Cheng, Qi / Chen, Yijian et al. | 2015
- 94270X
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Efficient etch bias compensation techniques for accurate on-wafer patterningSalama, Mohamed / Hamouda, Ayman et al. | 2015
- 94270Y
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An efficient lithographic hotspot severity analysis methodology using Calibre PATTERN MATCHING and DRC applicationDeng, ZeXi / Du, ChunShan / Hong, Lin / Zhang, LiGuo / Wang, JinYan et al. | 2015
- 94270Z
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A holistic methodology to drive process window entitlement and its application to 20nm logicShokeen, Lalit / Hamouda, Ayman / Terry, Mark / Dechene, Dan J. / Hsu, Stephen / Crouse, Michael / Li, Pengcheng / Gronlund, Keith / Zhang, Gary et al. | 2015
- 942701
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Front Matter: Volume 9427| 2015
- 942702
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The daunting complexity of scaling to 7NM without EUV: pushing DTCO to the extremeLiebmann, Lars / Chu, Albert / Gutwin, Paul et al. | 2015
- 942703
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High coverage of litho hotspot detection by weak pattern scoringPark, Jinho / Kim, NamJae / Kang, Jae-hyun / Paek, Seung Weon / Kwon, Steve / Shafee, Marwah / Madkour, Kareem / ElManhawy, Wael / Kwan, Joe / Brunet, Jean-Marie et al. | 2015
- 942704
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A pattern-based methodology for optimizing stitches in double-patterning technologyWang, Lynn T. / Madhavan, Sriram / Dai, Vito / Capodieci, Luigi et al. | 2015
- 942705
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Fast detection of manufacturing systematic design pattern failures causing device yield lossLe Denmat, Jean-Christophe / Feldman, Nelly / Riewer, Olivia / Yesilada, Emek / Vallet, Michel / Suzor, Christophe / Talluto, Salvatore et al. | 2015
- 942706
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Topology and context-based pattern extraction using line-segment Voronoi diagramDey, Sandeep K. / Cheilaris, Panagiotis / Casati, Nathalie / Gabrani, Maria / Papadopoulo, Evanthia et al. | 2015
- 942707
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A systematic framework for evaluating standard cell middle-of-line (MOL) robustness for multiple patterningXu, Xiaoqing / Cline, Brian / Yeric, Greg / Yu, Bei / Pan, David Z. et al. | 2015
- 942708
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Self-aligned quadruple patterning-compliant placementNakajima, Fumiharu / Kodama, Chikaaki / Nakayama, Koichi / Nojima, Shigeki / Kotani, Toshiya et al. | 2015
- 942709
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Impact of a SADP flow on the design and process for N10/N7 metal layersGillijns, W. / Sherazi, S. M. Y. / Trivkovic, D. / Chava, B. / Vandewalle, B. / Gerousis, V. / Raghavan, P. / Ryckaert, J. / Mercha, K. / Verkest, D. et al. | 2015
- 942710
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Practical DTCO through design/patterning explorationLafferty, Neal / Meiring, Jason / Bahnas, Mohamed / O'Neill, Joseph / Endo, Toshikazu / Schumacher, Dan / Culp, James / Wawrzynski, Glenn / Lamba, Gurpreet S. / Adam, Kostas et al. | 2015
- 942711
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Comparison of OPC job prioritization schemes to generate data for mask manufacturingLewis, Travis / Veeraraghavan, Vijay / Jantzen, Kenneth / Kim, Stephen / Park, Minyoung / Russell, Gordon / Simmons, Mark et al. | 2015
- 942712
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VLSI physical design analyzer: A profiling and data mining toolSomani, Shikha / Verma, Piyush / Madhavan, Sriram / Batarseh, Fadi / Pack, Robert C. / Capodieci, Luigi et al. | 2015
- 942713
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The cell pattern correction through design-based metrologyKim, Yonghyeon / Lee, Kweonjae / Chang, Jinman / Kim, Taeheon / Han, Daehan / Lee, Kyusun / Hong, Aeran / Kang, Jinyoung / Choi, Bumjin / Lee, Joosung et al. | 2015
- 942714
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Breaking through 1D layout limitations and regaining 2D design freedom part II: stitching yield modeling and optimizationZhou, Jun / Liu, Hongyi / Han, Ting / Chen, Yijian et al. | 2015
- 942715
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Automatic DFM methodology for bit line pattern dummyBahr, Mohamed et al. | 2015