Pixelated source optimization for optical lithography via particle swarm optimization (Unknown)
- New search for: Wang, Lei
- New search for: Li, Sikun
- New search for: Wang, Xiangzhao
- New search for: Yan, Guanyong
- New search for: Yang, Chaoxing
- New search for: Wang, Lei
- New search for: Li, Sikun
- New search for: Wang, Xiangzhao
- New search for: Yan, Guanyong
- New search for: Yang, Chaoxing
In:
Journal of Micro/Nanolithography, MEMS, and MOEMS
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15
, 1
;
013506
;
2016
- Article (Journal) / Electronic Resource
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Title:Pixelated source optimization for optical lithography via particle swarm optimization
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Additional title:J. Micro/Nanolith. MEMS MOEMS
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Contributors:Wang, Lei ( author ) / Li, Sikun ( author ) / Wang, Xiangzhao ( author ) / Yan, Guanyong ( author ) / Yang, Chaoxing ( author )
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Published in:Journal of Micro/Nanolithography, MEMS, and MOEMS ; 15, 1 ; 013506
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Publisher:
- New search for: Society of Photo-Optical Instrumentation Engineers
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Publication date:2016-02-19
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ISSN:
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Coden:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:Unknown
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Keywords:
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Source:
Table of contents – Volume 15, Issue 1
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 010101
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Our Top Reviewers of 2015Mack, Chris et al. | 2015
- 010102
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2015 List of Reviewers| 2016
- 010501
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Low cost batch fabrication of microdevices using ultraviolet light-emitting diode photolithography techniqueLee, Neam Heng / Swamy, Varghese / Ramakrishnan, Narayanan et al. | 2016
- 013501
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Importance of surface modification of a microcontact stamp for pattern fidelity of soluble organic semiconductorsPark, Hea-Lim / Lee, Bo-Yeon / Kim, Se-Um / Suh, Jeng-Hun / Kim, Min-Hoi / Lee, Sin-Doo et al. | 2016
- 013502
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Effect of electron beam irradiation on thin metal films on glass surfaces in a submicrometer scaleKomissarenko, Filipp E. / Mukhin, Ivan S. / Golubok, Alexander O. / Nikonorov, Nikolay V. / Prosnikov, Mikhail A. / Sidorov, Alexander I. et al. | 2016
- 013503
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Modeling and measuring the transport and scattering of energetic debris in an extreme ultraviolet plasma sourceSporre, John R. / Elg, Daniel T. / Kalathiparambil, Kishor K. / Ruzic, David N. et al. | 2016
- 013504
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Layout pattern analysis using the Voronoi diagram of line segmentsDey, Sandeep Kumar / Cheilaris, Panagiotis / Gabrani, Maria / Papadopoulou, Evanthia et al. | 2016
- 013505
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Rigorous assessment of patterning solution of metal layer in 7 nm technology nodeGao, Weimin / Ciofi, Ivan / Saad, Yves / Matagne, Philippe / Bachmann, Michael / Gillijns, Werner / Lucas, Kevin / Demmerle, Wolfgang / Schmoeller, Thomas et al. | 2016
- 013506
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Pixelated source optimization for optical lithography via particle swarm optimizationWang, Lei / Li, Sikun / Wang, Xiangzhao / Yan, Guanyong / Yang, Chaoxing et al. | 2016
- 013507
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Architectural strategies in standard-cell design for the 7 nm and beyond technology nodeSherazi, Syed Muhammad Yasser / Chava, Bharani / Debacker, Peter / Bardon, Marie Garcia / Schuddinck, Pieter / Firouzi, Farshad / Raghavan, Praveen / Mercha, Abdelkarim / Verkest, Diederik / Ryckaert, Julien et al. | 2016
- 013508
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Coarse-grained molecular dynamics modeling of the kinetics of lamellar block copolymer defect annealingPeters, Andrew J. / Lawson, Richard A. / Nation, Benjamin D. / Ludovice, Peter J. / Henderson, Clifford L. et al. | 2016
- 013509
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Prediction of biases for optical proximity correction through partial coherent identificationJeong, Moongyu / Hahn, Jae W. et al. | 2016
- 013510
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Investigation of defect detectability for extreme ultraviolet patterned mask using two types of high-throughput electron-beam inspection systemsIida, Susumu / Hirano, Ryoichi / Amano, Tsuyoshi / Watanabe, Hidehiro et al. | 2016
- 013511
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Grayscale lithography—automated mask generation for complex three-dimensional topographyLoomis, James / Ratnayake, Dilan / McKenna, Curtis / Walsh, Kevin M. et al. | 2016
- 014001
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Evaluation of the effect of data quality on the profile uncertainty of critical dimension small angle x-ray scatteringSunday, Daniel F. / List, Scott / Chawla, Jasmeet S. / Joseph Kline, R. et al. | 2016
- 014002
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Extreme ultraviolet multilayer defect analysis and geometry reconstructionXu, Dongbo / Evanschitzky, Peter / Erdmann, Andreas et al. | 2016
- 014003
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Lateral tip control effects in critical dimension atomic force microscope metrology: the large tip limitDixson, Ronald G. / Orji, Ndubuisi G. / Goldband, Ryan S. et al. | 2016
- 014004
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Optical critical dimension metrology for directed self-assembly assisted contact hole shrinkDixit, Dhairya / Green, Avery / Hosler, Erik R. / Kamineni, Vimal / Preil, Moshe E. / Keller, Nick / Race, Joseph / Chun, Jun Sung / O’Sullivan, Michael / Khare, Prasanna et al. | 2016
- 014501
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Interference ablation of nanogratings with different duty cycles on gold filmsZhai, Tianrui / Wu, Xiaofeng / Wang, Yonglu / Zhang, Xinping et al. | 2016
- 014502
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Photomask design method for pattern-integrated interference lithographyLeibovici, Matthieu C. R. / Gaylord, Thomas K. et al. | 2016
- 014503
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Process optimization for lattice-selective wet etching of crystalline silicon structuresDixson, Ronald G. / Guthrie, William F. / Allen, Richard A. / Orji, Ndubuisi G. / Cresswell, Michael W. / Murabito, Christine E. et al. | 2016
- 015001
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Fabrication and characterization of a microaccelerometer based on resonant-tunneling diodesLi, Mengwei / Deng, Tao / Du, Kang / Chu, WeiHang / Liu, Jun / Chen, Houjin / Liu, Zewen et al. | 2016
- 015002
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Flexible, high-density microphotodiode array with integrated sputtered iridium oxide electrodes for retinal stimulationYang, Frank / Chang, Mao-Yen / Yang, Chung-Hua / Teng, Chih-Ciao / Fan, Long-Sheng et al. | 2016
- 015501
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In-plane monolithic microscanner with two synchronized, self-aligned flat mirrors and compliant springsElhady, Alaa / Mahmoud, Mohamed A. E. / Khalil, Diaa et al. | 2016