Next generation imprint equipment for patterning high quality micro-optical elements (English)
- New search for: Kolli, Vijay Ramya
- New search for: Kloiber, Fabian
- New search for: Drieschner, Simon
- New search for: Liddle, J. Alexander
- New search for: Ruiz, Ricardo
- New search for: Kolli, Vijay Ramya
- New search for: Kloiber, Fabian
- New search for: Drieschner, Simon
In:
Proc. SPIE
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12497
; 124970B
;
2023
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ISBN:
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ISSN:
- Conference paper / Electronic Resource
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Title:Next generation imprint equipment for patterning high quality micro-optical elements
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Contributors:Liddle, J. Alexander ( editor ) / Ruiz, Ricardo ( editor ) / Kolli, Vijay Ramya ( author ) / Kloiber, Fabian ( author ) / Drieschner, Simon ( author )
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Conference:Novel Patterning Technologies 2023 ; 2023 ; San Jose, California, United States
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Published in:Proc. SPIE ; 12497 ; 124970B
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Publisher:
- New search for: SPIE
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Publication date:2023-05-01
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ISBN:
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ISSN:
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DOI:
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Type of media:Conference paper
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Type of material:Electronic Resource
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Language:English
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Source:
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 124970A
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Replication of 3D patterns from a grayscale resist master by nanoimprint processWarsono, Api / Fernandez Rodas, Diana / Rêche, Jérôme / De Lehelle d'Affroux, Anaïs / Berard Bergery, Sébastien et al. | 2023
- 124970B
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Next generation imprint equipment for patterning high quality micro-optical elementsKolli, Vijay Ramya / Kloiber, Fabian / Drieschner, Simon et al. | 2023
- 124970C
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High transfer fidelity via nanoimprint lithography of patterns for bioelectronics applicationsGüell-Grau, P. / Asbahi, M. / Smout, S. / Willegems, M. / Kotowska, B. K. / Traub, M. C. / Lenci, S. / Storace, E. / Severi, S. et al. | 2023
- 124970D
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Advances and applications in nanoimprint lithographyMaruyama, Naoki / Sato, Kazuhiro / Suzaki, Yoshio / Jimbo, Satoru / Yamashita, Isamu / Yamamoto, Kenji / Yamamoto, Kiyohito / Hiura, Mitsuru / Takabayashi, Yukio et al. | 2023
- 124970E
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Fabrication of dual damascene structure with nanoimprint lithography and dry-etchingTakeuchi, Norikazu / Hasegawa, Genna / Komukai, Toshiaki / Iwasaki, Takahiro / Hatano, Masayuki / Komori, Motofumi / Kono, Takuya et al. | 2023
- 124970F
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Novel approach of patterning technologies enabling monolithic micro-optical componentsWolf, J. / Ferstl, M. / Voigt, A. / Grützner, S. / Schleunitz, A. / Grützner, G. et al. | 2023
- 124970G
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Scalable digital atomic precision lithographyFuchs, Ehud / Owen, James / Alipour, Afshin / Fowler, Emma / Moheimani, S. O. Reza / Randall, John N. et al. | 2023
- 124970H
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Key ingredients for manufacturing superconducting quantum processors at scaleLast, Thorsten / Mongillo, Massimo / Ivanov, Tsvetan / Rol, Adriaan / Lawrence, Adam / Alberts, Garrelt / Wan, Danny / Potocnik, Anton / de Greve, Kristiaan et al. | 2023
- 124970I
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Mitigating stochastics in EUV lithography by directed self-assemblyVerstraete, L. / Suh, Hyo Seon / Van Bel, Julie / Timi, Purnota Hannan / Vallat, Remi / Bezard, Philippe / Vandereyken, Jelle / Beggiato, Matteo / Tamaddon, Amir-Hossein / Beral, Christophe et al. | 2023
- 124970J
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Pattern fidelity improvement of DSA hole patternsMuramatsu, Makoto / Nishi, Takanori / Ito, Kiyohito / Takahashi, Yoshihito / Hatamura, Yasunori / Kitano, Takahiro / Iwaki, Tomohiro et al. | 2023
- 124970K
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EUV lithography line-space pattern rectification using block copolymer directed self-assembly: a roughness and defectivity studyVan Bel, Julie / Verstraete, Lander / Suh, Hyo Seon / De Gendt, Stefan / Bezard, Philippe / Vandereyken, Jelle / Li, Waikin / Beggiato, Matteo / Tamaddon, Amir-Hossein / Beral, Christophe et al. | 2023
- 124970L
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Seamless micro and nanopatterned drum molds based on ultrasonic indentationFurst, Stephen / Cates, Nichole / Micklow, Lauren et al. | 2023
- 124970M
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Advancing high resolution photolithography with hybrid polymers for wafer-scale manufacture of micro-optics and patterned passivation layersKoch, Matthias F. / Russew, Maria / Scharfenberg, L. / Benker, Andreas / Schleunitz, Arne / Grützner, Gabi et al. | 2023
- 124970N
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Mask errors impact on grayscale lithography patterningPalanchoke, Ujwol / Bélot, Gaby / Bérard-Bergery, Sébastien / Saugnier, Juline / Sungauer, Elodie / Beylier, Charlotte / Tomaso, Florian / Pourteau, Marie-Line / Mendes, Ivanie / Coquand, Rémi et al. | 2023
- 124970O
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Ultra-thick positive photoresist layers for maskless grayscale lithographyCollé, Dominique / Ekindorf, Gerda et al. | 2023
- 124970P
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Pushing deep greyscale lithography beyond 100-µm pattern depth with a novel photoresistSchuster, Christine / Ekindorf, Gerda / Voigt, Anja / Schleunitz, Arne / Grützner, Gabi et al. | 2023
- 124970Q
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Overlay performances of wafer scale nanoimprint lithographyReche, Jerome / Warsono, Api / De Lehelle D'Affroux, Anaïs / Khan, Jonas / Haumann, Sebastian / Kneidinger, Andrea et al. | 2023
- 124970R
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Continuous large area oxide printing from liquid metalsVong, Man Hou / Kong, Minsik / Jeong, Unyong / Dickey, Michael D. et al. | 2023
- 124970S
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Application of double exposure technique in plasmonic lithographyDing, Huwen / Liu, Lihong / Dong, Lisong / Chen, Zhishu / Wei, Yayi et al. | 2023
- 124970T
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Computational study of 3-dimensional photo lithography on limitations and possibility for novel structuresHirai, Yoshihiko / Osumi, Tomoaki / Tanaka, Toshiaki / Yasuda, Masaaki / Sasago, Masaru et al. | 2023
- 124970U
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Study on the releasing process of tilted grating structure for AR glasses using nanoimprintHirai, Y. / Kunitou, Y. / Yasuda, M. et al. | 2023
- 124970V
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Cross-functional photoresists and photopolymers enhancing micro- and nanofabricationSchleunitz, A. / Schuster, C. / Voigt, A. / Russew, M. / Lohse, M. / Heinrich, M. / Grützner, G. et al. | 2023
- 124970W
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Micro-nanostructuring of ZrO2 sol-gel by optical and nanoimprint lithography on various substrate for optical applicationsVallejo-Otero, V. / Crespo-Monteiro, N. / Gamet, E. / Reynaud, S. / Ollier, N. / Valour, A. / Traynar, M. / Jourlin, Y. et al. | 2023
- 124970X
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Realization of high-Q Lamb wave resonator with smooth vertical etching profile for thin film lithium niobateAryal, Arjun / Chityala, Ravi Kiran / Stricklin, Isaac / Tiwari, Sidhant / Siddiqui, Aleem / Busani, Tito et al. | 2023
- 1249701
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Front Matter: Volume 12497| 2023
- 1249702
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The evolution of heterogeneous integration and packaging for the age of chipletsSkordas, S. et al. | 2023
- 1249703
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The potential of e-beam lithography for micro- and nano-optics on large areasZeitner, Uwe D. / Banasch, Michael / Trost, Marcus et al. | 2023
- 1249704
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Efficient exposure of non-Manhattan layouts using Vistec’s shaped beam systemsLinn, E. / Fasold, S. / Galler, R. / Kuefner, S. / Stolberg, I. / Suelzle, M. / Weidenmueller, U. et al. | 2023
- 1249705
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High-productivity direct-write e-beam lithography: an enabling patterning technology to augment your lithography toolboxMacWilliams, Kenneth P. / Ceballos, Andrew C. / Prescop, Ted A. / Lam, David K. et al. | 2023
- 1249706
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E-beam direct write lithography: the versatile ally of optical lithographyLaulagnet, Fabien / Dallery, Jacques-Alexandre / Pain, Laurent / May, Michael / Hémard, Beatrice / Garlet, Franck / Servin, Isabelle / Sabbione, Chiara et al. | 2023
- 1249707
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Multi-beam patterning technology and mask making beyond 5nmShamoun, B. / Alberti, Z. / Bucay, I. / Ellis, S. / Erickson, M. / Liu, B. / Chandramouli, M. / Sowers, A. T. / Abboud, F. E. / Hochleitner, G. et al. | 2023
- 1249708
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Current performance and future plans on electron multi-beam mask writers toward high-NA EUV eraMatsumoto, Hiroshi / Nomura, Haruyuki / Kimura, Hayato / Yamaguchi, Keisuke / Kojima, Yoshinori / Saito, Masato / Tamura, Takao / Nakayamada, Noriaki et al. | 2023
- 1249709
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Nanoimprint post processing techniques to address edge placement errorOgusu, Makoto / Ishida, Masaki / Tamura, Masahiro / Sakai, Keita / Ito, Toshiki / Ito, Yuto / Kawata, Isao / Kunugi, Hideki / Tamura, Shuhei / Asako, Ryuichi et al. | 2023