Double exposure technology for KrF lithography (English)
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In:
Proc. SPIE
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6792
; 679203
;
2008
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ISBN:
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ISSN:
- Conference paper / Electronic Resource
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Title:Double exposure technology for KrF lithography
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Contributors:Geisler, S. ( author ) / Bauer, J. ( author ) / Haak, U. ( author ) / Stolarek, D. ( author ) / Schulz, K. ( author ) / Wolf, H. ( author ) / Meier, W. ( author ) / Trojahn, M. ( author ) / Matthus, E. ( author ) / Beyer, H. ( author )
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Conference:24th European Mask and Lithography Conference ; 2008 ; Dresden,Germany
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Published in:Proc. SPIE ; 6792 ; 679203
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Publisher:
- New search for: SPIE
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Publication date:2008-04-22
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ISBN:
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ISSN:
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DOI:
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Type of media:Conference paper
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Type of material:Electronic Resource
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Language:English
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Source:
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 29
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Polarization-induced astigmatism caused by topographic masksRuoff, Johannes / Neumann, Jens Timo / Schmitt-Weaver, Emil / Setten, Eelco van / Masson, Nicolas le / Progler, Chris / Geh, Bernd et al. | 2008
- 67920A
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MEDEA+ project 2T302 MUSCLE: masks through user's supply chain: leadership by excellenceTorsy, Andreas et al. | 2008
- 67920B
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Printing of sub-resolution shots in electron beam direct write with variable shaped beam machinesThrum, Frank / Kretz, Johannes / Hohle, Christoph / Choi, Kang-Hoon / Keil, Katja et al. | 2008
- 67920C
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Assessment of molecular contamination in mask podForay, Jean Marie / Dejaune, Patrice / Sergent, Pierre / Gough, Stuart / Cheung, D. / Davenet, Magali / Favre, Arnaud / Rude, C. / Trautmann, T. / Tissier, Michel et al. | 2008
- 67920D
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Photomask cleaning process improvement to minimize ArF hazeGraham, Michael / McDonald, Andrew et al. | 2008
- 67920E
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Theoretical study of mask haze formationWu, Banqiu / Kumar, Ajay et al. | 2008
- 67920F
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EUV blank inspectionPeters, J. H. / Tonk, C. / Spriegel, D. / Han, Hak-Seung / Cho, Wonil / Wurm, Stefan et al. | 2008
- 67920G
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Introduction of new database reflected tritone algorithm for application in mask productionSchulmeyer, Thomas / Schmalfuss, Heiko / Heumann, Jan / Lang, Michael et al. | 2008
- 67920H
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Phase-shifting photomask repair and repair validation procedure for transparent and opaque defects relevant for the 45nm node and beyondEhrlich, Christian / Buttgereit, Ute / Boehm, Klaus / Scheruebl, Thomas / Edinger, Klaus / Bret, Tristan et al. | 2008
- 67920I
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Inspection results of advanced (sub-50nm design rule) reticles using the TeraScanHRSier, Jean-Paul / Broadbent, William / Yu, Paul et al. | 2008
- 67920J
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Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materialsKlukowska, Anna / Vogler, Marko / Kolander, Anett / Reuther, Freimut / Gruetzner, Gabi / Muehlberger, Michael / Bergmair, Iris / Schoeftner, Rainer et al. | 2008
- 67920K
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Characterizing the imaging performance of flash memory masks using AIMSvan Setten, Eelco / Wismans, Onno / Grim, Kees / Finders, Jo / Dusa, Mircea / Birkner, Robert / Richter, Rigo / Scherübl, Thomas et al. | 2008
- 67920L
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CDO budgetingNesladek, Pavel / Wiswesser, Andreas / Sass, Björn / Mauermann, Sebastian et al. | 2008
- 67920M
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High-resolution and high-precision pattern placement metrology for the 45 nm node and beyondKlose, G. / Buttgereit, U. / Arnz, M. / Rosenkranz, N. et al. | 2008
- 67920N
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Mask CD measurement approach by diffraction intensity for lithography equivalentNagai, Takaharu / Mesuda, Kei / Sutou, Takanori / Inazuki, Yuichi / Hashimoto, Hiroyuki / Yokoyama, Toshifumi / Toyama, Nobuhito / Morikawa, Yasutaka / Mohri, Hiroshi / Hayashi, Naoya et al. | 2008
- 67920O
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Influences on accuracy of SEM based CD mask metrology with a view to the 32 nm nodeHäßler-Grohne, W. / Frase, C. G. / Gnieser, D. / Bosse, H. / Richter, J. / Wiswesser, A. et al. | 2008
- 67920P
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Comparative scatterometric CD and edge profile measurements on a MoSi mask using different scatterometersWurm, M. / Diener, A. / Bodermann, B. et al. | 2008
- 67920Q
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Assessment and application of focus drilling for DRAM contact hole fabricationNoelscher, Christoph / Jauzion-Graverolle, Franck / Henkel, Thomas et al. | 2008
- 67920R
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Design of pattern-specific mask grating for giving the effect of an off-axis illuminationKim, Young-Seok / Song, Seok Ho / Lee, Jong Ung / Oh, Sung Hyun / Choi, Yong Kyoo / Kim, Munsik / O, Beom-Hoan / Park, Se-Geun / Lee, El-Hang / Lee, Seung Gol et al. | 2008
- 67920S
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Overcoming mask etch challenges for 45 nm and beyondChandrachood, M. / Leung, T. Y. B. / Yu, K. / Grimbergen, M. / Panayil, S. / Ibrahim, I. / Sabharwal, A. / Kumar, A. et al. | 2008
- 67920T
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Desired IP control methodology for EUV mask in current mask processYoshitake, S. / Sunaoshi, H. / Tamamushi, S. / Ogasawara, M. et al. | 2008
- 67920U
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Use of EUV scatterometry for the characterization of line profiles and line roughness on photomasksScholze, Frank / Laubis, Christian et al. | 2008
- 67920V
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Strategies for hybrid techniques of UV lithography and thermal nanoimprintWissen, M. / Bogdanski, N. / Moellenbeck, S. / Scheer, H.-C. et al. | 2008
- 67920W
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Controlling linewidth roughness in step and flash imprint lithographySchmid, Gerard M. / Khusnatdinov, Niyaz / Brooks, Cynthia B. / LaBrake, Dwayne / Thompson, Ecron / Resnick, Douglas J. / Owens, Jordan / Ford, Arnie / Sasaki, Shiho / Toyama, Nobuhito et al. | 2008
- 67920X
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Status of EUVL reticle chuckingEngelstad, Roxann L. / Sohn, Jaewoong / Zeuske, Jacob R. / Battula, Venkata Siva / Vukkadala, Pradeep / Van Peski, Chris K. / Orvek, Kevin J. / Turner, Kevin T. / Mikkelson, Andrew R. / Nataraju, Madhura et al. | 2008
- 67920Y
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45nm node registration metrology on LTEM EUV reticlesLaske, Frank / Kinoshita, Hiroshi / Nishida, Naoki / Kenmochi, Daisuke / Ota, Hitoshi / Tanioka, Yukitake / Czerkas, Slawomir / Schmidt, Karl-Heinrich / Adam, Dieter / Roeth, Klaus-Dieter et al. | 2008
- 67920Z
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Top surface imaging study by selective chemisorptions of poly(dimethyl siloxane) on diazoketo-functionalized polymeric surfaceGanesan, Ramakrishnan / Youn, Seul Ki / Yun, Jei-Moon / Kim, Jin-Baek et al. | 2008
- 679201
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Front Matter: Volume 6792| 2008
- 679202
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Mask industry assessment trend analysisShelden, Gilbert / Marmillion, Patricia / Hughes, Greg et al. | 2008
- 679203
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Double exposure technology for KrF lithographyGeisler, S. / Bauer, J. / Haak, U. / Stolarek, D. / Schulz, K. / Wolf, H. / Meier, W. / Trojahn, M. / Matthus, E. / Beyer, H. et al. | 2008
- 679204
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Wafer based mask characterization for double patterning lithographyde Kruif, Robert / Bubke, Karsten / Janssen, Gert-Jan / van der Heijden, Eddy / Fochler, Jörg / Dusa, Mircea / Peters, Jan Hendrik / de Haas, Paul / Connolly, Brid et al. | 2008
- 679205
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Topological and model based approach to pitch decomposition for double patterningNikolsky, Peter / Davydova, Natalia / Goossens, Ronald et al. | 2008
- 679206
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Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition techniqueShao, Feng / Evanschitzky, Peter / Reibold, David / Erdmann, Andreas et al. | 2008
- 679207
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Three dimensional mask effects in OPC process model development from first principles simulationMelvin, Lawrence S. / Schmoeller, Thomas / Kalus, Christian K. / Li, Jianliang et al. | 2008
- 679208
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Key improvement schemes of accuracies in EB mask writing for double patterning lithographySunaoshi, Hitoshi / Kamikubo, Takashi / Nishimura, Rieko / Tsuruta, Kaoru / Katsumata, Takehiko / Ohnishi, Takayuki / Anze, Hirohito / Takamatsu, Jun / Yoshitake, Shusuke / Tamamushi, Shuichi et al. | 2008
- 679209
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Mask data rank (MDR) and its applicationKato, Kokoro / Endo, Masakazu / Inoue, Tadao / Yamabe, Masaki et al. | 2008
- 679210
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Optical proximity correction for 0.13 μm SiGe:C BiCMOSGeisler, S. / Bauer, J. / Haak, U. / Jagdhold, U. / Pliquett, R. / Matthus, E. / Schrader, R. / Wolf, H. / Baetz, U. / Beyer, H. et al. | 2008
- 679210/1
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Optical proximity correction for 0.13 micron SiGe:C BiCMOSGeisler, S. / Bauer, J. / Haak, U. / Jagdhold, U. / Pliquett, R. / Matthus, E. / Schrader, R. / Wolf, H. / Baetz, U. / Beyer, H. et al. | 2008
- 679211
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New alignment marks for improved measurement maturityWeidenmueller, U. / Alves, H. / Schnabel, B. / Icard, B. / Pain, L. / Le Denmat, J.-C. / Manakli, S. / Pradelles, J. et al. | 2008
- 679212
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Measuring contact hole corner rounding uniformity using optical scatterometryLam, John C. / Gray, Alexander / Chen, Stanley / Richter, Jan et al. | 2008
- 679213
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Very high sensitivity mask DUV transmittance mapping and measurements based on non-imaging opticsBen-Zvi, Guy / Dmitriev, Vladimir / Graitzer, Erez / Zait, Eitan / Sharoni, Ofir / Cohen, Avi et al. | 2008
- 679214
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Advances in fabrication of x-ray masks based on vitreous carbon using a new UV sensitive positive resistVoigt, Anja / Kouba, Josef / Heinrich, Marina / Gruetzner, Gabi / Scheunemann, Heinz-Ulrich / Rudolph, I. / Waberski, Christoph et al. | 2008
- 679215
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New results from DUV water immersion microscopy using the CD metrology system LWM500 WI with a high NA condenserHillmann, Frank / Scheuring, Gerd / Brück, Hans-Jürgen et al. | 2008
- 679216
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High resolution patterning and simulation on Mo/Si multilayer for EUV masksTsikrikas, N. / Patsis, G. P. / Raptis, I. / Gerardino, A. et al. | 2008
- 679217
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Phame: high resolution off-axis phase shift measurements on 45nm node featuresButtgereit, Ute / Perlitz, Sascha / Seidel, Dirk et al. | 2008
- xvii
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3-Dimensional bridged structures by thermal-UV imprint using a novel mask (Invited Paper) [Abstract Only]Okuda, K. / Kawata, H. / Hirai, Y. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
- xxix
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Best Paper of BACUS 2007 Polarization-induced astigmatism caused by topographic masks (Invited Paper) [6730-63]Ruoff, J. / Neumann, J.T. / Schmitt-Weaver, E. / van Stetten, E. / le Masson, N. / Progler, C. / Geh, B. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Characterizing the imaging performance of flash memory masks using AIMS [6792-23]van Setten, E. / Wismans, O. / Grim, K. / Finders, J. / Dusa, M. / Birkner, R. / Richter, R. / Scherubl, T. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) et al. | 2008
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Comparative scatterometric CD and edge profile measurements on a MoSi mask using different scatterometers [6792-28]Wurm, M. / Diener, A. / Bodermann, B. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Photomask cleaning process improvement to minimize ArF haze [6792-16]Graham, M. / McDonald, A. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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New alignment marks for improved measurement maturity [6792-31]Weidenmueller, U. / Alves, H. / Schnabel, B. / Icard, B. / Pain, L. / Le-Denmat, J.-C. / Manakli, S. / Pradelles, J. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) et al. | 2008
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Phase-shifting photomask repair and repair validation procedure for transparent and opaque defects relevant for the 45nm node and beyond [6792-20]Ehrlich, C. / Buttgereit, U. / Boehm, K. / Scheruebl, T. / Edinger, K. / Bret, T. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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45nm node registration metrology on LTEM EUV reticles [6792-46]Laske, F. / Kinoshita, H. / Nishida, N. / Kenmochi, D. / Ota, H. / Tanioka, Y. / Czerkas, S. / Schmidt, K.-H. / Adam, D. / Roeth, K.-D. et al. | 2008
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Best Paper from PMJ 2007 Progress of NIL template making (Invited Paper) [6607-124]Yusa, S. / Hiraka, T. / Kobiki, A. / Sasaki, S. / Itoh, K. / Toyama, N. / Kurihara, M. / Mohri, H. / Hayashi, N. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik et al. | 2008
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Wafer based mask characterization for double patterning lithography [6792-07]de Kruif, R. / Bubke, K. / Janssen, G.-J. / van der Heijden, E. / Fochler, J. / Dusa, M. / Peters, J.H. / de Haas, P. / Connolly, B. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik et al. | 2008
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Measuring contact hole corner rounding uniformity using optical scatterometry [6792-32]Lam, J.C. / Gray, A. / Chen, S. / Richter, J. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Phame: high resolution off-axis phase shift measurements on 45nm node features [6792-37]Buttgereit, U. / Perlitz, S. / Seidel, D. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
-
Inspection results of advanced (sub-50nm design rule) reticles using the TeraScanHR [6792-21]Sier, J.-P. / Broadbent, W. / Yu, P. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials [6792-22]Klukowska, A. / Vogler, M. / Kolander, A. / Reuther, F. / Gruetzner, G. / Muehlberger, M. / Bergmair, I. / Schoeftner, R. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) et al. | 2008
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High resolution patterning and simulation on Mo/Si multilayer for EUV masks [6792-36]Tsikrikas, N. / Patsis, G.P. / Raptis, I. / Gerardino, A. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Mask industry assessment trend analysis [6792-01]Shelden, G. / Marmillion, P. / Hughes, G. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Best Poster of BACUS 2007 Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyond (Invited Paper) [6730-147]Kushida, Y. / Handa, H. / Maruyama, H. / Abe, Y. / Fujimura, Y. / Yokoyama, T. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Optical proximity correction for 0.13 μm SiGe:C BiCMOS [6792-30]Geisler, S. / Bauer, J. / Haak, U. / Jagdhold, U. / Pliquett, R. / Matthus, E. / Schrader, R. / Wolf, H. / Baetz, U. / Beyer, H. et al. | 2008
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Topological and model based approach to pitch decomposition for double patterning [6792-08]Nikolsky, P. / Davydova, N. / Goossens, R. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Mask CD measurement approach by diffraction intensity for lithography equivalent [6792-26]Nagai, T. / Mesuda, K. / Sutou, T. / Inazuki, Y. / Hashimoto, H. / Yokoyama, Y. / Toyama, N. / Morikawa, Y. / Mohri, H. / Hayashi, N. et al. | 2008
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Assessment and application of focus drilling for DRAM contact hole fabrication [6792-38]Noelscher, C. / Jauzion-Graverolle, F. / Henkel, T. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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MEDEA+ project 2T302 MUSCLE: masks through user's supply chain: leadership by excellence [6792-13]Torsy, A. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Printing of sub-resolution shots in electron beam direct write with variable shaped beam machines [6792-14]Thrum, F. / Kretz, J. / Hohle, C. / Choi, K.-H. / Keil, K. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Theoretical study of mask haze formation [6792-17]Wu, B. / Kumar, A. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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High-resolution and high-precision pattern placement metrology for the 45 nm node and beyond [6792-25]Klose, G. / Buttgereit, U. / Arnz, M. / Rosenkranz, N. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Influences on accuracy of SEM based CD mask metrology with a view to the 32 nm node [6792-27]Hassler-Grohne, W. / Frase, C.G. / Gnieser, D. / Bosse, H. / Richter, J. / Wiswesser, A. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Status of EUVL reticle chucking [6792-45]Engelstad, R.L. / Sohn, J. / Zeuske, J.R. / Battula, V.S. / Vukkadala, P. / Van Peski, C.K. / Orvek, K.J. / Turner, K.T. / Mikkelson, A.R. / Nataraju, M. et al. | 2008
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Mask data rank (MDR) and its application [6792-12]Kato, K. / Endo, M. / Inoue, T. / Yamabe, M. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Key improvement schemes of accuracies in EB mask writing for double patterning lithography [6792-11]Sunaoshi, H. / Kamikubo, T. / Nishimura, R. / Tsuruta, K. / Katsumata, T. / Ohnishi, T. / Anze, H. / Takamatsu, J. / Yoshitake, S. / Tamamushi, S. et al. | 2008
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Introduction of new database reflected tritone algorithm for application in mask production [6792-19]Schulmeyer, T. / Schmalfuss, H. / Heumann, J. / Lang, M. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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CDO budgeting [6792-24]Nesladek, P. / Wiswesser, A. / Sass, B. / Mauermann, S. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Overcoming mask etch challenges for 45 nm and beyond [6792-40]Chandrachood, M. / Leung, T.Y.B. / Yu, K. / Grimbergen, M. / Panayil, S. / Ibrahim, I. / Sabharwal, A. / Kumar, A. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) et al. | 2008
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Strategies for hybrid techniques of UV lithography and thermal nanoimprint [6792-43]Wissen, M. / Bogdanski, N. / Moellenbeck, S. / Scheer, H.-C. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Advances in fabrication of x-ray masks based on vitreous carbon using a new UV sensitive positive resist [6792-34]Voigt, A. / Kouba, J. / Heinrich, M. / Gruetzner, G. / Scheunemann, H.-U. / Rudolph, I. / Waberski, C. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Double exposure technology for KrF lithography [6792-06]Geisler, S. / Bauer, J. / Haak, U. / Stolarek, D. / Schulz, K. / Wolf, H. / Meier, W. / Trojahn, M. / Matthus, E. / Beyer, H. et al. | 2008
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Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique [6792-09]Shao, F. / Evanschitzky, P. / Reibold, D. / Erdmann, A. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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EUV blank inspection [6792-18]Peters, J.H. / Tonk, C. / Spriegel, D. / Han, H.-S. / Cho, W. / Wurm, S. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Desired IP control methodology for EUV mask in current mask process [6792-41]Yoshitake, S. / Sunaoshi, H. / Tamamushi, S. / Ogasawara, M. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Three dimensional mask effects in OPC process model development from first principles simulation [6792-10]Melvin, L.S. / Schmoeller, T. / Kalus, C.K. / Li, J. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Assessment of molecular contamination in mask pod [6792-15]Foray, J.M. / Dejaune, P. / Sergent, P. / Gough, S. / Cheung, D. / Davenet, M. / Favre, A. / Rude, C. / Trautmann, T. / Tissier, M. et al. | 2008
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Design of pattern-specific mask grating for giving the effect of an off-axis illumination [6792-39]Kim, Y.-S. / Song, S.H. / Lee, J.U. / Oh, S.H. / Choi, Y.K. / Kim, M. / O, B.-H. / Park, S.-G. / Lee, E.-H. / Lee, S.G. et al. | 2008
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Use of EUV scatterometry for the characterization of line profiles and line roughness on photomasks [6792-42]Scholze, F. / Laubis, C. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Controlling linewidth roughness in step and flash imprint lithography (Best Paper Award) [6792-44]Schmid, G.M. / Khusnatdinov, N. / Brooks, C.B. / LaBrake, D.L. / Thompson, E. / Resnick, D.J. / Owens, J. / Ford, A. / Sasaki, S. / Toyama, N. et al. | 2008
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Very high sensitivity mask DUV transmittance mapping and measurements based on non-imaging optics (Best Poster Paper Award) [6792-33]Ben-Zvi, G. / Dmitriev, V. / Graitzer, E. / Zait, E. / Sharoni, O. / Cohen, A. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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New results from DUV water immersion microscopy using the CD metrology system LWM500 WI with a high NA condenser [6792-35]Hillmann, F. / Scheuring, G. / Bruck, H.-J. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008
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Top surface imaging study by selective chemisorptions of poly(dimethyl siloxane) on diazoketo-functionalized polymeric surface [6792-29]Ganesan, R. / Youn, S.K. / Yun, J.-M. / Kim, J.-B. / VDE/VDI-Gesellschaft fur Mikroelektronik, Mikro- und Feinwerktechnik / BACUS (Technical group) / Society of Photo-optical Instrumentation Engineers et al. | 2008