Testing The Mann Type 4800DSWTMWafer Steppertm (English)
- New search for: Schneider, William C.
- New search for: Schneider, William C.
In:
Proc. SPIE
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0174
; 6
;
1979
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ISBN:
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ISSN:
- Conference paper / Electronic Resource
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Title:Testing The Mann Type 4800DSWTMWafer Steppertm
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Contributors:Schneider, William C. ( author )
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Conference:Developments in Semiconductor Microlithography IV ; 1979 ; San Jose,United States
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Published in:Proc. SPIE ; 0174 ; 6
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Publisher:
- New search for: SPIE
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Publication date:1979-07-17
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ISBN:
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ISSN:
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DOI:
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Type of media:Conference paper
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Type of material:Electronic Resource
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Language:English
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Source:
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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New Department Of Defense (DOD) Initiative In Very High Speed Integrated Circuits And Its Impact On LithographySumney, Larry W. et al. | 1979
- 6
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Testing The Mann Type 4800DSWTMWafer SteppertmSchneider, William C. et al. | 1979
- 15
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Use Of 436 NM Optical Step-And-Repeat Imaging For Wafer FabricationThomas, Geoffrey R. / Coleman, Harry L. / Lanahan, Mike et al. | 1979
- 22
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Influence Of Partial Coherence On Projection PrintingO'Toole, M. M. / Neureuther, A. R. et al. | 1979
- 28
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Coherent Illumination Improves Step-And-Repeat Printing On WafersLacombat, Michel / Dubroeucq, Georges M. et al. | 1979
- 37
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Image Formation In Thick ResistTigreat, Paul et al. | 1979
- 48
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Evaluation Methods In The Design Stage Of Projection LensesKano, Ichiro et al. | 1979
- 54
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Autoalignment In Step-And-Repeat Wafer PrintingHershel, Ronald S. et al. | 1979
- 63
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Diffraction Gratings As Keys For Automatic Alignment In Proximity And Projection PrintingKleinknecht, Hans P. et al. | 1979
- 70
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New Generation Of 1:1 Optical Projection Mask AlignersKing, Michael C. / Muraski, Edward S. et al. | 1979
- 75
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A Better MousetrapSnyder, Jack R. / DeVen, Jamie V. et al. | 1979
- 84
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Electron Beam Lithography For MaskmakingWishnuff, Kenneth et al. | 1979
- 90
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Mask Fabrication With Vector Scan Electron Beam SystemTing, C. H. / Patlach, A. M. / Kraft, A. J. / Jaskar, P. R. et al. | 1979
- 98
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E-Beam Lithography Field Abutment Characterization Using A Surface Acoustic Wave (SAW) Spatial ConverterMacDonald, D. B. / Vail, R. C. et al. | 1979
- 108
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How Photoresists Relate To The World Of 1984Johnson, Donald W. et al. | 1979
- 114
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Portable Conformable Mask-A Hybrid Near-Ultraviolet And Deep-Ultraviolet Patterning TechniqueLin, B. J. et al. | 1979
- 124
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Optical Measuring Technology Of The MicropatternsYoshida, S. / Nakazawa, K. / Tanimoto, A. et al. | 1979
- 132
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Wafer Flatness: An Overview Of Measurement Considerations And Equipment CorrelationGuidici, David C. et al. | 1979
- 140
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Dry Etching With Ion Beam MillingOverall, Edsel et al. | 1979
- 143
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High-Resolution Flatness-Testing Interferometer For 6-Inch PhotoplatesSynborski, Charles E. et al. | 1979
- 153
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Positive Photoresists As Ion Implantation MasksElliott, David J. et al. | 1979
- 173
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Dependence Of Plasma Etch Rate And Uniformity On Resist Type And ProcessingZelley, Albert et al. | 1979
- 180
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Prototype photomasksâ€"a low-cost alternativeBang, Gary M. et al. | 1979
- 184
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Computerized Optical Systems For Ilinewidth And Film-Thickness Measurements On Microelectronic CircuitsCoates, Vincent J. et al. | 1979