Topography of nanometric thin films with three-wavelength digital interferometry (Unknown)
- New search for: Picart, Pascal
- New search for: Malek, Mokrane
- New search for: Garcia-Sucerquia, Jorge
- New search for: Edely, Mathieu
- New search for: Moalla, Rahma
- New search for: Delorme, Nicolas
- New search for: Bardeau, Jean-François
- New search for: Picart, Pascal
- New search for: Malek, Mokrane
- New search for: Garcia-Sucerquia, Jorge
- New search for: Edely, Mathieu
- New search for: Moalla, Rahma
- New search for: Delorme, Nicolas
- New search for: Bardeau, Jean-François
In:
Journal of Micro/Nanolithography, MEMS, and MOEMS
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14
, 4
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041309
;
2015
- Article (Journal) / Electronic Resource
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Title:Topography of nanometric thin films with three-wavelength digital interferometry
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Additional title:J. Micro/Nanolith. MEMS MOEMS
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Contributors:Picart, Pascal ( author ) / Malek, Mokrane ( author ) / Garcia-Sucerquia, Jorge ( author ) / Edely, Mathieu ( author ) / Moalla, Rahma ( author ) / Delorme, Nicolas ( author ) / Bardeau, Jean-François ( author )
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Published in:Journal of Micro/Nanolithography, MEMS, and MOEMS ; 14, 4 ; 041309
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Publisher:
- New search for: Society of Photo-Optical Instrumentation Engineers
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Publication date:2015-09-11
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ISSN:
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Coden:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:Unknown
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Keywords:
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Source:
Table of contents – Volume 14, Issue 4
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 040101
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How to Write a Good Scientific Paper: Picking the Right JournalMack, Chris et al. | 2015
- 041301
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Special Section Guest Editorial:Special Section on the Interface of Holography and MEMSBlanche, Pierre-Alexandre / Banerjee, Partha / Moser, Christophe / Kim, Myung K. et al. | 2015
- 041302
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Digital mirror devices and liquid crystal displays in maskless lithography for fabrication of polymer-based holographic structuresRahlves, Maik / Kelb, Christian / Rezem, Maher / Schlangen, Sebastian / Boroz, Kristian / Gödeke, Dina / Ihme, Maximilian / Roth, Bernhard et al. | 2015
- 041303
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Image formation of holographic three-dimensional display based on spatial light modulator in paraxial optical systemsLi, Junchang / Lin, Yu-Chih / Tu, Han-Yen / Gui, Jinbin / Li, Chongguang / Lou, Yuli / Cheng, Chau-Jern et al. | 2015
- 041304
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Development of lossy and near-lossless compression methods for wafer surface structure digital hologramsZhang, Hongbo / Zhou, Wenjing / Leber, Donald / Hu, Zhijuan / Yang, Xin / Tsang, Peter W. M. / Poon, Ting-Chung et al. | 2015
- 041305
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Optical frequency comb profilometry with a compressive sensing–based single-pixel camera composed of digital micromirror devices and a two-frequency method for meter-order depth measurementsPham, Quang Duc / Hayasaki, Yoshio et al. | 2015
- 041306
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Photorefractive holographic camera for monitoring deformations of MEMSGeorges, Marc P. / Thizy, Cédric et al. | 2015
- 041307
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Incoherent digital holography with phase-only spatial light modulatorsRosen, Joseph / Kelner, Roy / Kashter, Yuval et al. | 2015
- 041308
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Progress on characterization and optimization of leaky-mode modulators for holographic videoSmalley, Daniel E. / McLaughlin, Stephen / Leach, Christopher / Kimball, Jacob / Bove, V. Michael / Jolly, Sundeep et al. | 2015
- 041309
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Topography of nanometric thin films with three-wavelength digital interferometryPicart, Pascal / Malek, Mokrane / Garcia-Sucerquia, Jorge / Edely, Mathieu / Moalla, Rahma / Delorme, Nicolas / Bardeau, Jean-François et al. | 2015
- 041310
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Holography using pixelated spatial light modulators—part 1: theory and basic considerationsHaist, Tobias / Osten, Wolfgang et al. | 2015
- 041311
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Holography using pixelated spatial light modulators—Part 2: applicationsHaist, Tobias / Osten, Wolfgang et al. | 2015
- 041312
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Optically addressed deformable mirror for low-light applicationsKhoury, Jed / Vella, Jarrett et al. | 2015
- 041313
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Improvement of measurement accuracy in digital holographic microscopy by using dual-wavelength techniqueDi, Jianglei / Zhang, Jiwei / Xi, Teli / Ma, Chaojie / Zhao, Jianlin et al. | 2015
- 041314
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Numerical tools for the characterization of microelectromechanical systems by digital holographic microscopyPagliarulo, Vito / Russo, Tiziana / Miccio, Lisa / Ferraro, Pietro et al. | 2015
- 043501
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Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reductionLee, Sung-Gyu / Kim, Guk-Jin / Kim, In-Seon / Ahn, Jin-Ho / Park, Jin-Goo / Oh, Hye-Keun et al. | 2015
- 043502
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Studying thickness loss in extreme ultraviolet resists due to electron beam exposure using experiment and modelingNarasimhan, Amrit / Grzeskowiak, Steven / Srivats, Bharath / Herbol, Henry / Wisehart, Liam / Schad, Jonathon / Kelly, Chris / Earley, William / Ocola, Leonidas E. / Neisser, Mark et al. | 2015
- 043503
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Organometallic carboxylate resists for extreme ultraviolet with high sensitivityPassarelli, James / Murphy, Michael / Re, Ryan Del / Sortland, Miriam / Hotalen, Jodi / Dousharm, Levi / Fallica, Roberto / Ekinci, Yasin / Neisser, Mark / Freedman, Daniel A. et al. | 2015
- 043504
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Analytical analysis of the impact of polarization aberration of projection lens on lithographic imagingShen, Lina / Li, Sikun / Wang, Xiangzhao / Yan, Guanyong et al. | 2015
- 043505
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Direct-writing lithography using laser diode beam focused with single elliptical microlensHasan, Md. Nazmul / Haque, Muttahid-Ull / Trisno, Jonathan / Lee, Yung-Chun et al. | 2015
- 043506
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Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylatesDel Re, Ryan / Passarelli, James / Sortland, Miriam / Cardineau, Brian / Ekinci, Yasin / Buitrago, Elizabeth / Neisser, Mark / Freedman, Daniel A. / Brainard, Robert L. et al. | 2015
- 043507
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Efficient source mask optimization method for reduction of computational lithography cycles and enhancement of process-window predictabilityGuo, Moran / Song, Zhiyang / Feng, Yaobin / Tian, Zhengguo / Cao, Qingchen / Wei, Yayi et al. | 2015
- 043508
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Design of electrostatic microcolumn for nanoscale photoemission source in massively parallel electron-beam lithographyWen, Ye / Du, Zhidong / Pan, Liang et al. | 2015
- 043509
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Enhanced lithographic resolution using longitudinal polarization state of lightVan, My-Phung / Ushakova, Katsiaryna / Bastiaansen, Cees W. M. / Pereira, Silvania F. / Urbach, H. Paul / Broer, Dirk J. et al. | 2015
- 043510
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Solid immersion optical lithography: index matching and resonant reflectors for large exposure field, high-aspect ratio imaging in the ultrahigh-numerical aperture regimeLowrey, Sam / Blaikie, Richard et al. | 2015
- 043511
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Platinum and palladium oxalates: positive-tone extreme ultraviolet resistsSortland, Miriam / Hotalen, Jodi / Re, Ryan Del / Passarelli, James / Murphy, Michael / Kulmala, Tero S. / Ekinci, Yasin / Neisser, Mark / Freedman, Daniel A. / Brainard, Robert L. et al. | 2015
- 044001
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Optimizing hybrid metrology: rigorous implementation of Bayesian and combined regressionHenn, Mark-Alexander / Silver, Richard M. / Villarrubia, John S. / Zhang, Nien Fan / Zhou, Hui / Barnes, Bryan M. / Ming, Bin / Vladár, András E. et al. | 2015
- 044501
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Capacitive effective thickness of a few nanometers by atomic layer deposition and device performance in Ge gate-all-around fin field effect transistorsChu, Chu-Lin / Chen, Bo-Yuan / Fuh, Yiin-Kuen et al. | 2015
- 044502
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Impact of polymer curing on two-dimensional and three-dimensional shape change in nanoimprint lithographyChopra, Meghali J. / Bonnecaze, Roger T. et al. | 2015
- 044503
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Influence of pulsed Nd3+ : YAG laser beam profile and wavelength on microscribing of copper and aluminum thin filmsNammi, Srinagalakshmi / Vasa, Nilesh J. / Balaganesan, G. / Gupta, Sanjay / Mathur, Anil C. et al. | 2015
- 044504
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Optical field-induced surface-relief micropatterning of amorphous chalcogenide thin filmsGertners, Ugis / Gertnere, Zanda / Potanina, Elina et al. | 2015
- 044505
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Dry development for a directed self-assembly lithography hole-shrink process usingCO/H2plasmaOmura, Mitsuhiro / Imamura, Tsubasa / Yamamoto, Hiroshi / Sakai, Itsuko / Hayashi, Hisataka et al. | 2015
- 044506
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Fabrication of high-aspect ratio silicon nanopillars for tribological experimentsAntonov, Pavlo V. / Zuiddam, Marc R. / Frenken, Joost W.M. et al. | 2015
- 044507
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Investigation of SU8 as a structural material for fabricating passive millimeter-wave and terahertz componentsTian, Yingtao / Shang, Xiaobang / Wang, Yi / Lancaster, Michael J. et al. | 2015
- 045001
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Study of different cross-shaped microchannels affecting thermal-bubble-actuated microparticle manipulationLi, Weichen / Tsou, Chingfu et al. | 2015
- 045002
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Architecture of torsional gyroscope having robust sense modeJain, Ankush / Sharma, Hitesh Kumar / Gopal, Ram et al. | 2015
- 045501
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Volume refractometry of liquids using stable optofluidic Fabry–Pérot resonator with curved surfacesGaber, Noha / Takemura, Yuto / Marty, Frédéric / Khalil, Diaa / Angelescu, Dan / Richalot, Elodie / Bourouina, Tarik et al. | 2015
- 049801
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Publisher’s Note: Special Section on the Interface of Holography and MEMS| 2015