Thin-film optimization strategy in high numerical aperture optical lithography, part 1: principles (Unknown)
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In:
Journal of Micro/Nanolithography, MEMS and MOEMS
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4
, 4
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043003
;
2005
- Article (Journal) / Electronic Resource
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Title:Thin-film optimization strategy in high numerical aperture optical lithography, part 1: principles
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Additional title:J. Micro/Nanolith. MEMS MOEMS
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Contributors:Yu, Shinn-Sheng ( author ) / Lin, Burn J. ( author ) / Yen, Anthony ( author ) / Ke, Chih-Ming ( author ) / Huang, Jacky ( author ) / Ho, Bang-Ching ( author ) / Chen, Chun-Kuang ( author ) / Gau, Tsai-Sheng ( author ) / Hsieh, Hong-Chang ( author ) / Ku, Yao-Ching ( author )
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Published in:Journal of Micro/Nanolithography, MEMS and MOEMS ; 4, 4 ; 043003
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Publisher:
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Publication date:2005-12-06
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ISSN:
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Coden:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:Unknown
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Keywords:
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Source:
Table of contents – Volume 4, Issue 4
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 040101
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Types of Articles inJM 3Lin, Burn J. et al. | 2005
- 041201
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MOEMS: Design, Technology, and ApplicationsMotamedi, M. Edward et al. | 2005
- 041301
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MOEMS tunable optical filter based on photonic crystalsMao, Huibing / Jing, Weiping et al. | 2005
- 041302
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Novel intercore-cladding lithium niobate thin film coated MOEMS fiber sensor/modulatorJamison, Tracee L. / Kornreich, Phillip / Yu, Chung et al. | 2005
- 041303
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Optomechanical design of tunable InP-based Fabry-Perot filters for wavelength division multiplexing applicationsShah, Mithilesh Ashok / Shanmugan, Vicknesh / Chowdhury, Golam Kibria / Akkipeddi, Ramam et al. | 2005
- 041304
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Micromachined electromagnetic variable optical attenuator for optical power equalizationDai, Xuhan / Zhao, Xiaolin / Ding, Guifu / Cai, Bingchu et al. | 2005
- 041401
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Programmable diffraction gratings and their uses in displays, spectroscopy, and communicationsSenturia, Stephen D. / Day, David R. / Butler, Michael A. / Smith, Malcolm C. et al. | 2005
- 041402
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Multifunctional interferometric platform for on-chip testing the micromechanical properties of MEMS/MOEMSGorecki, Christophe / Józwik, Michał / Sałbut, Leszek et al. | 2005
- 041403
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Design, fabrication, and performance of a micromachined plasma spectrometerWesolek, Danielle M. / Hererro, Fred A. / Osiander, Robert / Darrin, M. Ann Garrison et al. | 2005
- 041501
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Micro-opto-electro-mechanical systems technology and its impact on photonic applicationsSchenk, Harald / Wolter, Alexander / Dauderstaedt, Ulrike / Gehner, Andreas / Lakner, Hubert et al. | 2005
- 041502
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MOEMS 3-D scan mirror for single-point control of beam deflection and focusShao, Yuhe / Dickensheets, David L. et al. | 2005
- 041503
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Closed-loop adaptive control for electrostatically driven torsional micromirrorsLiao, Ke-Min / Wang, Yi-Chih / Yeh, Chih-Hsien / Chen, Rongshun et al. | 2005
- 041504
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Experimental results of a MEMS-based adaptive optics systemRestaino, Sergio R. / Gilbreath, G. Charmaine / Payne, Don M. / Andrews, Jonathan R. et al. | 2005
- 041601
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MOEMS-based lithography for the fabrication of micro-optical componentsErdmann, Lars / Deparnay, Arnaud / Maschke, Gunter / Längle, Mario / Brunner, Robert et al. | 2005
- 041602
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Synergy of contact and noncontact techniques for design and characterization of vibrating MOEMS elementsOstasevicius, Vytautas / Tamulevicius, Sigitas / Palevicius, Arvydas / Ragulskis, Minvydas / Grigaliunas, Viktoras / Minialga, Virgilijus et al. | 2005
- 041603
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Refractive micro-optics fabrication with a 1-D binary phase grating mask applicable to MOEMS processingSung, Jinwon / Hockel, Heidi / Brown, Jeremiah / Johnson, Eric G. et al. | 2005
- 041701
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Industrial packaging and assembly infrastructure for MOEMSvan Heeren, Henne / El-Fatatry, Ayman / Paschalidou, Lia / Salomon, Patric et al. | 2005
- 041702
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Low-power MOEMS components for active optical systemsCastracane, James / Yan, Dong / Madison, Seth / Panaman, Ganesh / Xu, Bai et al. | 2005
- 043001
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Formulas for lithographic parameters when printing isolated and dense linesStraaijer, Alexander et al. | 2005
- 043002
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Evaluation of stray light and quantitative analysis of its impact on lithographyKim, Young-Chang / De Bisschop, Peter / Vandenberghe, Geert et al. | 2005
- 043003
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Thin-film optimization strategy in high numerical aperture optical lithography, part 1: principlesYu, Shinn-Sheng / Lin, Burn J. / Yen, Anthony / Ke, Chih-Ming / Huang, Jacky / Ho, Bang-Ching / Chen, Chun-Kuang / Gau, Tsai-Sheng / Hsieh, Hong-Chang / Ku, Yao-Ching et al. | 2005
- 043004
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Thin-film optimization strategy in high numerical aperture optical lithography, part 2: applications to ArFYu, Shinn-Sheng / Lin, Burn J. / Yen, Anthony et al. | 2005
- 043005
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Polymer stretching to produce flat suspended micromembranesCampbell, Kevin J. / Morine, Jacey C. / George, Zachary A. / Schultz, Stephen M. / Hawkins, Aaron R. / Lusk, Craig P. / Howell, Larry L. et al. | 2005
- 043006
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High-performance microfabricated angular rate sensorHudson, Tracy D. / Holt, Sherrie W. / Ruffin, Paul / Kranz, Michael / McKee, Jim / Whitley, Michael / Buncick, Milan / Tuck, Eric et al. | 2005
- 043007
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High-energy scanning electron microscope for the observation of subsurface structuresMatsui, Miyako / Machida, Syuntaro / Todokoro, Hideo / Otaka, Tadashi / Sugimoto, Aritoshi et al. | 2005
- 043008
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Low-stress ultra-thick SU-8 UV photolithography process for MEMSLi, Bo / Liu, Miao / Chen, Quanfang et al. | 2005
- 043009
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Surface roughness investigation of 157- and 193-nm polymer platforms using different etch conditionsHohle, Christoph / Heckmann, Nicole / Sebald, Michael / Markert, Matthias / Stepanenko, Nickolay / Houlihan, Francis / Romano, Andrew / Sakamuri, Raj / Rentkiewicz, David / Dammel, Ralph R. et al. | 2005
- 043010
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New stochastic post-exposure bake simulation methodMülders, Thomas / Henke, Wolfgang / Elian, Klaus / Nölscher, Christoph / Sebald, Michael et al. | 2005
- 049701
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Molecular ruler lithography processes using multilayer sacrificial host structuresSubramanian, Shyamala / McCarty, Gregory S. / Catchmark, Jeffrey M. et al. | 2005