Special Section Guest Editorial: 3D Semiconductor Metrology (Unknown)
Free access
- New search for: Orji, Ndubuisi George
- New search for: Lin, Qinghuang
- New search for: Orji, Ndubuisi George
- New search for: Lin, Qinghuang
In:
Journal of Micro/Nanopatterning, Materials, and Metrology
;
22
, 3
;
031201
;
2023
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ISSN:
- Article (Journal) / Electronic Resource
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Title:Special Section Guest Editorial: 3D Semiconductor Metrology
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Additional title:J. Micro/Nanopattern. Mater. Metrol.
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Contributors:Orji, Ndubuisi George ( author ) / Lin, Qinghuang ( author )
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Published in:Journal of Micro/Nanopatterning, Materials, and Metrology ; 22, 3 ; 031201
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Publisher:
- New search for: Society of Photo-Optical Instrumentation Engineers
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Publication date:2023-07-01
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Size:2 pages
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ISSN:
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Coden:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:Unknown
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Source:
Table of contents – Volume 22, Issue 3
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 030101
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Lithography Should Not Be a Glass Bead GameLevinson, Harry J. et al. | 2023
- 030701
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Wen-li Wu talks about advances in x-ray-based semiconductor metrologyLin, Qinghuang et al. | 2023
- 031201
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Special Section Guest Editorial: 3D Semiconductor MetrologyOrji, Ndubuisi George / Lin, Qinghuang et al. | 2023
- 031205
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Inline metrology of high aspect ratio hole tilt and center line shift using small-angle x-ray scatteringGin, Peter / Wormington, Matthew / Amasay, Yehonatan / Grinberg, Inbar / Brady, Alexander / Reichental, Israel / Matney, Kevin / Zhang, Jin / Sorkhabi, Osman et al. | 2023
- 031206
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Review of the key milestones in the development of critical dimension small angle x-ray scattering at National Institute of Standards and TechnologyWu, Wen-li / Joseph Kline, R. / Jones, Ronald L. / Lee, Hae-Jeong / Lin, Eric K. / Sunday, Daniel F. / Wang, Chengqing / Hu, Tengjiao / Soles, Christopher L. et al. | 2023
- 031208
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Training procedure for scanning electron microscope 3D surface reconstruction using unsupervised domain adaptation with simulated dataHouben, Tim / Huisman, Thomas / Pisarenco, Maxim / van der Sommen, Fons / de With, Peter et al. | 2023
- 031209
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Review of virtual wafer process modeling and metrology for advanced technology developmentHargrove, Michael / Wen, Sandy / Yim, Daebin / Ruegger, Kira Egelhofer / Nanja, Pradeep / Sarkar, Sumant / Lowe, Brett / Vincent, Benjamin / Ervin, Joseph / Fried, David et al. | 2023
- 034001
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Model-free measurement of lateral recess in gate-all-around transistors with micro hard-X-ray fluorescenceBogdanowicz, Janusz / Oniki, Yusuke / Kenis, Karine / Gowda, Pallavi Puttarame / Mertens, Hans / Shamieh, Basel / Leon, Yonatan / Wormington, Matthew / Van der Meer, Juliette / Charley, Anne-Laure et al. | 2023
- 034201
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Unsupervised neural network-based image restoration framework for pattern fidelity improvement and robust metrologyDu, Zijian / Pu, Lingling / Wei, Paul / Yuan, Rui / Kim, Jeeeon / Tan, Jiaoying et al. | 2023