Design of Cu-MWCNT Based Heterogeneous Coaxial through Silicon Vias for High-Speed VLSI Applications (English)
- New search for: Rajkumar, Katepogu
- New search for: Reddy, G. Umamaheswara
- New search for: Rajkumar, Katepogu
- New search for: Reddy, G. Umamaheswara
In:
Russian Microelectronics
;
51
, 6
;
512-520
;
2022
- Article (Journal) / Electronic Resource
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Title:Design of Cu-MWCNT Based Heterogeneous Coaxial through Silicon Vias for High-Speed VLSI Applications
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Additional title:Russ Microelectron
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Contributors:Rajkumar, Katepogu ( author ) / Reddy, G. Umamaheswara ( author )
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Published in:Russian Microelectronics ; 51, 6 ; 512-520
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Publisher:
- New search for: Pleiades Publishing
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Place of publication:Moscow
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Publication date:2022-12-01
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Size:9 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 51, Issue 6
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 359
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Spectral Control of the Process of Copper Etching in Radio Frequency Dichlorodifluoromethane PlasmaMurin, D. B. / Pivovarenok, S. A. / Dunaev, A. V. / Chesnokov, I. A. / Gogulev, I. A. et al. | 2022
- 368
-
Electrophysical Characteristics and Emission Spectra of Carbon Tetrafluoride PlasmaMurin, D. B. / Pivovarenok, S. A. / Chesnokov, I. A. / Gogulev, I. A. et al. | 2022
- 376
-
Artificial Intelligence Will Never Completely Replace HumansAbramov, I. I. et al. | 2022
- 387
-
Electron Detection Circuit Based on a Tunnel Structure of Four Quantum Dots with Asymmetric ParametersTsukanov, A. V. et al. | 2022
- 398
-
Method for the Iterative Refinement of Parameter Values in Analytical Models of Microelectronic Devices Based on Integrated MOS TransistorsSinyukin, A. S. / Kovalev, A. V. et al. | 2022
- 404
-
Development of a Method for Constructing a Nonlinear Model of a Metamorphic 0.15-μm МHEMT InAlAs/InGaAs TransistorLokotko, V. V. / Vasil’evskii, I. S. / Kargin, N. I. et al. | 2022
- 413
-
Modeling of Gold Adsorption by the Surface of Defect GrapheneAsadov, M. M. / Mammadova, S. O. / Guseinova, S. S. / Mustafaeva, S. N. / Lukichev, V. F. et al. | 2022
- 426
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Effect of Lattice Defects on the Electromigration-Induced Instability of the Interface between Joined Conductive MaterialsMakhviladze, T. M. / Sarychev, M. E. et al. | 2022
- 435
-
Laser Plasma-Chemical Etching of Polycrystalline Diamond and Single-Crystal SapphireRed’kin, S. V. / Mal’tsev, P. P. / Kondratenko, V. S. / Yuzeeva, N. A. et al. | 2022
- 439
-
Contact Transport and Field Emission Properties of Low-Dimensional 2D Carbon HeterostructuresYafarov, R. K. / Shabunin, N. O. et al. | 2022
- 445
-
Computer Analysis of Resistive Switching in a Bismuth Selenide Microcrystal-Based StructureSirotkin, V. V. / Zotov, A. V. / Tulin, V. A. et al. | 2022
- 454
-
Magneto-Optical Properties of Multilayer Structures Based on Cobalt and Chromium-Group Metals for Magnetic Memory ElementsProkaznikov, A. V. / Paporkov, V. A. / Selyukov, R. V. / Vasilev, S. V. / Savenko, O. V. et al. | 2022
- 465
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Electroluminescence in p-GaP/por-GaP/SnO2 Structures in the Red Region of the SpectrumDikhanbaev, K. K. / Jamayeva, U. A. / Korobova, N. E. / Ikramova, S. B. et al. | 2022
- 470
-
Dielectric Barrier in the Subtractive Process of Formation of a Copper Metallization SystemOrlov, A. A. / Rezvanov, A. A. / Gvozdev, V. A. / Orlov, G. A. / Seregin, D. S. / Kuznetsov, P. I. / Blumberg, T. / Veselov, A. A. / Suzuki, T. / Morozov, E. N. et al. | 2022
- 480
-
Parameters of Gaseous Phase and Kinetics of Reactive Ion Etching of SiO2 in CF4/C4F8/Ar/He PlasmaEfremov, A. M. / Kwon, K.-H. et al. | 2022
- 488
-
Effect of Ion-Plasma Treatment on the Phase Composition and Electrical Resistivity of Nanometer-Thick Tungsten FilmsSelyukov, R. V. / Amirov, I. I. / Naumov, V. V. et al. | 2022
- 497
-
On the Effect of the Cl2 + O2 + Ar Mixture Composition on the Concentrations of Chlorine and Oxygen Atoms in a PlasmaAmirov, I. I. / Izyumov, M. O. / Efremov, A. M. et al. | 2022
- 505
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Peculiarities of the Kinetics of Heterogeneous Processes during the Etching of Silicon in CF4 and C2Br2F4 PlasmaMiakonkikh, A. V. / Kuzmenko, V. O. / Efremov, A. M. / Rudenko, K. V. et al. | 2022
- 512
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Design of Cu-MWCNT Based Heterogeneous Coaxial through Silicon Vias for High-Speed VLSI ApplicationsRajkumar, Katepogu / Reddy, G. Umamaheswara et al. | 2022