Evaluation of EUV resist materials for use at the 32 nm half-pitch node (English)
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In:
Emerging Lithographic Technologies, 12
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69211F/1-69211F/11
;
2008
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ISSN:
- Conference paper / Print
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Title:Evaluation of EUV resist materials for use at the 32 nm half-pitch node
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Contributors:Wallow, T. ( author ) / Higgins, C. ( author ) / Brainard, R. ( author ) / Petrillo, K. ( author ) / Montgomery, W. ( author ) / Koay, Chiew-Seng ( author ) / Denbeaux, G. ( author ) / Wood, O. ( author ) / Wei, Yayi ( author )
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Published in:Emerging Lithographic Technologies, 12 ; 69211F/1-69211F/11Proceedings of the SPIE - The International Society for Optical Engineering ; 6921 ; 69211F/1-69211F/11
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Publisher:
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Publication date:2008
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Size:11 Seiten, 37 Quellen
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ISSN:
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Coden:
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DOI:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source: