Rapid thermal annealing - theory and practice (English)
- New search for: Hill, C.
- New search for: Jones, S.
- New search for: Boys, D.
- New search for: Hill, C.
- New search for: Jones, S.
- New search for: Boys, D.
In:
Reduced Thermal Processing for ULSI, Proceedings of a NATO Advanced Study Institute
;
143-180
;
1989
-
ISBN:
- Conference paper / Print
-
Title:Rapid thermal annealing - theory and practice
-
Additional title:Schnelle Wärmebehandlung - Theorie und Praxis
-
Contributors:
-
Published in:NATO ASI Series B ; 207 ; 143-180
-
Publisher:
- New search for: Plenum Press
-
Place of publication:New York,London
-
Publication date:1989
-
Size:38 Seiten, 31 Bilder, 5 Tabellen, 24 Quellen
-
ISBN:
-
Type of media:Conference paper
-
Type of material:Print
-
Language:English
-
Keywords:HALBLEITERTECHNOLOGIE , WAERMEBEHANDLUNG , PLANARTECHNOLOGIE , TEMPERATURGANG , ZEITVERHALTEN , WAERMESTRAHLUNG , QUARZGLAS , ELEKTRISCHE LAMPE , ABSORPTION VON LICHT , ABSORPTION VON STRAHLUNG , METALLDAMPFLAMPE , OPTISCHE EIGENSCHAFT , THERMISCHE EIGENSCHAFT , THEORETISCHES MODELL , VERSUCHSERGEBNIS , VLSI-SCHALTUNG , RTP (RAPID THERMAL PROCESSING)
-
Source:
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
-
Rapid thermal processing with reactive gasesNulman, J. et al. | 1989
- 53
-
Silicidation by rapid thermal processingHove, L. van den / Keersmaecker, R.F.de et al. | 1989
- 117
-
Microstructural defects in rapid thermally processed IC materialsReader, A.H. et al. | 1989
- 143
-
Rapid thermal annealing - theory and practiceHill, C. / Jones, S. / Boys, D. et al. | 1989
- 181
-
Rapid thermal process integrationCalder, I.D. et al. | 1989
- 227
-
Introduction to direct writing of integrated circuitAuvert, G. et al. | 1989
- 253
-
Ion beam assisted processesFoti, G. et al. | 1989
- 269
-
Micrometallization technologiesMartinez-Duart, J.M. / Albella, J.M. et al. | 1989
- 295
-
Multilevel interconnect structuresHerndon, T.O. et al. | 1989
- 355
-
Interlevel dielectrics for reduced thermal processingBecker, F.S. et al. | 1989
- 393
-
Low temperature silicon epitaxy for novel device structuresOgawa Borland, J. et al. | 1989