Lithographic technology for future ULSIs (English)
- New search for: Okazaki, S.
- New search for: Okazaki, S.
In:
Solid State Technology
;
34
, 11
;
77-82
;
1991
-
ISSN:
- Article (Journal) / Print
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Title:Lithographic technology for future ULSIs
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Additional title:Lithographische Techologie für zukünftige ULSIs
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Contributors:Okazaki, S. ( author )
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Published in:Solid State Technology ; 34, 11 ; 77-82
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Publisher:
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Publication date:1991
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Size:6 Seiten, 10 Bilder, 22 Quellen
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ISSN:
-
Type of media:Article (Journal)
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Type of material:Print
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Language:English
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Keywords:TECHNISCHE ENTWICKLUNG , MIKROPHOTOLITHOGRAPHIE , TREND (ENTWICKLUNG) , GROESSTINTEGRATION , SUBMIKROMETERBEREICH , MASKENTECHNIK , AUFLOESUNGSVERMOEGEN , WAFER (HALBLEITERPLAETTCHEN) , PHASENVERSCHIEBUNG , BILDKONTRAST , EXCIMER-LASER , ELEKTRONENSTRAHLLITHOGRAPHIE , ELEKTRONENSTRAHLSCHREIBEN , ROENTGENLITHOGRAPHIE , UEBERSICHT , VORHERSAGE , ELEKTRONENLACK , ZUKUNFT , PHOTOLACK , ULSI-SCHALTUNG
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Source:
Table of contents – Volume 34, Issue 11
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 43
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Silicon wafer consumption: A revised forecastFitzGerald, M. et al. | 1991
- 57
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Antireflection layers and planarization for microlithographyHorn, M.W. et al. | 1991
- 67
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A four-metal layer, high performance interconnect system for bipolar and BiCMOS circuitsWilson, S.R. / Freeman, J.L. / Tracy, C.J. et al. | 1991
- 77
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Lithographic technology for future ULSIsOkazaki, S. et al. | 1991
- S1
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Valve technology for the ULSI eraBourscheid, G. / Sawyer, K.W. / Greene, L. / Glasstetter, G. / Irion, P. / Seidler, T.J. et al. | 1991