Deposition and properties of thick corrosion and wear-resistent Ti2N coatings (English)
- New search for: Stappen, M. Van
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- New search for: Quaeyhaegens, C.
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In:
Surface and Coatings Technology
;
74-75
, 1-3
;
143-146
;
1995
-
ISSN:
- Article (Journal) / Print
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Title:Deposition and properties of thick corrosion and wear-resistent Ti2N coatings
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Additional title:Abscheidung und Eigenschaften von dicken korrosions- und verschleißbeständigen Ti2N-Schichten
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Contributors:Stappen, M. Van ( author ) / De Bruyn, K. ( author ) / Quaeyhaegens, C. ( author ) / Stals, L. ( author ) / Poulek, V. ( author )
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Published in:Surface and Coatings Technology ; 74-75, 1-3 ; 143-146
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Publisher:
-
Publication date:1995
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Size:4 Seiten, 2 Bilder, 2 Tabellen, 17 Quellen
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ISSN:
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Coden:
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DOI:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
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Keywords:physikalisches Aufdampfen , Aufdampfschicht , Titannitridbeschichtung , Schnellarbeitsstahl , nichtrostender Stahl , Nichtoxidkeramik , Korrosionsbeständigkeit , Verschleißwiderstand , Verfahrensparameter , Härte , Härteprüfung , Adhäsion , Eigenspannung , Textur , Röntgenstrahlbeugung , niedriglegierter Stahl , Verfahrensbedingung
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Source:
Table of contents – Volume 74-75, Issue 1-3
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
-
The role of hydrogen during plasma beam deposition of amorphous thin filmsVan de Sanden, M. C. M. / Severens, R. J. / Meulenbroeks, R. F. G. / De Graaf, M. J. et al. | 1995
- 10
-
Diagnostics of active species in plasmasHancock, G. et al. | 1995
- 15
-
A systems approach to the tribological testing of coated materialsCelis, J. P. et al. | 1995
- 23
-
Industrial applications of plasma and ion surface engineeringKaufmann, H. et al. | 1995
- 29
-
New developments in the field of superhard coatingsEhrhardt, H. et al. | 1995
- 36
-
Studies on the high rate deposition of hard carbon coatings from strongly ionized dense plasmasBolt, H. / Hemel, V. / Koch, F. / Nickel, H. et al. | 1995
- 43
-
Running discharge for PECVD inner coating of metal tubesHytry, R. / Moeller, W. / Wilhelm, R. et al. | 1995
- 49
-
New design of a plasma chamber for homogeneous web treatmentLeiber, J. / Selaff, O. / Steffens, F. / Rangelow, I. W. et al. | 1995
- 55
-
Polymer oxidation induced by vacuum-ultraviolet emissionHollaender, A. / Klemberg-Sapieha, J. E. / Wertheimer, M. R. et al. | 1995
- 59
-
Investigation of plasma surface cleaning in planar low-pressure microwave dischargesOhl, A. / Strobel, H. / Roepcke, J. / Kammerstetter, H. et al. | 1995
- 63
-
Role of ions in PECVD of amorphous siliconVan Sark, W. G. J. H. M. / Bezemer, J. / Van der Weg, W. F. et al. | 1995
- 67
-
Remote and direct microwave plasma deposition of HMDSO films: comparative studyKorzec, D. / Theirich, D. / Werner, F. / Traub, K. et al. | 1995
- 75
-
Magnetron plasmas for large-area uniform sputteringFujiyama, H. / Kuwahara, K. et al. | 1995
- 80
-
Partially reactive d.c. magnetron sputtering - a key to new understanding of reactive plasma sputter deposition?Sobe, G. et al. | 1995
- 85
-
Advantageous possibilities, design aspects and technical use of double-ring magnetron sputter sourceFrach, P. / Goedicke, K. / Winkler, T. / Gottfried, C. / Walde, H. / Hentsch, W. et al. | 1995
- 85
-
Advantageous possibilities, design aspects and technical use of double-ring magnetron sputter sourcesFrach, P. / Goedicke, K. / Winkler, T. / Gottfried, C. et al. | 1995
- 92
-
Fundamental processes in vacuum arc depositionSiemroth, P. / Schultrich, B. / Schuelke, T. et al. | 1995
- 97
-
Adhesion and elastic contact stresses of coating/substrate systems under normal and tangential loadsSchwarzer, N. / Richter, F. et al. | 1995
- 97
-
Adhesion and elastic contact stresses of coating/substrate systems under mormal and tangential loadsSchwarzer, N. / Richter, F. et al. | 1995
- 104
-
Study of the residual macroscopic stress in TiN coatings deposited on various steel types (TuSA1)Quaeyhaegens, C. / Knuyt, G. / Stals, L. M. et al. | 1995
- 110
-
Infrared ellipsometric characterization of mixed phase BN layers deposited by plasma enhanced physical vapor depositionBarth, K.-L. / Lunk, A. et al. | 1995
- 118
-
Arc evaporation of multicomponent MCrAlY cathodesKnotek, O. / Lugscheider, E. / Loeffler, F. / Beele, W. et al. | 1995
- 123
-
Deposition and characterization of TiA1ZrN films produced by a combined steered arc and unbalanced magnetron sputtering techniqueDonohue, L. A. / Cawley, J. / Brooks, J. S. / Munz, W.-D. et al. | 1995
- 135
-
Comparison of fundamental properties of r.f.-sputtered TiN~x: and HfN~x coatings on steel substratesBerg, G. / Friedrich, C. / Broszeit, E. / Kloos, K. H. et al. | 1995
- 143
-
Deposition and properties of thick corrosion and wear-resistent Ti2N coatingsStappen, M. Van / De Bruyn, K. / Quaeyhaegens, C. / Stals, L. / Poulek, V. et al. | 1995
- 143
-
Deposition and properties of thick corrosion and wear-resistant Ti~2N coatingsVan Stappen, M. / De Bruyn, K. / Quaeyhaegens, C. / Stals, L. et al. | 1995
- 147
-
An investigation into the thickness and coating structure uniformity of zirconia films on flat surfacesYoung, S. J. / James, A. S. / Matthews, A. et al. | 1995
- 155
-
Characterization of low temperature CrN and TiN (PVD) hard coatingsNavinsek, B. / Panjan, P. / Cvelbar, A. et al. | 1995
- 162
-
Influence of the presence of white layers formed during grinding and wire-electro-discharge machining on PVD TiN coating adhesionPalmers, J. / Van Stappen, M. / D'Haen, J. / D'Olieslaeger, M. et al. | 1995
- 168
-
The role of ion implantation in industrial sputtering processes for tribological applicationsKoerber, F.-J. et al. | 1995
- 173
-
Influence of the sputtering pressure on lead silicate glassy film stoichiometryRigato, V. / Maggioni, G. / Della Mea, G. et al. | 1995
- 178
-
Adhesion and wear resistance of nitrided and TiN coated low alloy steelsSpies, H.-J. / Larisch, B. / Hoeck, K. / Broszeit, E. et al. | 1995
- 183
-
Plasma deposition of hydrogenated Ge-C films in a three-electrode reactor - plasma diagnostics using indirect methodsSzymanowski, H. / Gazicki, M. / Tyczkowski, J. / Olcaytug, F. et al. | 1995
- 188
-
Hollow LaB~6 cathode arc plasma source for material processing and testingBolt, H. / Hemel, V. / Nickel, H. / Tanaka, S. et al. | 1995
- 195
-
Plasma CVD using rotating E x B drift motionMurata, M. / Takeuchi, Y. / Kojyo, D. et al. | 1995
- 200
-
Gigatron[R] - a new source for low-pressure plasmasPetasch, W. / Raeuchle, E. / Weichart, J. / Bickmann, H. et al. | 1995
- 206
-
Investigation on the sputtering effects on r.f. plasma processingYoung, S. J. / James, A. S. / Matthews, A. et al. | 1995
- 212
-
Radio-frequency low pressure supersonic jet plasma chemical systemSicha, M. / Soukup, L. / Jastrabik, L. / Novak, M. et al. | 1995
- 215
-
A combined MW/ECR-PACVD apparatus for the deposition of diamond and other hard coatingsBuchkremer-Hermanns, H. / Ren, H. / Weiss, H. et al. | 1995
- 221
-
Numerical simulations of microwave plasma reactors for diamond CVDFuener, M. / Wild, C. / Koidl, P. et al. | 1995
- 227
-
Fundamental investigations in plasma modification of polymersMeichsner, J. / Nitschke, M. / Rochotzki, R. / Zeuner, M. et al. | 1995
- 232
-
Simulation of a triode plasma-assisted chemical vapour deposition systemVan Breda, J. H. / Dias, A. G. / Haije, W. G. / Schram, D. C. et al. | 1995
- 238
-
Modelling temperature effects in reactive sputtering of compound materialsWautelet, M. / Dauchot, J. P. / Edart, S. / Hecq, M. et al. | 1995
- 241
-
Possibilities of influencing vacuum arc evaporation by time-dependent arc currentEllrodt, M. / Mecke, H. et al. | 1995
- 246
-
Non-destructive evaluation of TiN films with interface defects by surface acoustic wavesOllendorf, H. / Schneider, D. / Schwarz, T. / Mucha, A. et al. | 1995
- 253
-
Bonding strengths of PCVD films under cyclic loadingChen, H. / Yi, M.-Z. / Xu, K.-W. / He, J.-W. et al. | 1995
- 259
-
High rate PECVD of a-Si alloys on large areasRoehlecke, S. / Tews, R. / Kottwitz, A. / Schade, K. et al. | 1995
- 264
-
Microstructure of copper films condensed from a copper plasma with ion energies between 2 and 150 eVMausbach, M. et al. | 1995
- 273
-
Residual stresses in nitride hard coatings prepared by magnetron sputtering and arc evaporationOettel, H. / Wiedemann, R. / Preissler, S. et al. | 1995
- 279
-
X-ray diffractometry analysis of r.f.-sputtered hard coatings based on nitrides of Ti, Cr, HfFriedrich, C. / Berg, G. / Broszeit, E. / Kloos, K.-H. et al. | 1995
- 286
-
(TiCr)N coatings deposited by cathodic vacuum arc evaporationVetter, J. / Scholl, H. J. / Knotek, O. et al. | 1995
- 292
-
SiO~2 coatings produced by ion beam assisted ECR-plasma CVDBaba, K. / Hatada, R. / Nagata, S. / Fujiyama, H. et al. | 1995
- 297
-
Reactively sputtered Cr nitride coatings studied using the acoustic emission scratch test techniqueJensen, H. / Jensen, U. M. / Sorensen, G. et al. | 1995
- 306
-
An investigation into the use of a simple model for thickness uniformity on horizontal surfaces to describe thickness variations on vertical substratesJames, A. S. / Young, S. J. / Matthews, A. et al. | 1995
- 312
-
X-Ray diffraction investigations of magnetron sputtered TiCN coatingsSchneider, J. M. / Voevodin, A. / Rebholz, C. / Matthews, A. et al. | 1995
- 320
-
Chemical and structural analysis of aluminium-oxygen coatings obtained by d.c. magnetron reactive sputtering: some features of the processStauder, B. / Perry, F. / Frantz, C. et al. | 1995
- 326
-
Properties of TiN hard coatings prepared by unbalanced magnetron sputtering and cathodic arc deposition using a uni- and bipolar pulsed bias voltageGriepentrog, M. / Mackrodt, B. / Mark, G. / Linz, T. et al. | 1995
- 333
-
Deposition and properties of TiN/carbon multilayers for corrosion protection of steelKupfer, H. / Richter, F. / Friedrich, S. / Spies, H.-J. et al. | 1995
- 339
-
Process technological aspects of the production and properties of in situ combined plasma-nitrided and PVD hard- coated high alloy tool steelsHoeck, K. / Leonhardt, G. / Buecken, B. / Spies, H.-J. et al. | 1995
- 345
-
Temporal evolution of hydrogen plasma produced with gas pulse injection schemeOzasa, K. / Aoyagi, Y. et al. | 1995
- 351
-
Cleaning of iron archaeological artefacts by cascaded arc plasma treatmentDe Graaf, M. J. / Severens, R. J. / Van IJzendoorn, L. J. / Munnik, F. et al. | 1995
- 355
-
Generation of a highly uniform and dense plasma by distributing hollow cathodes on the electrode surfaceSugawara, M. / Asami, T. et al. | 1995
- 358
-
The influence of oriented growth on the surface roughness of CVD diamond filmsNoergaard, C. / Eskildsen, S. S. / Matthews, A. et al. | 1995
- 362
-
Studies on the synthesis of hard coatings by plasma-assisted CVD using metallo-organic compoundsRie, K.-T. / Gebauer, A. / Woehle, J. et al. | 1995
- 369
-
Zirconium carbonitride films produced by plasma-assisted metal organic chemical vapour depositionBerndt, H. / Zeng, A.-Q. / Stock, H.-R. / Mayr, P. et al. | 1995
- 375
-
Synthesis of TiN/TiCN/TiC layer systems on steel and cermet substrates by PACVDRie, K.-T. / Gebauer, A. / Woehle, J. / Toenshoff, H. K. et al. | 1995
- 382
-
Amorphous hydrogenated carbon nitride films obtained by plasma-enhanced chemical vapour depositionFreire, F. L. / Mariotto, G. / Achete, C. A. / Franceschini, D. F. et al. | 1995
- 387
-
Improving the anticorrosion and mechanical behaviour of PACVD TiNHe, J.-W. / Bai, C.-D. / Xu, K.-W. / Hu, N.-S. et al. | 1995
- 394
-
Atmospheric pressure gas discharges for surface treatmentPochner, K. / Neff, W. / Lebert, R. et al. | 1995
- 399
-
Microstructure and mechanical properties of a-B(1-x)N(x):H films prepared by r.f. PACVDDekempeneer, E.H.A. / Meneve, J. / Kuypers, S. / Smeets, J. et al. | 1995
- 399
-
Microstructure and mechanical properties of films prepared by r.f. PACVDDekempeneer, E. H. A. / Meneve, J. / Kuypers, S. / Smeets, J. et al. | 1995
- 405
-
Structure analysis of plasma-nitrided pure ironD'Haen, J. / Quaeyhaegens, C. / Knuyt, G. / D'Olieslaeger, M. et al. | 1995
- 412
-
Structure and properties of plasma-nitrided stainless steelMenthe, E. / Rie, K.-T. / Schultze, J. W. / Simson, S. et al. | 1995
- 417
-
Nitriding of austenitic stainless steel by plasma immersion ion implantationCollins, G. A. / Hutchings, R. / Short, K. T. / Tendys, J. et al. | 1995
- 425
-
Plasma diffusion treatment of stelliteKim, Y. S. / Park, J. R. / Menthe, E. / Rie, K.-T. et al. | 1995
- 431
-
Characterization of a microwave plasma by in situ diagnosticsBrockhaus, A. / Korzec, D. / Werner, F. / Yuan, Y. et al. | 1995
- 443
-
Optical emission spectroscopy on an industrial PACVD system for titanium nitrideHochreiter, R. / Laimer, J. / Stoeri, H. / Heim, D. et al. | 1995
- 450
-
Plasma diagnostics of low pressure microwave-enhanced d.c. sputtering dischargeMisina, M. / Musil, J. et al. | 1995
- 455
-
In situ characterization of the remote plasma techniqueKulisch, W. / Schiller, M. / Reinke, S. et al. | 1995
- 461
-
Process control of magnetron sputtering of TiN coatings studied by in situ AES and plasma diagnosticsRoth, R. / Schubert, J. / Fromm, E. et al. | 1995
- 469
-
Plasma diagnostic studies of low-energy ion bombardment in r.f. magnetron sputter depositionKaltofen, R. / Weise, G. et al. | 1995
- 474
-
Optical diagnostics of active species in N~2 microwave flowing post-dischargesBockel, S. / Diamy, A. M. / Ricard, A. et al. | 1995
- 479
-
Optical diagnostics of d.c. and r.f. argon magnetron dischargesDony, M. F. / Ricard, A. / Dauchot, J. P. / Hecq, M. et al. | 1995
- 485
-
Diagnostic on N~2 plasma with an energy resolved quadrupole mass spectrometer at the powered electrode in a reactive ion etching system: ion energy distribution of N^+~2 and N ^+Becker, F. / Rangelow, I. W. / Masseli, K. / Kassing, R. et al. | 1995
- 491
-
Nanostructured titanium boron nitride coatings of very high hardnessMollart, T. P. / Baker, M. / Haupt, J. / Steiner, A. et al. | 1995
- 497
-
PVD coatings on aluminium substratesLugscheider, E. / Kraemer, G. / Barimani, C. / Zimmermann, H. et al. | 1995
- 503
-
Deposition of a-Si:H films by ECR plasma CVD using large diameter multi-slot antennaeUeda, Y. / Teranishi, H. / Tanaka, M. / Shinohara, S. et al. | 1995
- 508
-
High deposition rate coating with nanodisperse SiC powder by plasma-assisted pulse pyrolysisDrost, H. / Friedrich, M. / Mohr, R. et al. | 1995
- 512
-
R.F. bias effect on ECR plasmaMurata, M. / Takeuchi, Y. / Kai, Y. / Tanaka, M. et al. | 1995
- 516
-
Flow visualization studies for optimization of the growth of TiN by PACVDCrummenauer, J. / Stock, H.-R. / Mayr, P. et al. | 1995
- 522
-
Mass spectrometry investigation of N~2O dissociation and H~2 and H~2O production during SiO~2 deposition in a remote reactorWolf, R. / Wandel, K. et al. | 1995
- 528
-
Mechanism of TiN film deposition by reactive evaporation measured by a quartz crystal microbalanceSchubert, J. / Martin, M. / Roth, R. / Fromm, E. et al. | 1995
- 534
-
Ion energy determination for r.f. plasma and ion beam using a multigrid retarding field analyserYuan, Y. / Bansky, J. / Engemann, J. / Brockhaus, A. et al. | 1995
- 539
-
Characterization of plasma in an inductively coupled high-dense plasma sourceKaendler, E. / Grasshoff, G. / Drescher, K. et al. | 1995
- 546
-
Pyrometric substrate temperature measurement during plasma etchingRichter, K. / Drescher, K. et al. | 1995
- 546
-
Pyrometric substrate temperature measurements during plasma etchingRichter, K. / Drescher, K. et al. | 1995
- 552
-
Spatial variations of plasma structures under the influence of electrically biased probes and test objects measured by optical emission computerized tomographySchielke, W. / Roettig, G. / Ohl, A. / Hanneman, M. et al. | 1995
- 562
-
Ion energy distributions in an r.f.-d.c.-triode glow dischargeZeuner, M. / Meichsner, J. et al. | 1995
- 562
-
Ion energy distribution in an r.f.-d.c.-triode glow dischargeZeuner, M. / Meichsner, J. et al. | 1995
- 567
-
Neutron and soft X-ray multilayered mirrors deposited by triode sputtering using an automatic accurate thickness monitoring techniqueSella, C. / Kaabouchi, M. / Nemraoui, O. / Youn, K. B. et al. | 1995
- 571
-
Application of an acousto-optic spectrometer for plasma etching process quality controlShogun, V. / Tyablikov, A. / Shelyhmanov, E. / Abachev, M. et al. | 1995
- 575
-
Plasma diagnostics for the control of reactive magnetron deposition processPerry, F. / Stauder, B. / Henrion, G. / Pigeat, P. et al. | 1995
- 580
-
Investigation of plasma produced by laser and electron pulse ablationWitke, T. / Lenk, A. / Schultrich, B. / Schultheiss, C. et al. | 1995
- 586
-
Plasma diagnostics by energy resolved quadrupole mass spectrometry of a reactive magnetron sputtering discharge from an Fe target in Ar-H~2S atmospheresEllmer, K. / Lichtenberger, D. et al. | 1995
- 594
-
Plasma polymer thin films with encapsulated dye molecules and silver nanoparticlesHomilius, F. / Heilmann, A. / Von Borczyskowski, C. et al. | 1995
- 598
-
Combination of different plasma assisted processes with pulsed d.c.: cleaning, nitriding and hardcoatingsGruen, R. et al. | 1995
- 604
-
Numerical description of texture evolution in a growing film, starting from random orientationsKnuyt, G. / Quaeyhaegens, C. / D'Haen, J. / Stals, L. M. et al. | 1995
- 609
-
Mutual interdiffusion of elements in steel and Ti coating and aluminium and Ti coating couples during plasma nitridingMusil, J. / Vlcek, J. / Jezek, V. / Benda, M. et al. | 1995
- 614
-
A new valuation of the classical hardness definition and consequences for mechanical characterizations of thin filmsRother, B. / Dietrich, D. A. et al. | 1995
- 618
-
Broad pressure range PTFE surface modification with slot antenna microwave dischargeWinter, R. / Korzec, D. / Sprang, N. / Theirich, D. et al. | 1995
- 625
-
Evaluation of interface strength between TiN coatings and hardened high speed steel substratesRother, B. / Dietrich, D. A. et al. | 1995
- 629
-
State of the art for the industrial use of ceramic PVD coatingsVan Stappen, M. / Stals, L. M. / Kerkhofs, M. / Quaeyhaegens, C. et al. | 1995
- 634
-
Flexibility of microwave plasma chemical vapour deposition for diamond growthSchulte, B. / Juergensen, H. / Blackborow, P. / Sevillano, E. et al. | 1995
- 637
-
Large area and three-dimensional deposition of diamond-like carbon films for industrial applicationsRoth, D. / Rau, B. / Roth, S. / Mai, J. / Dittrich, K.-H. et al. | 1995
- 642
-
Cavitation protection by low temperature TiCN coatingsMuensterer, S. / Kohlhof, K. et al. | 1995
- 648
-
Sputter metallization of plastic parts in a just-in-time coaterKukla, R. / Hofmann, D. / Ickes, G. / Patz, U. et al. | 1995
- 654
-
Substrate rotation in PVD processes and effects on the performance of coated toolsEbersbach, G. / Fabian, D. / Jehn, H. A. / Rother, B. et al. | 1995
- 658
-
Wear resistance of PVD coatings in plastics processingHeinze, M. / Mennig, G. / Paller, G. et al. | 1995
- 664
-
Plasma functionalization and reorientation of macromolecules at polymer surfacesFriedrich, J. F. / Geng, S. / Unger, W. / Lippitz, A. / Erdmann, J. / Gorsler, H.-V. / Woell, C. / Schertel, A. / Bierbaum, K. et al. | 1995
- 670
-
Ion beam treatment induced conductivity in polyimide foilsBaether, K.-H. / Herrmann, U. et al. | 1995
- 676
-
Plasma-deposited passivation layers for moisture and water protectionVogt, M. / Hauptmann, R. et al. | 1995
- 682
-
Improvement of the adhesion of low-energy polymers by a short-time plasma treatmentPetasch, W. / Raeuchle, E. / Walker, M. / Elsner, P. et al. | 1995
- 689
-
Plasma and ion beam surface treatment of polyethyleneSprang, N. / Theirich, D. / Engemann, J. et al. | 1995
- 696
-
Magnetron-sputtered carbon nitride (CN~x) filmsKola, P. V. / Cameron, D. C. / Meenan, B. J. / Pischow, K. A. / Anderson, C. A. / Brown, N. M. D. / Hashmi, M. S. J. et al. | 1995
- 704
-
Properties of carbon nitride layers generated by direct plasma beam depositionWeber, F.-R. / Oechsner, H. et al. | 1995
- 710
-
The penetration into blind holes of diamond-like carbon films produced by r.f. plasma-assisted CVDDowey, S. J. / Read, K. M. / Fancey, K. S. / Matthews, A. et al. | 1995
- 717
-
Cubic boron nitride films prepared by reactive r.f. and d.c. sputtering from different boron containing targetsSchuetze, A. / Bewilogua, K. / Luethje, H. / Kouptsidis, S. / Jaeger, S. et al. | 1995
- 723
-
Critical test of the c-BN sputter modelReinke, S. / Kuhr, M. / Kulisch, W. et al. | 1995
- 729
-
Characterization of cubic boron nitride films prepared by ion beam assisted depositionWituschek, H. / Stopka-Ebler, H. / Wolf, G. K. et al. | 1995
- 734
-
Characterization and performance of diamond-like carbon films synthesized by plasma- and ion-beam-based techniquesWalter, K. C. / Kung, H. / Levine, T. / Tesmer, J. T. / Kodali, P. / Wood, B. P. / Rej, D. J. / Nastasi, M. / Koskinen, J. / Hirvonen, J.-P. et al. | 1995
- 739
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Application-oriented modifications of deposition processes for diamond-like-carbon-based coatingsGrischke, M. / Bewilogua, K. / Trojan, K. / Dimigen, H. et al. | 1995
- 746
-
Effect of deposition conditions on the growth and behaviour of thin carbon films prepared by ion-assisted evaporationUllmann, J. / Baba, K. / Martin, H. / Wolf, G. K. et al. | 1995
- 754
-
The effect of ion implantation on the fatigue life and corrosion resistance of M50 steel bearingsDodd, A. / Kinder, J. / Torp, B. / Nielsen, B. R. / Rangel, C. M. / Da Silva, M. F. et al. | 1995
- 760
-
Corrosion resistance of N-, Cr- or Cr + N-implanted AISI 420 stainless steelHirvonen, J.-P. / Rueck, D. / Yan, S. / Mahiout, A. / Torri, P. / Likonen, J. et al. | 1995
- 765
-
Implantation of N^+~2, O^+ and CO^+ ions into titanium and Ti-6Al-4VHoehl, F. / Berndt, H. / Mayr, P. / Stock, H.-R. et al. | 1995
- 770
-
PVD equipment design: concepts for increased production throughputStevenson, P. / Matthews, A. et al. | 1995
- 781
-
Modification of mechanical properties of nitrogen-sputtered boron nitride films by ion bombardmentJensen, H. / Jensen, U. M. / Sorensen, G. et al. | 1995
- 788
-
Oblique angle sputtering procedure for the deposition of biaxially aligned layers on polycrystalline metallic substratesGottzein, R. et al. | 1995
- 793
-
Ion-beam-assisted deposition of magnetron-sputtered metal nitridesBaether, K.-H. / Herrmann, U. / Schroeer, A. et al. | 1995
- 802
-
Influence of titanium on the structural stability of sputter-deposited W-Co-C filmsTrindade, B. / Vieira, M. T. / Bauer-Grosse, E. et al. | 1995
- 806
-
Deposition of cubic boron nitride with an inductively coupled plasmaKuhr, M. / Reinke, S. / Kulisch, W. et al. | 1995
- 813
-
Laser-induced vacuum arc (Laser Arc) and its application for deposition of hard amorphous carbon filmsScheibe, H.-J. / Schultrich, B. / Drescher, D. et al. | 1995
- 819
-
Study of the diamond deposition on cemented carbides containing 10 wt.% Co with a tungsten intermediate layerVandierendonck, K. / Quaeyhaegens, C. / Nesladek, M. / D'Haen, J. / Vlekken, J. / D'Olieslaeger, M. / Stals, L. M. et al. | 1995
- 827
-
Improvements in a-C film properties by metal incorporation and intermediate layersEckel, M. / Kampschulte, G. / Markschlaeger, P. et al. | 1995
- 833
-
Properties and performance of new metastable Ti-B-C-N hard coatings prepared by magnetron sputteringStueber, M. / Schier, V. / Holleck, H. et al. | 1995
- 838
-
Thin metal and SiO~x films deposited by the anodic vacuum arc techniqueMarkschlaeger, P. / Kampschulte, G. / Eckel, M. / Morlok, O. et al. | 1995
- 844
-
Deposition of hard coatings in open magnetic field confined plasmaZlatanovic, M. / Belosevac, R. / Kunosic, A. / Popovic, N. / Bogdanov, Z. et al. | 1995
- 849
-
Adhesion strength of ductile aluminium and brittle TiN coatings on steel, aluminium and copper, measured by fracture mechanics testsMueller, D. / Cho, Y. R. / Fromm, E. et al. | 1995
- 857
-
Investigation into the impact wear behaviour of ceramic coatingsBantle, R. / Matthews, A. et al. | 1995
- 869
-
Multi-function scratch testerBennett, S. / Matthews, A. et al. | 1995
- 877
-
Tribological characterization of coatings by oscillating sliding testingKlaffke, D. / Skopp, A. / Lenke, I. et al. | 1995
- 884
-
Friction monitored scratch adhesion testingBellido-Gonzalez, V. / Stefanopoulos, N. / Deguilhen, F. et al. | 1995
- 890
-
Structure and electron emission characteristics of sputtered lanthanum hexaboride filmsWaldhauser, W. / Mitterer, C. / Laimer, J. / Stoeri, H. et al. | 1995
- 897
-
XPS in the study of high-temperature oxidation of CrN and TiN hard coatingsMilosev, I. / Strehblow, H.-H. / Navinsek, B. et al. | 1995
- 903
-
Structure-properties relationship of metastable Al-Cr and Al-Ti alloys deposited by r.f. magnetron sputtering: role of nitrogenSanchette, F. / Huu, T. / Billard, L. A. / Frantz, C. et al. | 1995
- 910
-
Barrier properties of plasma and chemically fluorinated polypropylene and polyethyleneterephthalateFriedrich, J. F. / Wigan, L. / Unger, W. / Lippitz, A. / Erdmann, J. / Gorsler, H.-V. / Prescher, D. / Wittrich, H. et al. | 1995
- 919
-
Novel applications of CrN (PVD) coatings deposited at 200 CNavinsek, B. / Panjan, P. et al. | 1995
- 927
-
Ion-beam-induced amorphization of 6H-SiCBolse, W. / Conrad, J. / Roedle, T. / Weber, T. et al. | 1995
- 932
-
Reactive ion beam etching of lithium tantalate and its application for pyroelectric infrared detectorsPlehnert, C. / Norkus, V. / Moehling, S. / Hayes, A. et al. | 1995
- 937
-
Change in the phase growth rates in Cu-Si films subjected to ion implantationShpilevsky, E. M. / Shpilevsky, M. E. / Andreev, M. A. et al. | 1995
- 941
-
Ion beam mixing experiments in Pt/Ni bilayersConrad, J. / Bolse, W. / Lieb, K. P. / Weber, T. et al. | 1995
- 945
-
Deposition of metal layers on carbon assisted with the same metal's ion radiationTashlykov, I. S. / Bobrovich, O. G. / Palchekh, V. C. / Tuljev, V. V. / Alov, N. V. / Kulikauskas, V. S. / Wolf, G. K. et al. | 1995
- 949
-
Spreading of impulse plasma within a coaxial acceleratorZdunek, K. et al. | 1995
- 953
-
Hard coatings under vibrational contact conditionsBlanpain, B. / Mohrbacher, H. / Liu, E. / Celis, J. P. / Roos, J. R. et al. | 1995
- 959
-
Ion-beam-assisted deposition of aluminium and aluminium alloy coatings for corrosion protectionEnders, B. / Krauss, S. / Baba, K. / Wolf, G. K. et al. | 1995
- 966
-
Lateral thickness inhomogeneities of Cu, Ti and Ag ion-beam-assisted deposition coatings on three-dimensional substrates studied by proton-induced X-ray emissionKlatt, C. / Enders, B. / Wolf, G. K. et al. | 1995
- 973
-
Plasma surface treatment and PACVD on Ti alloys for surgical implantsRie, K.-T. / Stucky, T. / Silva, R. A. / Leitao, E. / Bordji, K. / Jouzeau, J.-Y. / Mainard, D. et al. | 1995
- 981
-
Crystallization and oxidation behavior of Mo-Si-N coatingsHirvonen, J.-P. / Suni, I. / Kattelus, H. / Lappalainen, R. / Torri, P. / Kung, H. / Jervis, T. R. / Nastasi, M. / Tesmer, J. R. et al. | 1995
- 986
-
Mechanical properties and structure of Ti-6Al-4V alloy implanted with different light ionsAlonso, F. / Arizaga, A. / Quainton, S. / Ugarte, J. J. / Viviente, J. L. / O�ate, J. I. et al. | 1995
- 993
-
Plasma enhanced deposition of corrosion resistant high reflectivity mirrorsBuschmann, B. / Scheidt, A. / Mausbach, M. / Schmidt-Kaler, T. et al. | 1995
- 998
-
Oxidation behaviour of W-N-M (M = Ni, Ti)sputtered filmsLouro, C. / Cavaleiro, A. et al. | 1995
- 1005
-
Electron and laser radiation as sources of zirconia film depositionKreutz, E. W. / Lemmer, O. / Wesner, D. A. / Alunovic, M. / Erkens, G. / Leyendecker, T. / Voss, A. et al. | 1995
- 1012
-
Laser radiation: a tool for generation of defined thin film properties for applicationKreutz, E. W. / Alunovic, M. / Klotzbuecher, T. / Mertin, M. / Wesner, D. A. / Pfleging, W. et al. | 1995
- 1020
-
Decorative boride coatings based on LaB~6Mitterer, C. / Komenda-Stallmaier, J. / Losbichler, P. / Schmoelz, P. / Stoeri, H. et al. | 1995
- 1028
-
Design of piezoelectric thin films in the system AlN-ZnOKunisch, C. / Holleck, H. et al. | 1995
- 1033
-
Plasma-enhanced CVD of electrochromic materialsKuypers, A. D. / Spee, C. I. M. A. / Linden, J. L. / Kirchner, G. / Forsyth, J. F. / Mackor, A. et al. | 1995
- 1038
-
High pressure d.c. sputtering of high T~c superconducting films: properties and deposition conditionsGeerkens, A. / Fuelber, K. / Frenck, H.-J. et al. | 1995
- 1043
-
On the influence of ion-induced surface modification on localized corrosion of aluminiumEmmerich, R. / Wolf, G. K. / Buhl, H. / Braun, R. et al. | 1995