Silicon temperature and thermal gradients measurements in a rapid thermal processor operating at atmospheric pressure or in vacuum (English)
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In:
Materials Research Society Symposia Proc., Rapid thermal processing of electronic materials
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259-263
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1987
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ISBN:
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ISSN:
- Conference paper / Print
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Title:Silicon temperature and thermal gradients measurements in a rapid thermal processor operating at atmospheric pressure or in vacuum
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Additional title:Messung der Temperatur und des Temperaturgradienten von Silicium in einer schnellen Waermebehandlungseinrichtung, die bei Atmosphaerendruck oder in Vakuum arbeitet
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Contributors:
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Published in:Materials Research Society Symposia Proc., Rapid thermal processing of electronic materials ; 259-263Materials Research Society Symposium - Proceedings ; 92 ; 259-263
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Publisher:
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Publication date:1987
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Size:5 Seiten, 4 Bilder, 4 Quellen
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ISBN:
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ISSN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
Table of contents conference proceedings
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Silicon temperature and thermal gradients measurements in a rapid thermal processor operating at atmospheric pressure or in vacuumDilhac, J.M. / Ganibal, C. / Martinez, A. et al. | 1987