ArF excimer laser resists based on fluoroalcohol (English)
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- New search for: Truong, H. D.
- New search for: Allen, R. D.
- New search for: Li, W.
- New search for: Varanasi, P. R.
- New search for: Chen, K.‐J.
- New search for: Khojasteh, M.
- New search for: Huang, W.‐S.
- New search for: Burns, S. D.
- New search for: Pfeiffer, D.
- New search for: Ito, H.
- New search for: Truong, H. D.
- New search for: Allen, R. D.
- New search for: Li, W.
- New search for: Varanasi, P. R.
- New search for: Chen, K.‐J.
- New search for: Khojasteh, M.
- New search for: Huang, W.‐S.
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In:
Polymers for Advanced Technologies
;
17
, 2
;
104-115
;
2006
- Article (Journal) / Electronic Resource
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Title:ArF excimer laser resists based on fluoroalcohol
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Contributors:Ito, H. ( author ) / Truong, H. D. ( author ) / Allen, R. D. ( author ) / Li, W. ( author ) / Varanasi, P. R. ( author ) / Chen, K.‐J. ( author ) / Khojasteh, M. ( author ) / Huang, W.‐S. ( author ) / Burns, S. D. ( author ) / Pfeiffer, D. ( author )
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Published in:Polymers for Advanced Technologies ; 17, 2 ; 104-115
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Publisher:
- New search for: John Wiley & Sons, Ltd.
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Publication date:2006-02-01
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Size:12 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 17, Issue 2
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 71
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EditorialOber, Christopher / Ueda, Mitsuru et al. | 2006
- 72
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Recent developments in the use of two‐photon polymerization in precise 2D and 3D microfabricationsLee, Kwang‐Sup / Yang, Dong‐Yol / Park, Sang Hu / Kim, Ran Hee et al. | 2006
- 83
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Fabricating three‐dimensional polymeric photonic structures by multi‐beam interference lithographyMoon, Jun Hyuk / Ford, Jamie / Yang, Shu et al. | 2006
- 94
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Recent progress in high resolution lithographyBratton, Daniel / Yang, Da / Dai, Junyan / Ober, Christopher K. et al. | 2006
- 104
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ArF excimer laser resists based on fluoroalcoholIto, H. / Truong, H. D. / Allen, R. D. / Li, W. / Varanasi, P. R. / Chen, K.‐J. / Khojasteh, M. / Huang, W.‐S. / Burns, S. D. / Pfeiffer, D. et al. | 2006
- 116
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Depth profile and line‐edge roughness of partially O‐1‐ethoxyethylated low molecular weight amorphous polyphenol and poly(p‐hydroxystyrene) base resists for electron‐beam lithographyHirayama, Taku / Shiono, Daiju / Onodera, Junichi / Yamaguchi, Atsuko / Fukuda, Hiroshi et al. | 2006
- 122
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Advanced materials for 193 nm immersion lithographyKusumoto, Shiro / Shima, Motoyuki / Wang, Yong / Shimokawa, Tsutomu / Sato, Hozumi / Hieda, Katsuhiko et al. | 2006
- 131
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Direct patterning of poly(amic acid) and low‐temperature imidization using a photo‐base generatorFukukawa, Ken‐ichi / Shibasaki, Yuji / Ueda, Mitsuru et al. | 2006