Year of publication
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Synonyms were used for: ENGINEERING • FOR • OPTICAL ENGINEERING • SOCIETY
Search without synonyms: journal:(PROCEEDINGS - SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING)
Used synonyms:
- industrielle technik
- ingenieurwesen
- ingenieurwissenschaft
- ingenieurwissenschaften
- technik
- technikwissenschaften
- technique
- technische wissenschaften
Used synonyms:
- fur
Used synonyms:
- angewandte optik
- optische technik
- technische optik
Used synonyms:
- gesellschaft
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0.13μm BiCMOS emitter window lithography with KrF scanners [7274-107]
British Library Conference Proceedings | 2009| -
0.15-m pattern formation using cell projection electron-beam direct writing with variable shot size [3048-02]
British Library Conference Proceedings | 1997| -
0.16-μm BCD single-photon avalanche diode with 30-ps timing jitter, high detection efficiency and low noise [10659-13]
British Library Conference Proceedings | 2018 -
0.18 mum CMOS fully differential CTIA for a 32 x 16 ROIC for 3D ladar imaging systems [6294-10]
British Library Conference Proceedings | 2006| -
0.18μm CMOS inductorless AGC amplifier with 50dB input dynamic range for 10GBase-LX4 ethernet [7363-28]
British Library Conference Proceedings | 2009| -
0.18-m gate length CMOS devices with N + polycide gate for 2.5-V application [3212-25]
British Library Conference Proceedings | 1997| -
0.18-m lithography strategies: 248-nm DUV step-and-scanner and advanced chemical amplified resist [3679-100]
British Library Conference Proceedings | 1999| -
0.18-m optical lithography performances using an alternating DUV phase-shift mask [3334-03]
British Library Conference Proceedings | 1998| -
0.18-m technology at contact level: deep-UV process development by tuning NA/O and using a bottom antireflective coating [3679-105]
British Library Conference Proceedings | 1999| -
0.25 micrometer lithography using a 50 kV shaped electron-beam vector scan system
Tema Archive | 1995| -
0.25-mum technology arithmetic codec for mobile multimedia communicators [5117-39]
British Library Conference Proceedings | 2003| -
0.25-m lithography development using positive mode top surface imaging photoresist [2195-34]
British Library Conference Proceedings | 1994| -
0.25-m lithography using a 50-kV shaped electron-beam vector scan system [2437-16]
British Library Conference Proceedings | 1995| -
0.25-m logic manufacturability using practical 2D optical proximity correction [3334-19]
British Library Conference Proceedings | 1998| -
0.25-m multilevel interconnect with DUV processing [3051-16]
British Library Conference Proceedings | 1997| -
0.30k1 CH delineation with novel image reversal materials [7273-67]
British Library Conference Proceedings | 2009| -
0.32-mum pitch random line pattern formation by dense dummy pattern and double exposure in KrF wavelength [4000-121]
British Library Conference Proceedings | 2000|
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