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Unveiling the magic of H~2S on the CVD-Al~2O~3 coating. Effect of H~2S on the water gas concentration
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
Simulation and validation of SiO~2 LPCVD from TEOS in a vertical 300 mm multi-wafer reactor
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
Deposition of SrRuO~3 films and SrRuO~3/YBa~2Cu~3O~7 heterostructures by pulsed injection MOCVD
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
Characterization and stressing properties of polysilicon TFTs utilizing oxide films deposited using TEOS
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
A systematic study of MOCVD grown InP/InGaAlAs heterojunction bipolar transistors with anomalous switching behavior
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
High-performance In~0~.~4~9Ga~0~.~5~1P/InGaAs single and double delta-doped pseudomorphic high electron mobility transistors (delta-PHEMT's)
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
Fiber-coatings for fiber-reinforced mullite/mullite composites
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
Effects of plasma power and deposition pressure on the properties of the low dielectric constant plasma polymerized cyclohexane thin films deposited by plasma enhanced chemical vapor deposition
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
Plasma enhanced decomposition of propylene on activated carbon fibers
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
Photon assisted CVD
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
Remote hydrogen plasma chemical vapor deposition from alkylsilane and alkylcarbosilane single-sources: Mechanism of the process and properties of resulting silicon-carbon deposits
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
Volatility studies on single source precursors for LaNiO~3 film deposition: Mass spectrometry and thermal analysis
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
MOCVD of rhenium-containing complex oxides with the new thd-precursor
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
Carbon nanotubes by CVD and applications
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
Photodegradative properties of TiO~2 films prepared by MOCVD
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
Low pressure chemical vapor deposition of silicon oxynitride films using tetraethylorthosilicate, dichlorosilane and ammonia mixtures
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
Kinetics of the initial stages of film formation during low pressure chemical vapour deposition of polysilicon by pyrolysis of silane
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
Elementary steps and application of the CVD of SiC/BN double layers
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
A study of morphology and texture of LPCVD germanium-silicon films
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition -
Thermodynamic, kinetic and mass transport calculations, as the basis for materials processing by CVD
British Library Conference Proceedings | 2001|Keywords: chemical vapour deposition
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