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Process characteristics of an all‐organic chemically amplified deep‐ultraviolet resist
American Institute of Physics | 1991| -
PTBSS: A high resolution single component aqueous base soluble chemically amplified resist
American Institute of Physics | 1991| -
Simulation analysis of a chemically amplified positive resist for KrF lithography
Tema Archive | 1994| -
A unified approach to resist materials design for the advanced lithographic technologies
Tema Archive | 1994| -
Lithographic evaluation of a positive‐acting chemically amplified resist system under conventional and projection electron‐beam exposures
American Institute of Physics | 1995|
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