Lithographic evaluation of a positive‐acting chemically amplified resist system under conventional and projection electron‐beam exposures (English)
- New search for: Tarascon, R. G.
- New search for: Novembre, A. E.
- New search for: Bolan, K.
- New search for: Blakey, M.
- New search for: Knurek, C.
- New search for: Fetter, L.
- New search for: Huggins, H. A.
- New search for: Liddle, J. A.
- New search for: Nalamasu, O.
- New search for: Tarascon, R. G.
- New search for: Novembre, A. E.
- New search for: Bolan, K.
- New search for: Blakey, M.
- New search for: Knurek, C.
- New search for: Fetter, L.
- New search for: Huggins, H. A.
- New search for: Liddle, J. A.
- New search for: Nalamasu, O.
In:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
;
13
, 6
;
2975-2979
;
1995
- Article (Journal) / Electronic Resource
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Title:Lithographic evaluation of a positive‐acting chemically amplified resist system under conventional and projection electron‐beam exposures
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Additional title:Lithographic evaluation of a positive acting chemically amplified resist system
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Contributors:Tarascon, R. G. ( author ) / Novembre, A. E. ( author ) / Bolan, K. ( author ) / Blakey, M. ( author ) / Knurek, C. ( author ) / Fetter, L. ( author ) / Huggins, H. A. ( author ) / Liddle, J. A. ( author ) / Nalamasu, O. ( author )
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Published in:
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Publisher:
- New search for: American Vacuum Society
-
Publication date:1995-11-01
-
Size:5 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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Source:
Table of contents – Volume 13, Issue 6
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 2153
-
Surface investigations by scanning thermal microscopyStopka, M. / Hadjiiski, L. / Oesterschulze, E. / Kassing, R. et al. | 1995
- 2157
-
Synthesis and atomic force microscopy characterization of GeFe nanophase materialsEastman, Timothy / Shi, Jing / Zhu, Da‐Ming et al. | 1995
- 2160
-
Scanning tunneling microscopy investigation of Co cluster growth and induced surface morphology changes on highly oriented pyrolitic graphiteXu, H. / Ng, K. Y. S. et al. | 1995
- 2166
-
Fabrication of thickness‐controlled silicon nanowires and their characteristicsNamatsu, Hideo / Takahashi, Yasuo / Nagase, Masao / Murase, Katsumi et al. | 1995
- 2170
-
Si nanostructures fabricated by electron beam lithography combined with image reversal process using electron cyclotron resonance plasma oxidationKurihara, K. / Iwadate, K. / Namatsu, H. / Nagase, M. / Murase, K. et al. | 1995
- 2175
-
New microfabrication technique on a submicrometer scale by synchrotron radiation‐excited etchingTerakado, Shingo / Goto, Takashi / Ogura, Masayoshi / Kaneda, Kazuhiro / Kitamura, Osamu / Suzuki, Shigeo / Nakao, Masao / Tanaka, Kenichiro et al. | 1995
- 2179
-
Dry development of photosensitive polyimides for high resolution and aspect ratio applicationsMuñoz, J. / Domínguez, C. et al. | 1995
- 2184
-
Feasibility study of photocathode electron projection lithographySaville, Gordon F. / Platzman, P. M. / Brandes, George / Ruel, Rene / Willett, Robert L. et al. | 1995
- 2189
-
Ion beam modification and patterning of organosilane self‐assembled monolayersAda, Earl T. / Hanley, Luke / Etchin, Sergei / Melngailis, John / Dressick, Walter J. / Chen, Mu‐San / Calvert, Jeffrey M. et al. | 1995
- 2197
-
Observation of sidewall contamination in submicron contact holes by thermal desorption spectroscopyTeraoka, Yuden / Aoki, Hidemitsu / Ikawa, Eiji / Kikkawa, Takamaro / Nishiyama, Iwao et al. | 1995
- 2201
-
Reducing electron energy dispersion of nonformed metal–insulator–metal electron emitters using the near‐threshold drive methodSuzuki, Mutsumi / Kusunoki, Toshiaki / Shinada, Hiroyuki / Yaguchi, Tomio et al. | 1995
- 2206
-
Thermomechanical analysis of failure of metal field emittersAncona, M. G. et al. | 1995
- 2215
-
Mechanisms of copper removal during chemical mechanical polishingSteigerwald, J. M. / Murarka, S. P. / Ho, J. / Gutmann, R. J. / Duquette, D. J. et al. | 1995
- 2219
-
Charges and defects in SiO2/Si systems after exposure to microwave plasmasChau, T. T. / Chan, K. W. / Kao, K. C. et al. | 1995
- 2226
-
Gate oxide loss at the periphery of a metal–oxide–semiconductor field‐effect transistor resulting from a polysilicon gate etch with a helicon etch toolKraft, R. / Krishnan, S. et al. | 1995
- 2230
-
Analysis and Monte Carlo simulations of spontaneous etching: Cl–Si(100)‐2×1Sánchez, J. R. / Aldao, C. M. / Weaver, J. H. et al. | 1995
- 2234
-
Si1−xGex pulsed plasma etching using CHF3 and H2Paul, D. J. / Law, V. J. / Jones, G. A. C. et al. | 1995
- 2238
-
Surface preparation of ZnSe by chemical methodsLiu, Lu‐Min / Lindauer, Greg / Alexander, W. Brock / Holloway, Paul H. et al. | 1995
- 2245
-
Influence of in situ argon cleaning of GaAs on Schottky diodes and metal–semiconductor field‐effect transistorsvan Hassel, J. G. / Heyker, H. C. / Kwaspen, J. J. M. et al. | 1995
- 2250
-
Etching temperature dependence of the surface composition and reconstruction for Cl2‐etched GaAs layersTanaka, N. / López, M. / Matsuyama, I. / Ishikawa, T. et al. | 1995
- 2255
-
Spectroscopic ellipsometric monitoring of electron cyclotron resonance plasma etching of GaAs and AlGaAsSnyder, P. G. / Ianno, N. J. / Wigert, B. / Pittal, S. / Johs, B. / Woollam, J. A. et al. | 1995
- 2260
-
Effects of glancing‐angle ion bombardment on GaAs(001)Labanda, J. G. C. / Barnett, S. A. / Hultman, L. et al. | 1995
- 2269
-
Flux masking and thickness uniformity in molecular beam epitaxySadra, K. / Lin, Chih‐Hsiang / Meese, J. M. et al. | 1995
- 2276
-
Thermal stability of AlGaAs/GaAs single quantum well structures using photoreflectanceHughes, P. J. / Li, E. H. / Weiss, B. L. et al. | 1995
- 2284
-
Photoluminescence of quantum dots fabricated using tungsten stressorsYater, J. A. / Plaut, A. S. / Kash, K. / Lin, P. S. D. / Florez, Leigh T. / Harbison, James P. / Das, S. R. / Lebrun, L. et al. | 1995
- 2289
-
Metal–In80Al20Sb interface formation: An x‐ray photoelectron spectroscopy studyClark, S. A. / Wilks, S. P. / Williams, R. H. / Johnson, A. D. / Whitehouse, C. R. et al. | 1995
- 2293
-
Implant isolation of InxAl1−xN and InxGa1−xNVartuli, C. B. / Pearton, S. J. / Abernathy, C. R. / MacKenzie, J. D. / Zolper, J. C. et al. | 1995
- 2297
-
Ohmic contacts on p‐In0.53Ga0.47As prepared by Zn implantation into Pd‐based metallizationsRessel, P. / Strusny, H. / Vogel, K. / Würfl, J. / Fritzsche, D. / Kräutle, H. / Kuphal, E. / Mause, K. / Trapp, M. / Richter, U. et al. | 1995
- 2323
-
100 years of x rays: Impact on micro‐ and nanofabricationSmith, Henry I. et al. | 1995
- 2329
-
Process and device technologies for 1 Gbit dynamic random‐access memory cellsKaga, Toru / Ohkura, Makoto / Murai, Fumio / Yokoyama, Natsuki / Takeda, Eiji et al. | 1995
- 2335
-
Toward accurate metrology with scanning force microscopesMartin, Yves / Wickramasinghe, H. Kumar et al. | 1995
- 2340
-
Excimer laser assisted etching of AlGaAs and GaAsTakatani, Shinichiro / Yamamoto, Seiji / Takazawa, Hiroyuki / Mochiji, Kozo et al. | 1995
- 2344
-
Selective reactive ion etching of InGaAs and InP over InAlAs in SiCl4/SiF4/HBr plasmasMurad, S. K. / Beaumont, S. P. / Holland, M. / Wilkinson, C. D. W. et al. | 1995
- 2350
-
Atomic force microscopy study of III–V materials etched using an electron cyclotron resonance sourceThomas, S. / Pang, S. W. et al. | 1995
- 2355
-
Diffusion and channeling of low‐energy ions: The mechanism of ion damageChen, Ching‐Hui / Green, Debora L. / Hu, Evelyn L. et al. | 1995
- 2360
-
A comparative study of Cl2 and HCl gases for the chemically assisted ion beam etching of InPYoutsey, C. / Adesida, I. et al. | 1995
- 2366
-
Plasma development of a silylated bilayer resist: Effects of etch chemistry on critical dimension control and feature profilesHutton, Richard S. / Boyce, Craig H. / Taylor, Gary N. et al. | 1995
- 2372
-
Fabrication of ultrasmall magnets by electroplatingXu, W. / Wong, J. / Cheng, C. C. / Johnson, R. / Scherer, A. et al. | 1995
- 2376
-
Plasma passivation of etch‐induced surface damage on GaAsKo, K. K. / Pang, S. W. et al. | 1995
- 2381
-
Analysis of InP etched surfaces using metalorganic chemical vapor deposition regrown quantum well structuresYu, D. G. / Keller, B. P. / Holmes, A. L. / Hu, E. L. / DenBaars, S. P. et al. | 1995
- 2386
-
Atomic force microscopy investigations of dry etched gate recesses for InGaAs/InAlAs‐based high‐electron‐mobility transistors using methane–hydrogen reactive ion etchingDuran, Halit C. / Patrick, William / Bächtold, Werner et al. | 1995
- 2390
-
Reactive ion etching lag on high rate oxide etching using high density plasmaAkimoto, Takeshi / Nanbu, Hidetaka / Ikawa, Eiji et al. | 1995
- 2394
-
Reactive ion etching for microelectrical mechanical system fabricationRangelow, Ivaylo W. / Löschner, Hans et al. | 1995
- 2400
-
Fabrication and characterization of platinum nanocrystalline material grown by electron‐beam induced depositionKoops, H. W. P. / Kaya, A. / Weber, M. et al. | 1995
- 2404
-
Space charge effects in projection charged particle lithography systemsHarriott, L. R. / Berger, S. D. / Liddle, J. A. / Watson, G. P. / Mkrtchyan, M. M. et al. | 1995
- 2409
-
Global and stochastic space‐charge effects in ion beam lithographyPetillo, John J. / Mondelli, Alfred A. et al. | 1995
- 2414
-
Study of space‐charge devices for focused ion beam systemsWang, Li / Orloff, Jon / Tang, Tiantong et al. | 1995
- 2419
-
Coulomb effect in cell projection lithographySohda, Yasunari / Someda, Yasuhiro / Saitou, Norio / Itoh, Hiroyuki et al. | 1995
- 2424
-
Magnetic funnels for projection electron lithographySaville, Gordon F. / Platzman, P. M. / Ku, Long‐Poe et al. | 1995
- 2428
-
In‐line holography using low‐energy electrons and photons: Applications for manipulation on a nanometer scaleSchmid, Heinz / Fink, Hans‐Werner / Kreuzer, Jürgen et al. | 1995
- 2432
-
Micromachined field emission cathode with an integrated heaterDas, John H. / MacDonald, Noel C. et al. | 1995
- 2436
-
Improved emission stability of carburized HfC〈100〉 and ultrasharp tungsten field emittersYu, Ming L. / Hussey, Brian W. / Kratschmer, Ernst / Chang, T. H. Philip / Mackie, William A. et al. | 1995
- 2441
-
Field emission properties of self‐shielded tungsten sourcesLo, W. K. / Skvarla, M. / Lo, C. W. / Craighead, H. G. / Isaacson, M. S. et al. | 1995
- 2445
-
Lens and deflector design for microcolumnsThomson, M. G. R. / Chang, T. H. P. et al. | 1995
- 2450
-
Beam position stabilization by suppression of electrons reentering the electron‐beam columnKato, Junichi / Morita, Hirofumi / Saito, Kenichi / Shimazu, Nobuo et al. | 1995
- 2455
-
Compression of field‐emission angular distribution using a cathode shieldThomson, M. G. R. et al. | 1995
- 2459
-
Field emission from carbide film cathodesMackie, W. A. / Xie, Tianbao / Davis, P. R. et al. | 1995
- 2464
-
Design of a high voltage electron gun for lithography applicationsPetric, Paul F. et al. | 1995
- 2468
-
Miniature Schottky electron sourceKim, H. S. / Yu, M. L. / Kratschmer, E. / Hussey, B. W. / Thomson, M. G. R. / Chang, T. H. P. et al. | 1995
- 2473
-
Resolution analysis in electron‐beam cell projection lithography systemYamashita, Hiroshi / Tokunaga, Kenichi / Kojima, Yoshikatu / Nozue, Hiroshi / Nomura, Eiichi et al. | 1995
- 2478
-
Performance enhancements on IBM’s EL‐4 electron‐beam lithography systemButsch, R. / Enichen, W. A. / Gordon, M. S. / Groves, T. R. / Hartley, J. G. / Pavick, J. W. / Pfeiffer, H. C. / Quickle, R. J. / Rockrohr, J. D. / Stickel, W. et al. | 1995
- 2483
-
Error budget analysis of the SCALPEL(R) mask for sub‐0.2 μm lithographyLiddle, J. Alexander / Huggins, Harold A. / Watson, G. Patrick et al. | 1995
- 2488
-
Experimental evaluation of an electron‐beam pulse modulated blanker (160 MHz) for next‐generation electron‐beam raster scan systemsMuray, Andrew / Colby, Dave / Teitzel, Robin / Gesley, Mark et al. | 1995
- 2493
-
Patterning accuracy improvement of the electron beam direct writing system EX‐8DYoshikawa, R. / Hattori, K. / Wada, H. / Magoshi, S. / Sunaoshi, H. / Ando, A. / Yamaguchi, T. / Mikami, S. / Nishimura, S. / Housai, H. et al. | 1995
- 2498
-
An electron‐beam microcolumn with improved resolution, beam current, and stabilityKratschmer, E. / Kim, H. S. / Thomson, M. G. R. / Lee, K. Y. / Rishton, S. A. / Yu, M. L. / Chang, T. H. P. et al. | 1995
- 2504
-
A background dose proximity effect correction technique for scattering with angular limitation projection electron lithography implemented in hardwareWatson, G. Patrick / Berger, Steven D. / Liddle, J. Alexander / Waskiewicz, Warren K. et al. | 1995
- 2508
-
Enhancing a hierarchical, parallel electron beam data conversion processor toward 1 Gbit memory lithographyKoyama, K. / Watanabe, S. / Saito, T. / Hara, S. / Murakami, E. / Magoshi, S. / Yano, K. / Suzuki, H. / Kabeya, A. / Ohki, S. et al. | 1995
- 2514
-
Nanobeam process system: An ultrahigh vacuum electron beam lithography system with 3 nm probe sizeHiroshima, H. / Okayama, S. / Ogura, M. / Komuro, M. / Nakazawa, H. / Nakagawa, Y. / Ohi, K. / Tanaka, K. et al. | 1995
- 2518
-
Proximity correction algorithms and a co‐processor based on regularized optimization. I. Description of the algorithmPeckerar, M. C. / Chang, S. / Marrian, C. R. K. et al. | 1995
- 2526
-
Three‐dimensional design in electron‐beam lithographyAristov, V. V. / Dubonos, S. V. / Dyachenko, R. Ya. / Gaifullin, B. N. / Matveev, V. N. / Raith, H. / Svintsov, A. A. / Zaitsev, S. I. et al. | 1995
- 2529
-
Electron beam lithography digital pattern generator and electronics for generalized curvilinear structuresAnderson, Erik H. / Boegli, Volker / Muray, Lawrence P. et al. | 1995
- 2535
-
Precise measurement of the effective backscatter coefficient for 100‐keV electron‐beam lithography on SiWatson, G. Patrick / Berger, Steven D. / Liddle, J. Alex / Fetter, Linus A. / Farrow, Reginald C. / Tarascon, Regine G. / Mkrtchyan, Masis / Novembre, Anthony E. / Blakey, Myrtle I. / Bolan, Kevin J. et al. | 1995
- 2539
-
In search of high‐performance resists for 50 kV shaped‐beam exposureTan, Z. C. H. / Stivers, T. / Lem, H. / DiGiacomo, N. / Wood, D. et al. | 1995
- 2545
-
The effects of electron‐ and ion‐beam irradiation on the mechanical response of silicon microresonatorsMihailovich, R. E. / MacDonald, N. C. et al. | 1995
- 2550
-
Dose contribution of heating in electron‐beam lithographySvintsov, A. A. / Zaitsev, S. I. et al. | 1995
- 2553
-
Low‐energy electron detection in microcolumnsFresser, H. S. / Prins, F. E. / Kern, D. P. et al. | 1995
- 2556
-
Characterization of a GaAs metal–semiconductor–metal low‐energy electron detectorZolgharnain, S. / Lee, K. Y. / Rishton, S. A. / Kisker, D. / Chang, T. H. P. et al. | 1995
- 2561
-
Damage characterization of ion beam exposed metal–oxide–semiconductor varactor cells by charge to breakdown measurementsBrünger, W. H. / Buchmann, L.‐M. / Naumann, F. / Friedrich, D. / Finkelstein, W. / Mohondro, R. et al. | 1995
- 2565
-
H2O enhanced focused ion beam micromachiningStark, T. J. / Shedd, G. M. / Vitarelli, J. / Griffis, D. P. / Russell, P. E. et al. | 1995
- 2570
-
Review of focused ion beam implantation mixing for the fabrication of GaAs‐based optoelectronic devicesSteckl, A. J. / Chen, P. / Jackson, H. E. / Choo, A. G. / Cao, X. / Boyd, J. T. / Kumar, M. et al. | 1995
- 2576
-
Focused ion beam insulator depositionYoung, Richard J. / Puretz, Joseph et al. | 1995
- 2580
-
Contrast formation in focused ion beam images of polycrystalline aluminumBarr, D. L. / Brown, W. L. et al. | 1995
- 2584
-
Control of temperature gradients and distortion of ion projection lithography masksBirman, Amnon / Levush, Baruch / Melngailis, John / Löschner, Hans / Stengl, Gerhard et al. | 1995
- 2588
-
Reactive ion etching of silicon stencil masks in the presence of an axial magnetic fieldPendharkar, S. V. / Wolfe, J. C. / Rampersad, H. R. / Chau, Y.‐L. / Licon, D. L. / Morgan, Mark D. / Horne, William E. / Tiberio, R. C. / Randall, J. N. et al. | 1995
- 2593
-
Focused ion beam/optical‐merged lithographic technique using ladder silicone spin‐on glassSuzuki, Kohei / Kinoshita, Takashi / Yamashita, Motoji / Kawakami, Nobuyuki / Nakaue, Akimitsu et al. | 1995
- 2597
-
Study of H− beams for ion‐projection lithographyChen, C.‐H. / Guharay, S. K. / Reiser, M. / Riordon, J. / Orloff, J. / Melngailis, J. et al. | 1995
- 2600
-
Multicusp sources for ion beam lithography applicationsLeung, K. N. / Herz, P. / Kunkel, W. B. / Lee, Y. / Perkins, L. / Pickard, D. / Sarstedt, M. / Weber, M. / Williams, M. D. et al. | 1995
- 2603
-
Focused ion‐beam line profiles: A study of some factors affecting beam broadeningTempleton, I. M. / Champion, H. G. et al. | 1995
- 2607
-
A focused ion beam secondary ion mass spectroscopy systemCrow, G. A. / Christman, Locke / Utlaut, M. et al. | 1995
- 2613
-
Distortion analysis of stencil masks with stress‐relief structuresWolfe, John C. / Chalupka, A. / Löschner, H. / Stengl, G. / Vonach, H. / Shimkunas, A. R. / Mauger, P. E. et al. | 1995
- 2618
-
Lithography by accelerated nanoparticle ionsGspann, Jürgen et al. | 1995
- 2621
-
Low‐energy focused ion beam system and direct deposition of Au and SiYanagisawa, Junichi / Kito, Kuniyoshi / Monden, Kentaro / Gamo, Kenji et al. | 1995
- 2625
-
Pattern positioning error of reticle writing induced by reticle clampingHirano, Ryoichi / Matsuki, Kazuto / Yoshitake, Shusuke / Takahashi, Yoshihiko / Tamamushi, Shuichi / Ogawa, Yoji / Tojo, Toru et al. | 1995
- 2629
-
Focused ion beam metrologyWagner, A. / Longo, P. / Cohen, S. / Blauner, P. et al. | 1995
- 2637
-
Pattern width evaluation method for electron‐beam pattern dataWatanabe, Toshifumi / Moriya, Shigeru / Komatsu, Kazuhiko et al. | 1995
- 2642
-
Adaptive metrology: An economical strategy for judging the acceptability of a mask patternWang, Weidong / Ye, Jun / Owen, Art B. / Berglund, Carl N. / Pease, Roger Fabian W. et al. | 1995
- 2648
-
Immunity to signal degradation by overlayers using a novel spatial‐phase‐matching alignment systemMoon, Euclid E. / Everett, Patrick N. / Smith, Henry I. et al. | 1995
- 2653
-
Miniature three‐axis micropositioner for scanning proximal probe and other applicationsKleindiek, S. / Kim, H. S. / Kratschmer, E. / Chang, T. H. P. et al. | 1995
- 2657
-
Effect of multiple reflection of laser beam and pattern displacement on overlay accuracy in synchrotron radiation stepperAraki, K. / Itoh, T. / Koga, K. / Kusumoto, S. / Yasui, J. / Sangawa, U. / Aoki, S. et al. | 1995
- 2660
-
Performance characteristics of a dual focus x‐ray alignment microscopeFeldman, M. / Liu, L. / Phani, S. / Zhang, C. et al. | 1995
- 2665
-
Alignment scheme for through‐the‐lens alignmentZipfel, George / Stanton, Stuart / White, Donald / Vaidya, Sheila / Cirelli, Ray et al. | 1995
- 2671
-
Fabrication issues for the prototype National Institute of Standards and Technology SRM 2090A scanning electron microscope magnification calibration standardNewell, Brian L. / Postek, Michael T. / van der Ziel, Jan P. et al. | 1995
- 2676
-
High accuracy thickness measurements by means of backscattering electron metrologyBaciocchi, M. / Di Fabrizio, E. / Gentili, M. / Grella, L. / Maggiora, R. / Mastrogiacomo, L. / Peschiaroli, D. et al. | 1995
- 2682
-
Effect of electron‐beam parameters on critical‐dimension measurementsMizuno, Fumio / Yamada, Satoru et al. | 1995
- 2688
-
Lithography and fabrication processes for sub‐100 nm scale complementary metal–oxide semiconductorWind, S. J. / Taur, Y. / Lee, Y. H. / Mii, Y. / Viswanathan, R. G. / Bucchignano, J. J. / Pomerene, A. T. / Sicina, R. M. / Milkove, K. R. / Stiebritz, J. W. et al. | 1995
- 2696
-
Fabrication of photonic band‐gap crystalsCheng, C. C. / Scherer, A. et al. | 1995
- 2701
-
Fabrication of integrated micromachined electron gunsHofmann, Wolfgang / Chen, Liang‐Yuh / MacDonald, Noel C. et al. | 1995
- 2705
-
Nanofabrication of subwavelength, binary, high‐efficiency diffractive optical elements in GaAsWendt, J. R. / Vawter, G. A. / Smith, R. E. / Warren, M. E. et al. | 1995
- 2709
-
Fabrication of dry etched mirrors for In0.20Ga0.80As/GaAs waveguides using an electron cyclotron resonance sourceKo, K. K. / Kamath, K. / Zia, O. / Berg, E. / Pang, S. W. / Bhattacharya, P. et al. | 1995
- 2714
-
First‐order gain‐coupled (Ga,In)As/(Al,Ga)As distributed feedback lasers by focused ion beam implantation and in situ overgrowthOrth, Andreas / Reithmaier, Johann Peter / Faller, Frank / Forchel, Alfred et al. | 1995
- 2718
-
Fabrication of sub‐10 nm silicon tips: A new approachHuq, S. E. / Chen, L. / Prewett, P. D. et al. | 1995
- 2722
-
Focused ion beam lithography of multiperiod gratings for a wavelength‐division‐multiplexed transmitter laser arrayTempleton, I. M. / Fallahi, M. / Erickson, L. E. / Chatenoud, F. / Koteles, E. S. / Champion, H. G. / He, J. J. / Barber, R. et al. | 1995
- 2725
-
Novel high‐yield trilayer resist process for 0.1 μm T‐gate fabricationWakita, A. S. / Su, C.‐Y. / Rohdin, H. / Liu, H.‐Y. / Lee, A. / Seeger, J. / Robbins, V. M. et al. | 1995
- 2729
-
Fabrication of diffractive optical elements using a single optical exposure with a gray level maskDäschner, Walter / Long, Pin / Larsson, Michael / Lee, S. H. et al. | 1995
- 2732
-
Achromatic interferometric lithography for 100‐nm‐period gratings and gridsSavas, T. A. / Shah, Satyen N. / Schattenburg, M. L. / Carter, J. M. / Smith, Henry I. et al. | 1995
- 2736
-
Fabrication of high aspect ratio structures for microchannel platesShank, S. M. / Soave, R. J. / Then, A. M. / Tasker, G. W. et al. | 1995
- 2741
-
Combining and matching optical, electron‐beam, and x‐ray lithographies in the fabrication of Si complementary metal–oxide–semiconductor circuits with 0.1 and sub‐0.1 μm featuresYang, Isabel Y. / Silverman, Scott / Ferrera, Juan / Jackson, Keith / Carter, James M. / Antoniadis, Dimitri A. / Smith, Henry I. et al. | 1995
- 2745
-
Coherence of large gratings and electron‐beam fabrication techniques for atom‐wave interferometryRooks, Michael J. / Tiberio, Richard C. / Chapman, Michael / Hammond, Troy / Smith, Edward / Lenef, Alan / Rubenstein, Richard / Pritchard, David / Adams, Scott et al. | 1995
- 2752
-
Fabrication of InP/InGaAs quantum wires by free Cl2Panepucci, R. / Youtsey, C. / Turnbull, D. A. / Gu, S. Q. / Caneau, C. / Bishop, S. G. / Adesida, I. et al. | 1995
- 2757
-
Sub‐10 nm lithography and development properties of inorganic resist by scanning electron beamsFujita, J. / Watanabe, H. / Ochiai, Y. / Manako, S. / Tsai, J. S. / Matsui, S. et al. | 1995
- 2762
-
Low‐distortion electron‐beam lithography for fabrication of high‐resolution germanium and tantalum zone platesDavid, C. / Kaulich, B. / Medenwaldt, R. / Hettwer, M. / Fay, N. / Diehl, M. / Thieme, J. / Schmahl, G. et al. | 1995
- 2767
-
Variable shaped electron‐beam lithography application to subwavelength and computer generated diffractive optics fabricationBabin, Sergey / Danilov, Victor et al. | 1995
- 2772
-
In situ processing of high‐Tc YBaCuO superconducting devices by focused ion beam micromachining at low temperatureBen Assayag, G. / Gierak, J. / Hamet, J. F. / Prouteau, C. / Flament, S. / Dolabdjian, C. / Gire, F. / Lesquey, E. / Günther, G. / Dubuc, C. et al. | 1995
- 2777
-
Nanometer‐scale pattern formation of GaAs by in situ electron‐beam lithography using surface oxide layer as a resist filmIshikawa, Tomonori / Tanaka, Nobuyuki / López, Máximo / Matsuyama, Isamu et al. | 1995
- 2781
-
Nanostructuring of gold electrodes for immunosensing applicationsMusil, Christian R. / Jeggle, Daniel / Lehmann, Hans W. / Scandella, Loris / Gobrecht, Jens / Döbeli, Max et al. | 1995
- 2787
-
Study of large area high density magnetic dot arrays fabricated using synchrotron radiation based x‐ray lithographyRousseaux, F. / Decanini, D. / Carcenac, F. / Cambril, E. / Ravet, M. F. / Chappert, C. / Bardou, N. / Bartenlian, B. / Veillet, P. et al. | 1995
- 2792
-
Fabrication of CdZnSe/ZnSe quantum dots and quantum wires by electron beam lithography and wet chemical etchingIlling, M. / Bacher, G. / Kümmell, T. / Forchel, A. / Hommel, D. / Jobst, B. / Landwehr, G. et al. | 1995
- 2797
-
Resist planarization over topography using ion implantationWong, Vincent V. / Yasaka, Anto / Smith, Henry I. et al. | 1995
- 2801
-
Fabrication of silicon nanostructures with a poly(methylmethacrylate) single‐layer processTada, Tetsuya / Kanayama, Toshihiko et al. | 1995
- 2805
-
Mechanisms of surface anodization produced by scanning probe microscopesGordon, A. E. / Fayfield, R. T. / Litfin, D. D. / Higman, T. K. et al. | 1995
- 2809
-
Cross‐linked polymers for nanofabrication of high‐resolution zone plates in nickel and germaniumSchneider, G. / Schliebe, T. / Aschoff, H. et al. | 1995
- 2813
-
Fabrication of nanostructures using scanning probe microscopesHosaka, S. / Hosoki, S. / Hasegawa, T. / Koyanagi, H. / Shintani, T. / Miyamoto, M. et al. | 1995
- 2819
-
Direct observation of a vacuum tunnel gap in a tunneling microscope using a transmission electron microscopeLutwyche, M. I. / Wada, Y. et al. | 1995
- 2823
-
Nanolithography using a laser focused neutral atom beamNatarajan, Vasant / Behringer, R. E. / Tennant, D. M. / Timp, G. et al. | 1995
- 2828
-
Atomic manipulation for patterning ultrathin filmsSalling, C. T. / Kravchenko, I. I. / Lagally, M. G. et al. | 1995
- 2832
-
Nanometer‐scale recording, erasing, and reproducing using scanning tunneling microscopySato, Akinobu / Momose, Satoru / Tsukamoto, Yuji et al. | 1995
- 2837
-
Ambient scanning tunneling lithography of Langmuir–Blodgett and self‐assembled monolayersXu, L. S. / Allee, D. R. et al. | 1995
- 2841
-
Spectroscopic characterization of self‐assembled organosilane monolayer filmsPerkins, F. Keith / Dobisz, Elizabeth A. / Marrian, Christie R. K. / Brandow, Susan L. et al. | 1995
- 2846
-
Nanostructuring of alkanethiols with ultrasharp field emittersMüller, H. U. / David, C. / Völkel, B. / Grunze, M. et al. | 1995
- 2850
-
Fabrication of planar quantum magnetic disk structure using electron beam lithography, reactive ion etching, and chemical mechanical polishingKrauss, Peter R. / Chou, Stephen Y. et al. | 1995
- 2853
-
Ultrahigh resolution chirped distributed feedback gratings fabricated by electron‐beam lithography using bent waveguides for low‐cost photonic componentsHillmer, H. / Burkhard, H. / Seebald, E. / Kiesel, K. et al. | 1995
- 2859
-
Distributed Bragg grating integrated‐optical filters: Synthesis and fabricationWong, V. V. / Ferrera, J. / Damask, J. N. / Murphy, T. E. / Smith, Henry I. / Haus, H. A. et al. | 1995
- 2865
-
Single electron and hole quantum dot transistors operating above 110 KLeobandung, Effendi / Guo, Lingjie / Wang, Yun / Chou, Stephen Y. et al. | 1995
- 2869
-
Fabrication of microstructures for studies of electromigration in sub‐0.25 μm metal interconnectionsLee, K. Y. / Hu, C.‐K. / Shaw, T. / Kuan, T. S. et al. | 1995
- 2875
-
Fabrication of nanostructures with submicron Schottky and ohmic contactsFeng, Y. / Sachrajda, A. S. / Coleridge, P. T. / Taylor, R. P. / Davies, M. / Marshall, P. et al. | 1995
- 2879
-
Fabrication and properties of visible‐light subwavelength amorphous silicon transmission gratingsDeng, Wenyong / Chou, Stephen Y. et al. | 1995
- 2883
-
Fabrication and physics of 2 nm islands for single electron devicesChen, Wei / Ahmed, Haroon et al. | 1995
- 2888
-
InGaAs/GaAs quantum wires and dots defined by low‐voltage electron‐beam lithographySteffen, R. / Oshinowo, J. / Koch, T. / Forchel, A. et al. | 1995
- 2892
-
Technology for high‐performance n‐channel SiGe modulation‐doped field‐effect transistorsKuznetsov, V. I. / Veen, R. v. / van der Drift, E. / Werner, K. / Verbruggen, A. H. / Radelaar, S. et al. | 1995
- 2897
-
Effects of resist thickness and thin‐film interference in I‐line and deep ultraviolet optical lithographyXiao, Jiabei / Garofalo, Joseph / Cirelli, Raymond / Vaidya, Sheila et al. | 1995
- 2904
-
Field distortion characterization using linewidth or pitch measurementYe, Jun / Berglund, C. N. / Pease, R. F. W. / Owen, G. / Jaeger, Rolf / Alexander, Katie / Seeger, Judith et al. | 1995
- 2909
-
Intrafield linewidth variances in 0.25 μm i‐line lithographyLiu, Hua‐Yu / Yu, Crid / Gleason, Bob et al. | 1995
- 2914
-
Illumination system for extreme ultraviolet lithographyHaga, Tsuneyuki / Kinoshita, Hiroo et al. | 1995
- 2919
-
Phase‐measuring interferometry using extreme ultraviolet radiationBjorkholm, J. E. / MacDowell, A. A. / Wood, O. R. / Tan, Z. / LaFontaine, B. / Tennant, D. M. et al. | 1995
- 2923
-
Progress towards λ/20 extreme ultraviolet interferometryGoldberg, K. A. / Beguiristain, R. / Bokor, J. / Medecki, H. / Attwood, D. T. / Jackson, K. / Tejnil, E. / Sommargren, G. E. et al. | 1995
- 2928
-
Effect of thin film interference on process latitude in deep ultraviolet lithographyAzuma, T. / Sato, T. / Aochi, H. et al. | 1995
- 2934
-
Application of ultraviolet depth lithography for surface micromachiningLoechel, Bernd / Maciossek, Andreas / Rothe, Martina et al. | 1995
- 2940
-
Fabrication of a variable diffraction efficiency phase mask by multiple dose ion implantationErickson, L. E. / Champion, H. G. / Albert, J. / Hill, K. O. / Malo, B. / Thériault, S. / Bilodeau, F. / Johnson, D. C. et al. | 1995
- 2944
-
Role of etch pattern fidelity in the printing of optical proximity corrected photomasksKornblit, A. / DeMarco, J. J. / Garofalo, J. / Mixon, D. A. / Novembre, A. E. / Vaidya, S. / Kook, T. et al. | 1995
- 2949
-
Lithographic evaluation of the hydrogenated amorphous carbon filmMartino, R. / Ferguson, R. / Molless, A. / Liebmann, L. / Neisser, M. / Weed, J. / Callegari, S. et al. | 1995
- 2954
-
Asymmetric overhung resist profile fabricated by optical lithographyJinbo, Hideyuki / Ito, Toshio / Yamashita, Yoshio et al. | 1995
- 2957
-
Reaction‐diffusion modeling and simulations in positive deep ultraviolet resistsZuniga, M. / Neureuther, A. R. et al. | 1995
- 2963
-
Novel postexposure bake simulator: First resultsCapodieci, Luigi / Krasnoperova, Azalia / Cerrina, Franco / Lyons, Chris / Spence, Chris / Early, Kathy et al. | 1995
- 2968
-
A diazoquinone positive photoresist for x‐ray lithographyAviram, Ari / Bucca, Daniel / Seeger, David et al. | 1995
- 2972
-
Highly sensitive positive resist based on vinyl ether chemistryTaguchi, T. / Yamashita, Y. / Suzuki, T. / Yamaoka, T. et al. | 1995
- 2975
-
Lithographic evaluation of a positive‐acting chemically amplified resist system under conventional and projection electron‐beam exposuresTarascon, R. G. / Novembre, A. E. / Bolan, K. / Blakey, M. / Knurek, C. / Fetter, L. / Huggins, H. A. / Liddle, J. A. / Nalamasu, O. et al. | 1995
- 2980
-
Studies of 1 and 2 keV electron beam lithography using silicon containing P(SI–CMS) resistLo, C. W. / Lo, W. K. / Rooks, M. J. / Isaacson, M. / Craighead, H. G. / Novembre, A. E. et al. | 1995
- 2986
-
Use of positive and negative chemically amplified resists in electron‐beam direct‐write lithographyTritchkov, Alexander / Jonckheere, Rik / Van den hove, Luc et al. | 1995
- 2994
-
Application of plasma polymerized methylsilane resist for all‐dry 193 nm deep ultraviolet processingKostelak, R. L. / Weidman, T. W. / Vaidya, S. / Joubert, O. / Palmateer, S. C. / Hibbs, M. et al. | 1995
- 3000
-
Thick film positive photoresist: Development and resolution enhancement techniqueMcKean, Dennis R. / Russell, Thomas P. / Hinsberg, William D. / Hofer, Don / Renaldo, Alfred F. / Willson, C. Grant et al. | 1995
- 3007
-
Optically matched trilevel resist process for nanostructure fabricationSchattenburg, M. L. / Aucoin, R. J. / Fleming, R. C. et al. | 1995
- 3012
-
Micromachining applications of a high resolution ultrathick photoresistLee, K. Y. / LaBianca, N. / Rishton, S. A. / Zolgharnain, S. / Gelorme, J. D. / Shaw, J. / Chang, T. H.‐P. et al. | 1995
- 3017
-
Profile control in dry development of high‐aspect‐ratio resist structuresStern, M. B. / Palmateer, S. C. / Horn, M. W. / Rothschild, M. / Maxwell, B. E. / Curtin, J. E. et al. | 1995
- 3022
-
Reaction modeling of chemically amplified resists for ArF excimer laser lithographyOhfuji, T. / Nakano, K. / Maeda, K. / Hasegawa, E. et al. | 1995
- 3026
-
Photoacid bulkiness effect on dissolution kinetics in chemically amplified deep ultraviolet resistsItani, Toshiro / Yoshino, Hiroshi / Fujimoto, Masashi / Kasama, Kunihiko et al. | 1995
- 3030
-
An advanced epoxy novolac resist for fast high‐resolution electron‐beam lithographyArgitis, P. / Raptis, I. / Aidinis, C. J. / Glezos, N. / Baciocchi, M. / Everett, J. / Hatzakis, M. et al. | 1995
- 3035
-
A study of the effect of ultrasonic agitation during development of poly(methylmethacrylate) for ultrahigh resolution electron‐beam lithographyRyan, J. M. / Hoole, A. C. F. / Broers, A. N. et al. | 1995
- 3040
-
Fabrication of 0.2 μm large scale integrated circuits using synchrotron radiation x‐ray lithographyDeguchi, K. / Miyoshi, K. / Ban, H. / Matsuda, T. / Ohno, T. / Kado, Y. et al. | 1995
- 3046
-
The effect of aperturing on radiation damage‐induced pattern distortion of x‐ray masksResnick, D. J. / Cummings, K. D. / Dauksher, W. J. / Johnson, W. A. / Seese, P. A. / Chen, H. T. H. / Wells, G. M. / Engelstad, R. / Cerrina, F. et al. | 1995
- 3050
-
Thermal analysis of an x‐ray mask membrane in a plasma environmentLaudon, M. F. / Thole, K. A. / Engelstad, R. L. / Resnick, D. J. / Cummings, K. D. / Dauksher, W. J. et al. | 1995
- 3055
-
Evaluation of a diamond‐based x‐ray mask for high resolution x‐ray proximity lithographyRavet, M. F. / Rousseaux, F. / Chen, Y. / Haghiri‐Gosnet, A. M. / Carcenac, F. / Decanini, D. / Bourneix, J. / Launois, H. / Bachmann, P. K. / Lade, H. et al. | 1995
- 3061
-
A novel technique for high aspect ratio high resolution patterning of membranesKrasnoperova, Azalia A. / Chen, Zheng / DiFabrizio, Enzo / Gentili, Massimo / Cerrina, Franco et al. | 1995
- 3066
-
Fabrication of sub‐30 nm masks for x‐ray nanolithographyHaghiri‐Gosnet, A. M. / Vieu, C. / Simon, G. / Carcenac, F. / Madouri, A. / Chen, Y. / Rousseaux, F. / Launois, H. et al. | 1995
- 3070
-
High resolution x‐ray mask repairBlauner, Patricia G. et al. | 1995
- 3075
-
Radiation damage‐induced changes in silicon nitride membrane mechanical propertiesWells, G. M. / Chen, H. T. H. / Wallace, J. P. / Engelstad, R. L. / Cerrina, F. et al. | 1995
- 3078
-
Processing control for 0.25 μm x‐ray exposures of commercially available resists: The potential for adaptive controlTaylor, James W. / Gamsky, Chris / Rhyner, Steve / Howes, Glenn / Dentinger, Paul / Nelson, Carla / Yang, Cheng / Reilly, Michael et al. | 1995
- 3082
-
Printability of substrate and absorber defects on extreme ultraviolet lithographic masksNguyen, K. B. / Ray‐Chaudhuri, A. K. / Stulen, R. H. / Krenz, K. / Fetter, L. A. / Tennant, D. M. / Windt, D. L. et al. | 1995
- 3089
-
Alignment of a multilayer‐coated imaging system using extreme ultraviolet Foucault and Ronchi interferometric testingRay‐Chaudhuri, A. K. / Ng, W. / Cerrina, F. / Tan, Z. / Bjorkholm, J. / Tennant, D. / Spector, S. J. et al. | 1995
- 3094
-
Effect of absorber thickness on image shortening in x‐ray lithographyMaldonado, J. R. / DellaGuardia, R. / Hector, S. / McCord, M. / Liebmann, L. / Oertel, H. K. et al. | 1995
- 3099
-
High synchrotron radiation durability microwave plasma chemical vapor deposition diamond x‐ray mask membraneTsuboi, Shinji / Okuyama, Hiroshi / Ashikaga, Kinya / Yamashita, Yoshio et al. | 1995
- 3103
-
Method for fabricating a low stress x‐ray mask using annealable amorphous refractory compoundsDauksher, W. J. / Resnick, D. J. / Cummings, K. D. / Baker, J. / Gregory, R. B. / Theodore, N. D. / Chan, J. A. / Johnson, W. A. / Mogab, C. J. / Nicolet, M.‐A. et al. | 1995
- 3109
-
X‐ray exposure system for induced chemistry and dry processes in microlithographyVladimirsky, Y. / Morris, K. / Klopf, J. M. / Vladimirsky, O. / Saile, V. / Scott, J. et al. | 1995