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A New Liquid Precursor with Improved Thermal Stability for Chemical Vapor Deposition of Copper
Online Contents | 1998| -
A New Liquid Precursor with Improved Thermal Stability for Chemical Vapor Deposition of Copper
British Library Online Contents | 1998| -
Cytochrome P450 enzyme RosC catalyzes a multistep oxidation reaction to form the non-active compound 20-carboxyrosamicin
British Library Online Contents | 2017| -
Effect of Tension and Crash on Reduction in Wire Diameter during Wire Drawing with Two Concave Rolls
British Library Online Contents | 2009| -
Chemical Vapor Deposition of Copper Using A New Liquid Precursor With Improved Thermal Stability
British Library Conference Proceedings | 1998| -
Effect of Temperature on Joining of 1050Aluminum and Holed Rib by Extrusion
British Library Conference Proceedings | 2008| -
Joining of 1050 aluminum circular tube and holed rib by extrusion
British Library Online Contents | 2008| -
Molecular routes to cobalt arsenide and cobalt phosphide thin films. Comparison of a two-source and a single-source chemical vapour deposition
British Library Conference Proceedings | 1994| -
Molecular routes to cobalt arsenide and cobalt phosphide thin films. Comparison of a two-source and a single-source chemical vapour deposition
British Library Online Contents | 1994| -
A Novel Atomic Layer Deposition Process to Deposit Hafnium Silicate Thin Films
British Library Conference Proceedings | 2004| -
Joining of 1050 aluminum tube and holed rib by extrusion
British Library Conference Proceedings | 2008| -
An Advanced High-k Transistor Utilizing Metal-Organic Precursors in an ALD Deposition of Hafnium Oxide and Hafnium Silicate With Ozone as Oxidizer
British Library Conference Proceedings | 2004| -
Atomic layer deposition of hafnium oxide and hafnium silicate thin films using liquid precursors and ozone
British Library Online Contents | 2004|
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