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Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing [4343-88]
British Library Conference Proceedings | 2001| -
Lithographic evaluation of a DUV carbon attenuated phase shift mask
Online Contents | 1998|Contributors: Babich, K. -
Optical properties of epitaxial SrHfO3 thin films grown on Si
Online Contents | 2007|Contributors: Babich, K. -
SrHfO3 as gate dielectric for future CMOS technology
Online Contents | 2007|Contributors: Babich, K. -
Design, performance, and calibration of CMS forward calorimeter wedges
Free accessSpringer Verlag | 2007| -
Design, performance, and calibration of CMS forward calorimeter wedges
Free accessOnline Contents | 2007| -
Design, performance, and calibration of the CMS hadron-outer calorimeter
Free accessSpringer Verlag | 2008| -
Design, performance, and calibration of the CMS hadron-outer calorimeter
Free accessOnline Contents | 2008| -
The CMS barrel calorimeter response to particle beams from 2 to 350 GeV/c
Free accessSpringer Verlag | 2009| -
The CMS barrel calorimeter response to particle beams from 2 to 350 GeV/c
Free accessOnline Contents | 2009|
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