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Importance of configurational contributions to the free energy of nanoclusters
Free accessAmerican Institute of Physics | 2013| -
Crystal-trim and its application to investigations on channeling effects during ion implantation
National licenceTaylor & Francis Verlag | 1994| -
Electronic structure and thermoelectric properties of Mo-based dichalcogenide monolayers locally and randomly modified by substitutional atoms
Free accessRoyal Society of Chemistry | 2020| -
Competition between damage buildup and dynamic annealing in ion implantation into Ge
Online Contents | 2006| -
Atomistic simulations on the relationship between solid-phase epitaxial recrystallization and self-diffusion in amorphous silicon
American Institute of Physics | 2022| -
Multiple implantations into Si: Influence of the implantation sequence on ion range profiles
Online Contents | 2005| -
Competing influence of damage buildup and lattice vibrations on ion range profiles in Si
Online Contents | 2003| -
Nanoindentation and nanoscratching of a ferrite/austenite iron bi-crystal: An atomistic study
British Library Online Contents | 2018|
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