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Deposition of Bax Sr1-x TiO3 thin Films by Double RF Hollow Cathode Plasma Jet System
Online Contents | 2008| -
Measurement and modeling of plasma parameters in reactive high-power impulse magnetron sputtering of Ti in Ar/O2 mixtures
American Institute of Physics | 2017| -
BaxSr1 - xTiO3 Thin Films Deposited by RF Hollow Cathode Plasma Jet Technique
Online Contents | 2005| -
Low pressure deposition of LixZnyO thin films by means of RF plasma jet system
Online Contents | 2004| -
Investigation of the RF plasma jet system for deposition of LiCoOx thin films
Online Contents | 2004| -
Barrier-torch discharge plasma source for surface treatment technology at atmospheric pressure
Online Contents | 2002| -
Pulse length dependence of a reactive high power impulse magnetron (HiPIMS) discharge
Free accessIOP Institute of Physics | 2023| -
Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge
American Institute of Physics | 2019| -
In-situ impedance spectroscopy of a plasma-semiconductor thin film system during reactive sputter deposition
American Institute of Physics | 2019| -
Investigation of ionized metal flux fraction in HiPIMS discharges with Ti and Ni targets
British Library Online Contents | 2014| -
Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
British Library Online Contents | 2019| -
Comparative Study of Total Power Density at a Substrate in Pulsed DC Magnetron and Hollow-Cathode Plasma Jet Sputtering Systems
British Library Online Contents | 2009| -
Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system
British Library Conference Proceedings | 2010| -
Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system
British Library Online Contents | 2010| -
Time-resolved tunable diode laser absorption spectroscopy of excited argon and ground-state titanium atoms in pulsed magnetron discharges
British Library Online Contents | 2013| -
Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system
British Library Online Contents | 2008| -
Time-resolved tunable diode laser absorption spectroscopy of pulsed plasma
British Library Online Contents | 2013| -
Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system
British Library Conference Proceedings | 2008| -
Multi-SWD Plasma Jet System for PECVD Deposition of Thin Films
British Library Online Contents | 2014| -
Floating harmonic probe for diagnostic of pulsed discharges
British Library Online Contents | 2019| -
Luminescence Properties of Ba~xSr~1 ~-~ xTiO~3 Thin Films Deposited by RF Hollow Cathode Plasma Jet System
British Library Online Contents | 2006| -
Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO2 layers
American Institute of Physics | 2017| -
Time-resolved plasma parameters in the HiPIMS discharge with Ti target in Ar/O2 atmosphere
British Library Online Contents | 2011| -
Enhanced oxidation of TiO2 films prepared by high power impulse magnetron sputtering running in metallic mode
American Institute of Physics | 2017| -
Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti-Cu thin films (8 pages)
British Library Online Contents | 2010| -
Enhanced photocatalytic activity of silver-doped nanoparticulate TiO2 thin films with respect to the method of doping
British Library Online Contents | 2015| -
The influence of technological conditions on electrical properties of MIM systems
National licenceSpringer Verlag | 1974| -
Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges (7 pages)
British Library Online Contents | 2014| -
Semiconducting $ WO_{3} $ thin films prepared by pulsed reactive magnetron sputtering
Online Contents | 2015| -
A modified Katsumata probe—Ion sensitive probe for measurement in non-magnetized plasmas
American Institute of Physics | 2015| -
Semiconducting WO3 thin films prepared by pulsed reactive magnetron sputtering
Springer Verlag | 2015|
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