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Growth behavior and structural analysis of atomic layer deposited SnxTi1−xOy films
American Institute of Physics | 2018| -
Chemical passivation of GaSb-based surfaces by atomic layer deposited ZnS using diethylzinc and hydrogen sulfide
American Institute of Physics | 2012| -
Investigation on the diffusion barrier properties of sputtered Mo/W–N thin films in Cu interconnects
National licenceAmerican Institute of Physics | 2007| -
Selective atomic layer deposition of HfO2 on copper patterned silicon substrates
National licenceAmerican Institute of Physics | 2010| -
Structural phase transformation of Y2O3 doped HfO2 films grown on Si using atomic layer deposition
National licenceAmerican Institute of Physics | 2009| -
Room temperature TiO2 atomic layer deposition on collagen membrane from a titanium alkylamide precursor
American Institute of Physics | 2017| -
Scalable control program for multiprecursor flow-type atomic layer deposition system
American Institute of Physics | 2015| -
Selective atomic layer deposition of zirconia on copper patterned silicon substrates using ethanol as oxygen source as well as copper reductant
American Institute of Physics | 2014| -
Effect of on the low pressure chemical vapor deposition of film at low temperature using tetrakis(diethylamino)titanium and oxygen
American Institute of Physics | 2007| -
Growth behavior and properties of atomic layer deposited tin oxide on silicon from novel tin(II)acetylacetonate precursor and ozone
American Institute of Physics | 2014| -
Design and implementation of a novel portable atomic layer deposition/chemical vapor deposition hybrid reactor
National licenceAmerican Institute of Physics | 2013| -
Multi-metal films, alternating film multilayers, formation methods and deposition system
Free accessEuropean Patent Office | 2019|
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