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Adsorption kinetics of SiH4, Si2H6 and Si3H8 on the Si(111)-(7×7) surface
National licenceElsevier | 1987| -
Surface Chemistry in the Chemical Vapor Deposition of Electronic Materials
American Chemical Society | 1996| -
Silicon chemical vapor deposition one step at a time: fundamental studies of silicon hydride chemistry
National licenceAmerican Chemical Society | 1991| -
Progress in the development and understanding of advanced low k and ultralow k dielectrics for very large-scale integrated interconnects—State of the art
Free accessAmerican Institute of Physics | 2014| -
BEOL structures incorporating active devices and mechanical strength
Free accessEuropean Patent Office | 2016| -
Beol structures incorporating active devices and mechanical strength
Free accessEuropean Patent Office | 2016| -
ANTI-FUSE AND FUSE STRUCTURES USING ANISOTROPIC ETCHING OF THE SUBSTRATE USING A PATTERN OF ETCH RELEASE HOLES FOR IMPROVING THE FUNCTIONALITY OF QUBIT CIRCUITS
Free accessEuropean Patent Office | 2024| -
ANTI-FUSE AND FUSE STRUCTURES FOR IMPROVING THE FUNCTIONALITY OF QUBIT CIRCUITS
Free accessEuropean Patent Office | 2024| -
ANTI-FUSE AND FUSE STRUCTURES FOR IMPROVING THE FUNCTIONALITY OF QUBIT CIRCUITS
Free accessEuropean Patent Office | 2023| -
Wiring switch designs based on a field effect device for reconfigurable interconnect paths
Free accessEuropean Patent Office | 2015| -
Low-Loss Large-Grain Optical Waveguide For Interconnecting Components Integrated On A Glass Substrate
Free accessEuropean Patent Office | 2017|
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