Year of publication
Subject
Type of material
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Language
Synonyms were used for: ENGINEERING • FOR • OPTICAL ENGINEERING • SOCIETY
Search without synonyms: journal:(PROCEEDINGS - SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING)
Used synonyms:
- industrielle technik
- ingenieurwesen
- ingenieurwissenschaft
- ingenieurwissenschaften
- technik
- technikwissenschaften
- technique
- technische wissenschaften
Used synonyms:
- fur
Used synonyms:
- angewandte optik
- optische technik
- technische optik
Used synonyms:
- gesellschaft
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0.18-m lithography strategies: 248-nm DUV step-and-scanner and advanced chemical amplified resist [3679-100]
British Library Conference Proceedings | 1999| -
0.18-m optical lithography performances using an alternating DUV phase-shift mask [3334-03]
British Library Conference Proceedings | 1998| -
0.18-m technology at contact level: deep-UV process development by tuning NA/O and using a bottom antireflective coating [3679-105]
British Library Conference Proceedings | 1999| -
0.25 micrometer lithography using a 50 kV shaped electron-beam vector scan system
Tema Archive | 1995| -
0.25-mum technology arithmetic codec for mobile multimedia communicators [5117-39]
British Library Conference Proceedings | 2003| -
0.25-m lithography using a 50-kV shaped electron-beam vector scan system [2437-16]
British Library Conference Proceedings | 1995| -
0.25-m logic manufacturability using practical 2D optical proximity correction [3334-19]
British Library Conference Proceedings | 1998| -
0.25-m multilevel interconnect with DUV processing [3051-16]
British Library Conference Proceedings | 1997| -
0.30k1 CH delineation with novel image reversal materials [7273-67]
British Library Conference Proceedings | 2009| -
0.32-mum pitch random line pattern formation by dense dummy pattern and double exposure in KrF wavelength [4000-121]
British Library Conference Proceedings | 2000| -
0.35-m DUV lithography for poly gate layer [2196-28]
British Library Conference Proceedings | 1994| -
0.35-m excimer DUV photolithography process [1927-26]
British Library Conference Proceedings | 1993| -
0.35-m i-line attenuated phase-shift mask (PSM) repair by focused-ion-beam technology [3096-46]
British Library Conference Proceedings | 1997| -
0.35-m i-line poly processing with a bottom antireflective coating (BARC) [2440-56]
British Library Conference Proceedings | 1995|
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