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Useful protocol for evaluating subtle and important differences between photoresist formulations
British Library Online Contents | 2004| -
Effect of photoacid generator concentration on sensitivity, photoacid generation, and deprotection of chemically amplified resists
British Library Online Contents | 2002| -
Micromolar concentrations of base quenchers impact the apparent efficiency of photoacid generation in chemically amplified resists
British Library Online Contents | 2002| -
The Multifunctional Role of Base Quenchers in Chemically Amplified Photoresists
British Library Online Contents | 2002| -
A Standard Addition Technique To Quantify Photoacid Generation in Chemically Amplified Photoresist
British Library Online Contents | 2001| -
Evaluation of the standard addition method to determine rate constants for acid generation in chemically amplified photoresist at 157 nm [4345-121]
British Library Conference Proceedings | 2001| -
Progress in 193-nm top-surface imaging process development [3333-17]
British Library Conference Proceedings | 1998| -
Applications of molecular modeling in nanolithography
British Library Conference Proceedings | 1999| -
Line edge roughness and intrinsic bias for two methacrylate polymer resist systems
British Library Online Contents | 2006| -
EUV mask making: an approach based on the direct patterning of the EUV reflector [5256-61]
British Library Conference Proceedings | 2003| -
The effects of chemical gradients and photoresist composition on lithographically generated line edge roughness [5753-44]
British Library Conference Proceedings | 2005| -
Characterization of line-edge roughness in photoresist using an image fading technique [5376-44]
British Library Conference Proceedings | 2004| -
The transfer of photoresist LER through etch [6153-45]
British Library Conference Proceedings | 2006| -
Post-etch LER performance of novel surface conditioner solutions [6153-149]
British Library Conference Proceedings | 2006| -
Influence of antireflection coatings in ArF lithography [5256-107]
British Library Conference Proceedings | 2003| -
Comparative study of mask architectures for EUV lithography
British Library Conference Proceedings | 2004| -
Defect printability study using EUV lithography [6151-30]
British Library Conference Proceedings | 2006|
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