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Advances in Patterning Materials and Processes XXXIV : 27 February-2 March 2017, San Jose, California, United States
TIBKAT | 2017|Contributors: Hohle, Christoph K. -
Advances in Patterning Materials and Processes XXXIV : 27 February-2 March 2017, San Jose, California, United States
TIBKAT | 2017|Contributors: Hohle, Christoph K. -
Advances in Patterning Materials and Processes XXXII : 23-26 February 2015, San Jose, California, United States
TIBKAT | 2015|Contributors: Hohle, Christoph K. -
Chemical shrink materials and process for negative tone development (NTD) resist [9051-79]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL [9051-77]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Study on resist performance of chemically amplified molecular resist based on noria derivative and calixarene derivative [9051-74]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Deprotonation mechanism of ionized poly(4-hydroxystyrene) [9051-62]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process [9051-36]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Novel non-chemically amplified (n-CARs) negative resists for EUVL [9051-5]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
SRAF window improvement with under-coating layer [9051-76]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Improved adhesion of novolac and epoxy based resists by cationic organic materials on critical substrates for high volume patterning applications [9051-59]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Inhomogeneity of PAGs in resist film studied by molecular-dynamics simulations for EUV lithography [9051-49]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Extending lithography with advanced materials (Invited Paper) [9051-40]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Robust complementary technique with multiple-patterning for sub-10 nm node device [9051-30]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Line width roughness reduction by rational design of photoacid generator for submillisecond laser post-exposure bake [9051-16]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Positive tone cross-linked resists based on photoacid inhibition of cross linking [9051-13]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Decreasing curing temperature of spin-on dielectrics by using additives [9051-65]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Spin on lithographic resist trim process optimization and process window evaluation [9051-43]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Advanced develop processes for reducing defects related with e-beam resists [9051-31]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K. -
Reduction of image placement error on photomask-making for multiple patterning [9051-29]
British Library Conference Proceedings | 2014|Contributors: Hohle, Christoph K.
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