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Finding Waldo: Face Recognition Software and Concerns Regarding Anonymity and Public Political Speech
British Library Conference Proceedings| -
Practical issues in the deployment of a run-to-run control system in a semiconductor manufacturing facility
British Library Conference Proceedings | 1999| -
Supervisory Run-to-Run Control of Polysilicon Gate Etch-Using In Situ Ellipsometry
British Library Online Contents | 1994| -
First-wafer effect in remote plasma processing: The stripping of photoresist, silicon nitride, and polysilicon
British Library Online Contents | 1994| -
Advanced statistical process control of a chemical vapor tungsten deposition process on an Applied Materials Centura reactor [2336-04]
British Library Conference Proceedings | 1994| -
Real-Time Inference of Plasma Etch Uniformity Using In Situ Ellipsometry
British Library Conference Proceedings | 1993| -
On-line patterned wafer thickness control of chemical-mechanical polishing
British Library Conference Proceedings | 1999| -
On-line patterned wafer thickness control of chemical-mechanical polishing
British Library Online Contents | 1999| -
First-wafer effect in remote plasma processing: The stripping of photoresist, silicon nitride, and polysilicon
British Library Conference Proceedings | 1994| -
Sensor integration into plasma etch reactors of a developmental pilot line
American Institute of Physics | 1994|
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