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On ultra-thin oxide/Si and very-thin oxide/Si structures prepared by wet chemical process
Online Contents | 2010| -
Photoluminescence of very thin oxide-a-Si:H structures passivated in HCN solutions
Online Contents | 2008| -
X-ray and optical investigation of KCN and HCN passivated structures based on amorphous silicon
Online Contents | 2005| -
Photoluminescence properties of a-Si:H based thin films and corresponding solar cells
Online Contents | 2003| -
A study of Al-Si3N4-ultrathin Si-GaAs structures by DLTS and C-V measurements
Online Contents | 2003| -
On light-related electrical properties of porous silicon-crystalline silicon structure
Online Contents | 2000| -
Modification of the high-doped GaAs surface region by its exposure to 150keV proton beam
Online Contents | 1999| -
The influence of the inductively-coupled hydrogen plasma on the GaAs surface properties
Online Contents | 1997| -
Formation of anodic plasma oxides on InP, GaAs and Si through Al and Sm overlayers
Online Contents | 1994|
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