Displacement Talbot lithography for nano-engineering of III-nitride materials (English)
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In:
Microsystems & Nanoengineering
;
5
, 1
;
1-12
;
2019
More details on this result
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Title:Displacement Talbot lithography for nano-engineering of III-nitride materials
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Contributors:Coulon, Pierre-Marie (author) / Damilano, Benjamin (author) / Alloing, Blandine (author) / Chausse, Pierre (author) / Walde, Sebastian (author) / Enslin, Johannes (author) / Armstrong, Robert (author) / Vézian, Stéphane (author) / Hagedorn, Sylvia (author) / Wernicke, Tim (author)
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Published in:Microsystems & Nanoengineering ; 5, 1 ; 1-12
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Issue:1
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Place of publication:London
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Publication date:2019-12-01
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Size:12 pages
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ISSN:
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DOI:
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Type of media:Article (Journal)
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Type of material:Electronic Resource
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Language:English
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Keywords:
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