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A high-power, low-contamination laser plasma source for extreme UV lithography
Online Contents | 1995| -
Oxidation of metal thin films by atomic oxygen: A low energy ion scattering study
American Institute of Physics | 2019| -
Metal diffusion properties of ultra-thin high-k Sc2O3 films
Free accessAmerican Institute of Physics | 2017| -
Formation of H2O on a CO2 dosed Ru(0 0 0 1) surface under Extreme Ultraviolet Light and H2
British Library Online Contents | 2018| -
Controlled growth of PbZr0.52Ti0.48O3 using nanosheet coated Si (001)
British Library Online Contents | 2015| -
Self-contained in-vacuum in situ thin film stress measurement tool
Free accessAmerican Institute of Physics | 2018| -
Linearity of P-N junction photodiodes under pulsed irradiation
British Library Online Contents | 2002| -
Nanosheet controlled epitaxial growth of PbZr~0~.~5~2Ti~0~.~4~8O~3 thin films on glass substrates (4 pages)
British Library Online Contents | 2014| -
Coexistence of ice clusters and liquid-like water clusters on the Ru(0001) surface
British Library Online Contents | 2017| -
Tin etching from metallic and oxidized scandium thin films
Free accessAmerican Institute of Physics | 2017| -
Hydrogen-induced blistering of Mo/Si multilayers: Uptake and distribution
British Library Online Contents | 2013| -
Defect formation in single layer graphene under extreme ultraviolet irradiation
Tema Archive | 2014| -
Spectral and spatial structure of extreme ultraviolet radiation in laser plasma-wall interactions
British Library Online Contents | 2012|
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