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Doping of Si thin films by low‐temperature molecular beam epitaxy
National licenceAmerican Institute of Physics | 1993| -
Investigation of mechanisms of vacancy generation in silicon in the presence of a TiSi2 film
National licenceAmerican Institute of Physics | 1997| -
Determination of Si self‐interstitial diffusivities from the oxidation‐enhanced diffusion in B doping‐superlattices: The influence of the marker layers
National licenceAmerican Institute of Physics | 1995| -
Diffusion of dopants in B‐ and Sb‐delta‐doped Si films grown by solid‐phase epitaxy
National licenceAmerican Institute of Physics | 1993| -
Physical mechanisms of transient enhanced dopant diffusion in ion-implanted silicon
National licenceAmerican Institute of Physics | 1997| -
Influence of fluorine implant on boron diffusion: Determination of process modeling parameters
National licenceAmerican Institute of Physics | 1995|
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