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Simulation analysis of a chemically amplified positive resist for KrF lithography
Tema Archive | 1994| -
Phase shift lithography in the manufacture of sub-120 nm low-voltage DSP circuits
Tema Archive | 2000| -
Sub-resolution assist feature tolerances for contact windows using 193 nm lithography
Tema Archive | 1998| -
A unified approach to resist materials design for the advanced lithographic technologies
Tema Archive | 1994| -
A new variable transmission illumination technique optimized with design rule criteria
Tema Archive | 1998|
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