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121–140 of 217 hits
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A theoretical investigation of photoemission spectra from (GaAs)~2(AlAs)~2 superlattices
British Library Conference Proceedings | 2001|Contributors: Hitchcock, A. P. -
LAVA: lithography analysis using virtual access [3334-18]
British Library Conference Proceedings | 1998|Contributors: Van den hove, L. -
Performance of a phase-shift focus monitor reticle designed for 193-nm use [3679-10]
British Library Conference Proceedings | 1999|Contributors: Van den Hove, L. -
Plasma characteristics and the growth of group III-nitrides by metalorganic molecular beam epitaxy
Online Contents | 1997| -
Flare impact on the intrafield CD control for sub-0.25-m patterning [3679-34]
British Library Conference Proceedings | 1999|Contributors: Van den Hove, L. -
Realization of a Phased-Array Multi-Wavelength Laser Using Hybridly Integrated PICs
British Library Conference Proceedings | 2000| -
Study of the impact to image quality and overlay by different pupil fills in a DUV scanner via overlay metrology [3679-79]
British Library Conference Proceedings | 1999|Contributors: Van den Hove, L. -
A Study of the Electrical Characteristics of Various Metals on p-Type GaN for Ohmic Contacts
British Library Online Contents | 1999| -
Effects of subresolution assist features on depth of focus and uniformity of contact windows for 193-nm lithography [3679-61]
British Library Conference Proceedings | 1999|Contributors: Van den Hove, L. -
Reticle contributions to CD uniformity for 0.25-m DUV lithography [3334-62]
British Library Conference Proceedings | 1998|Contributors: Van den hove, L. -
0.18-m optical lithography performances using an alternating DUV phase-shift mask [3334-03]
British Library Conference Proceedings | 1998|Contributors: Van den hove, L. -
Alignment performance versus mark quality [3334-47]
British Library Conference Proceedings | 1998|Contributors: Van den hove, L. -
The Role of Ion Characteristics in Determining the Structural and Electrical Quality of InN Grown by Metalorganic Molecular Beam Epitaxy
British Library Online Contents | 1997| -
Optical extension at the 193-nm wavelength [3679-29]
British Library Conference Proceedings | 1999|Contributors: Van den Hove, L. -
Novel aberration monitor for optical lithography [3679-07]
British Library Conference Proceedings | 1999|Contributors: Van den Hove, L. -
Depth of focus enhancement for 193-nm window lithography with subresolution assist features [3679-30]
British Library Conference Proceedings | 1999|Contributors: Van den Hove, L. -
High-speed alignment simulator for Nikon steppers [3679-20]
British Library Conference Proceedings | 1999|Contributors: Van den Hove, L.
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