Low Energy Plasma Beams for Semiconductor Technology (English)
- New search for: Oechsner, H.
- New search for: Oechsner, H.
- New search for: Williams, P. F.
In:
Plasma processing of semiconductors
;
529-544
;
1997
-
ISBN:
- Conference paper / Print
-
Title:Low Energy Plasma Beams for Semiconductor Technology
-
Contributors:Oechsner, H. ( author ) / Williams, P. F.
-
Conference:NATO Advanced Study Institute, Plasma processing of semiconductors ; 1996
-
Published in:Plasma processing of semiconductors ; 529-544NATO ASI SERIES E APPLIED SCIENCES ; 336 ; 529-544
-
Publisher:
- New search for: Kluwer
-
Publication date:1997-01-01
-
Size:16 pages
-
Remarks:Described as proceedings. Held at the Chateau de Bonas, near Toulouse, France
-
ISBN:
-
Type of media:Conference paper
-
Type of material:Print
-
Language:English
-
Keywords:
-
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 23
-
Plasma Chemistry, Basic Processes and PECVDFlamm, D. L. et al. | 1997
- 61
-
The Role of Ions in Reactive Ion Etching with Low Density PlasmasCoburn, J. W. et al. | 1997
- 73
-
SiO~2 Etching in High-Density Plasmas: Differences with Low-Density PlasmasOehrlein, G. S. et al. | 1997
- 89
-
Introduction to Plasma Enhanced Chemical Vapor DepositionCale, T. S. / Raupp, G. B. / Rogers, B. R. / Myers, F. R. et al. | 1997
- 109
-
Topography Evolution During Semiconductor ProcessingCale, T. S. / Mahadev, V. / Tang, Z. / Rajagopalan, G. et al. | 1997
- 125
-
Deposition of Amorphous SiliconPerrin, J. et al. | 1997
- 137
-
High Density Sources for Plasma EtchingMantei, T. D. et al. | 1997
- 157
-
Resonant Plasma Excitation by Electron Cyclotron Waves-Fundamentals and ApplicationsOechsner, H. et al. | 1997
- 181
-
The Transition from Capacitive to Inductive to Wave Sustained DischargesBoswell, R. W. / Ellingboe, A. / Degeling, A. / Lieberman, M. et al. | 1997
- 187
-
Physics of Surface-Wave DischargesMargot, J. / Moisan, M. et al. | 1997
- 211
-
Surface Science Aspects of Etching and Wall Reactions in High Density PlasmasCoburn, J. W. et al. | 1997
- 221
-
Plasma-Surface InteractionsD'Agostino, R. et al. | 1997
- 243
-
Cl~2 Plasma-Si Surface Interactions in Plasma EtchingDonnelly, V. M. / Layadi, N. / Lee, J. T. C. / Herman, I. P. et al. | 1997
- 277
-
Particle in Cell Monte Carlo Collision Codes (PIC-MCC); Methods and Applications to Plasma ProcessingBirdsall, C. K. et al. | 1997
- 291
-
Fluid and Hybrid Models of Non Equilibrium DischargesBoeuf, J.-P. / Merad, A. et al. | 1997
- 321
-
Optical Diagnostics of Processing PlasmasWilliams, P. F. et al. | 1997
- 339
-
Optical Diagnostics of Plasmas: A Tool for Process ControlSadeghi, N. / Derouard, J. / Booth, J.-P. et al. | 1997
- 359
-
Infrared Absorption Spectroscopy as a Diagnostic for Processing PlasmasKroesen, G. M. W. et al. | 1997
- 375
-
Ellipsometric Analysis of Plasma Deposited and Plasma Etched MaterialsWoollam, J. A. et al. | 1997
- 397
-
Mass Spectrometry of Reactive PlasmasPerrin, J. et al. | 1997
- 433
-
Deposition of Silicon Dioxide Films using the Helicon Diffusion Reactor for Integrated Optics ApplicationsBoswell, R. W. / Durandet, A. / Charles, C. / Ladouceur, F. et al. | 1997
- 477
-
Remote Plasma ProcessingOehrlein, G. S. et al. | 1997
- 491
-
Magnetized Surface-Wave Discharges for Submicrometer Pattern TransferMargot, J. / Chaker, M. / Moisan, M. / St-Onge, L. et al. | 1997
- 515
-
Dusty Plasmas: Fundamental Aspects and Industrial ApplicationsKroesen, G. M. W. et al. | 1997
- 529
-
Low Energy Plasma Beams for Semiconductor TechnologyOechsner, H. et al. | 1997
- 545
-
Process Control ConceptsWatts Butler, S. et al. | 1997
- 565
-
Issues and Solutions for Applying Process Control to Semiconductor ManufacturingWatts Butler, S. et al. | 1997