Optical characterization of attenuated phase shifters [3050-39] (English)
- New search for: Callegari, A.
- New search for: Babich, K.
- New search for: SPIE
- New search for: Callegari, A.
- New search for: Babich, K.
- New search for: Jones, S. K.
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In:
Metrology, inspection, and process control for microlithography
3050
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507-514
;
1997
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ISBN:
- Conference paper / Print
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Title:Optical characterization of attenuated phase shifters [3050-39]
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Contributors:
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Conference:Conference; 11th, Metrology, inspection, and process control for microlithography ; 1997 ; Santa Clara; CA
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Published in:Metrology, inspection, and process control for microlithography , 3050 ; 507-514PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING , 3050 ; 507-514
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Publisher:
- New search for: SPIE
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Publication date:1997-01-01
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Size:8 pages
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ISBN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 2
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Thinking small: challenges for metrology at century's end [3050-10]Arnold, W. H. / SPIE et al. | 1997
- 2
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Thinking small: challenges for metrology at century's endArnold, William H. et al. | 1997
- 12
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Wavefront engineering from 500- to 100-nm CD [3050-200]Levenson, M. D. / SPIE et al. | 1997
- 12
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Wavefront engineering from 500- to 100-nm CDLevenson, David et al. | 1997
- 24
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Optical lithography-thirty years and three orders of magnitude: the evolution of optical lithography tools [3050-201]Bruning, J. H. / SPIE et al. | 1997
- 24
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0ptical lithography--thirty years and three orders of magnitude: the evolution of optical lithography toolsBruning, John H. et al. | 1997
- 38
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Photoresist materials: a historical perspective [3050-202]Willson, C. G. / Dammel, R. R. / Reiser, A. / SPIE et al. | 1997
- 38
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Photoresist materials: a historical perspectiveWillson, C. Grant / Dammel, Ralph R. / Reiser, Arnost et al. | 1997
- 54
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Application of statistical metrology to reduce total uncertainty in the CD-SEM measurement of across-chip linewidth variation [3050-01]Monahan, K. M. / Forcier, R. A. / Ng, W. / Kudallur, S. / SPIE et al. | 1997
- 54
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Application of statistical metrology to reduce total uncertainty in the CD-SEM measurement of across-chip linewidth variationMonahan, Kevin M. / Forcier, Randy A. / Ng, Waiman / Kudallur, Suresh / Sewell, Harry / Marchman, Herschel M. / Schlesinger, Jerry E. et al. | 1997
- 68
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Fourier transform feedback tool for scanning electron microscopes used in semiconductor metrology [3050-02]Postek, M. T. / Vladar, A. E. / Davidson, M. P. / SPIE et al. | 1997
- 68
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Fourier transform feedback tool for scanning electron microscopes used in semiconductor metrologyPostek, Michael T. / Vladar, Andras E. / Davidson, Mark P. et al. | 1997
- 80
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Survey of scanning electron microscopes using quantitative resolution evaluationFanget, Gilles L. / Martin, Herve M. / Florin, Brigitte et al. | 1997
- 80
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Survey of scanning electron microscopes using quantitative resolution evaluation [3050-03]Fanget, G. L. / Martin, H. M. / Florin, B. / SPIE et al. | 1997
- 93
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Statistical verification of multiple CD-SEM matchingErickson, Doreen / Sullivan, Neal T. / Elliott, Richard C. et al. | 1997
- 93
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Statistical verification of multiple CD-SEM matching [3050-04]Erickson, D. / Sullivan, N. T. / Elliott, R. C. / SPIE et al. | 1997
- 102
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Effect of processing on the overlay performance of a wafer stepper [3050-05]Dirksen, P. / Juffermans, C. A. / Leeuwestein, A. / Mutsaers, C. / SPIE et al. | 1997
- 102
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Effect of processing on the overlay performance of a wafer stepperDirksen, Peter / Juffermans, Casper A. H. / Leeuwestein, A. / Mutsaers, Kees A. H. / Nuijs, Tom A. M. / Pellens, Rudy J. M. / Wolters, Robert / Gemen, Jack et al. | 1997
- 114
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Improving metrology signal-to-noise on grainy overlay featuresYanof, Arnold W. / Windsor, Woody / Elias, Russ / Helbert, John N. / Harker, Cameron et al. | 1997
- 114
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Improving metrology signal-to-noise on grainy overlay features [3050-06]Yanof, A. W. / Windsor, W. / Elias, R. / Helbert, J. N. / SPIE et al. | 1997
- 123
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Improving the accuracy of overlay measurements through reduction in tool- and wafer-induced shifts [3050-07]Preil, M. E. / Plambeck, B. F. / Uziel, Y. / Zhou, H. / SPIE et al. | 1997
- 123
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Improving the accuracy of overlay measurements through reduction in tool- and wafer-induced shiftsPreil, Moshe E. / Plambeck, Bert F. / Uziel, Yoram / Zhou, Hao / Melvin, Matthew W. et al. | 1997
- 135
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Improvement of alignment accuracy for scaled exposure fieldNakajima, Satoshi / Tanigawa, Makoto / Ishihama, Akira / Sakiyama, Keizo et al. | 1997
- 135
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Improvement of alignment accuracy for scaled exposure field [3050-08]Nakajima, S. / Tanigawa, M. / Ishihama, A. / Sakiyama, K. / SPIE et al. | 1997
- 143
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Method to characterize overlay tool misalignments and distortionsSilver, Richard M. / Potzick, James E. / Scire, Fredric / Evans, Christopher J. / McGlauflin, M. / Kornegay, Edward / Larrabee, Robert D. et al. | 1997
- 143
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Method to characterize overlay tool misalignments and distortions [3050-09]Silver, R. M. / Potzick, J. E. / Scire, F. / Evans, C. J. / SPIE et al. | 1997
- 156
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Complementary alignment metrology: a visual technique for alignment monitoringZiger, David H. / Leroux, Pierre et al. | 1997
- 156
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Complementary alignment metrology: a visual technique for alignment monitoring [3050-59]Ziger, D. H. / Leroux, P. / SPIE et al. | 1997
- 172
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Contact holes: a challenge for signal collection efficiency and measurement algorithms [3050-61]Solecky, E. / Archie, C. N. / SPIE et al. | 1997
- 172
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Contact holes: a challenge for signal collection efficiency and measurement algorithmsSolecky, Eric P. / Archie, Charles N. et al. | 1997
- 182
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Scatterometric process monitor for silylationZaidi, Shoaib H. / McNeil, John R. / Naqvi, S. Sohail H. et al. | 1997
- 182
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Scatterometric process monitor for silylation [3050-18]Zaidi, S. H. / McNeil, J. R. / Naqvi, S. S. H. / SPIE et al. | 1997
- 194
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Plasma antireflective coating optimization using enhanced reflectivity modelingLucas, Kevin D. / Vasquez, Jamie A. / Jain, Ajay / Filipiak, Stanley M. / Vuong, Tam / King, Charles F. / Roman, Bernard J. et al. | 1997
- 194
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Plasma antireflective coating optimization using enhanced reflectivity modeling [3050-20]Lucas, K. D. / Vasquez, J. A. / Jain, A. / Filipiak, S. M. / SPIE et al. | 1997
- 205
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Precise measurement of ARC optical indices in the deep-UV range by variable-angle spectroscopic ellipsometry [3050-60]Boher, P. / Stehle, J. L. / Piel, J. P. / Defranoux, C. / SPIE et al. | 1997
- 205
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Precise measurement of ARC optical indices in the deep-UV range by variable-angle spectroscopic ellipsometryBoher, Pierre / Stehle, Jean-Louis P. / Piel, Jean-Philippe / Defranoux, Christophe / Hennet, Louis et al. | 1997
- 215
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Simulating photomask edge roughness and corner roundingAdam, Konstantinos / Socha, Robert J. / Pistor, Thomas V. / Neureuther, Andrew R. et al. | 1997
- 215
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Simulating photomask edge roughness and corner rounding [3050-13]Adam, K. / Socha, R. J. / Pistor, T. / Neureuther, A. R. / SPIE et al. | 1997
- 226
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Investigation of the effects of charging in SEM-based CD metrologyDavidson, Mark P. / Sullivan, Neal T. et al. | 1997
- 226
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Investigation of the effects of charging in SEM-based CD metrology [3050-14]Davidson, M. P. / Sullivan, N. T. / SPIE et al. | 1997
- 243
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High-precision calibration of a scanning probe microscope (SPM) for pitch and overlay measurements [3050-15]Chernoff, D. A. / Lohr, J. D. / Hansen, D. P. / Lines, M. / SPIE et al. | 1997
- 243
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High-precision calibration of a scanning probe microscope (SPM) for pitch and overlay measurementsChernoff, Donald A. / Lohr, Jason D. / Hansen, Douglas P. / Lines, Michael et al. | 1997
- 250
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Dimensional metrology at the nanometer level: combined SEM and PPMPostek, Michael T. / Ho, Huddee J. / Weese, Harrison L. et al. | 1997
- 250
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Dimensional metrology at the nanometer level: combined SEM and PPM [3050-16]Postek, M. T. / Ho, H. J. / Weese, H. L. / SPIE et al. | 1997
- 266
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Importance of wafer flatness for CMP and lithographyZhang, Yuan / Wagner, Lucian / Golbutsov, Peter et al. | 1997
- 266
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Importance of wafer flatness for CMP and lithography [3050-19]Zhang, Y. / Wagner, L. / Golubtsov, P. / SPIE et al. | 1997
- 270
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Characteristics of overlay accuracy after metal CMP processKim, Young-Keun / Lee, Yong-Suk / Lee, Won-Kyu / Ko, Chul-Gi et al. | 1997
- 270
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Characteristics of overlay accuracy after metal CMP process [3050-30]Kim, Y.-K. / Lee, Y.-S. / Lee, W.-G. / Ko, C.-G. / SPIE et al. | 1997
- 282
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CMP-compatible alignment strategy [3050-58]Rouchouze, E. / Darracq, J.-M. / Gemen, J. / SPIE et al. | 1997
- 282
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CMP-compatible alignment strategyRouchouze, Eric / Darracq, Jean-Michel / Gemen, Jack et al. | 1997
- 293
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CMP overlay metrology: robust performance through signal and noise improvements [3050-47]Podlesny, J. C. / Cusack, F. / Redmond, S. / SPIE et al. | 1997
- 293
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CMP overlay metrology: robust performance through signal and noise improvementsPodlesny, John C. / Cusack, Francis / Redmond, Susan et al. | 1997
- 304
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Characterization of real particle size for the process particle monitor using laser surface scanners [3050-22]Miyazaki, Y. / Mugibayashi, T. / Ikeno, M. / SPIE et al. | 1997
- 304
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Characterization of real particle size for the process particle monitor using laser surface scannersMiyazaki, Yoko / Mugibayashi, Toshiaki / Ikeno, Masahiko et al. | 1997
- 313
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Characterization of defect detection schemes using rigorous 3D EM field simulationSwecker, Aaron L. / Strojwas, Andrzej J. / Levy, Ady / Bell, Bobby R. et al. | 1997
- 313
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Comparison of defect detection schemes using rigorous 3D EM field simulations [3050-23]Swecker, A. L. / Strojwas, A. J. / Levy, A. / Bell, B. R. / SPIE et al. | 1997
- 322
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Application of rigorous topography simulation for modeling of defect propagation/growth in VLSI fabricationLi, Xiaolei / Reddy, Mahesh / Strojwas, Andrzej J. / Milor, Linda / Lin, YungTao et al. | 1997
- 322
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Application of rigorous topography simulation for modeling of defect propagation/growth in VLSI fabrication [3050-24]Li, X. / Reddy, M. / Strojwas, A. J. / Milor, L. / SPIE et al. | 1997
- 332
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Simulation of sub-half-micron mask defect printability at 1X reticle magnificationFlack, Warren W. / Newman, Gary / Schurz, Dan L. et al. | 1997
- 332
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Simulation of sub-half-micron mask defect printability at 1X reticle magnification [3050-12]Flack, W. W. / Newman, G. / Schurz, D. L. / SPIE et al. | 1997
- 350
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Stability of glass probe tips for critical dimension measurement [3050-31]Griffith, J. E. / Miller, G. L. / Hopkins, L. C. / Bryson, C. E. / SPIE et al. | 1997
- 350
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Stability of glass probe tips for critical dimension measurementGriffith, Joseph E. / Miller, Gabriel L. / Hopkins, Leslie C. / Bryson, Charles E. / Snyder, E. J. / Plombon, J. J. / Vasilyev, Leonid A. / Bindell, Jeffery B. et al. | 1997
- 361
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Unique approach to high-performance magnification calibration [3050-32]Hansen, D. P. / Lines, M. / Chernoff, D. A. / Lohr, J. D. / SPIE et al. | 1997
- 361
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Unique approach to high-performance magnification calibrationHansen, Douglas P. / Lines, Michael / Chernoff, Donald A. / Lohr, Jason D. et al. | 1997
- 367
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Novel near-field optical probe for 100-nm critical dimension measurementsStallard, Brian R. / Kaushik, Sumanth et al. | 1997
- 367
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Novel near-field optical probe for 100-nm critical dimension measurements [3050-33]Stallard, B. R. / Kaushik, S. / SPIE et al. | 1997
- 375
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Statistical measure for the sharpness of SEM imagesZhang, Nien-Fan / Postek, Michael T. / Larrabee, Robert D. / Vladar, Andras E. / Keery, William J. / Jones, Samuel N. et al. | 1997
- 375
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Statistical measure for the sharpness of SEM images [3050-34]Zhang, N. F. / Postek, M. T. / Larrabee, R. D. / Vladar, A. E. / SPIE et al. | 1997
- 388
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Off-line programming of CD-SEM systems enhances wafer fab productivity [3050-55]Schiessl, R. / SPIE et al. | 1997
- 388
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Offline programming of CD-SEM systems enhances wafer fab productivitySchiessl, Rudolf et al. | 1997
- 398
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Comparisons of six different intrafield control paradigms in an advanced mix-and-match environment [3050-26]Pellegrini, J. C. / SPIE et al. | 1997
- 398
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Comparisons of six different intrafield control paradigms in an advanced mix-and-match environmentPellegrini, Joseph C. et al. | 1997
- 407
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Characterizing overlay registration of concentric 5X and 1X stepper exposure fields using interfield dataGoodwin, Francis G. / Pellegrini, Joseph C. et al. | 1997
- 407
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Characterizing overlay registration of concentric 5X and 1X stepper exposure fields using interfield data [3050-27]Goodwin, F. / Pellegrini, J. C. / SPIE et al. | 1997
- 418
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Overlay measurements and edge detection methods [3050-28]Zaslavsky, A. I. / SPIE et al. | 1997
- 418
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Overlay measurements and edge detection methodsZaslavsky, Alexander I. et al. | 1997
- 425
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Basic challenges of optical overlay measurementsShchemelinin, Anatoly / Shifrin, Eugene / Zaslavsky, Alexander I. et al. | 1997
- 425
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Basic challenges of optical overlay measurements [3050-29]Shchemelinin, A. / Shifrin, E. / Zaslavsky, A. I. / SPIE et al. | 1997
- 434
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Automatic classification of spatial signatures on semiconductor wafer maps [3050-35]Tobin, K. W. / Gleason, S. S. / Karnowski, T. P. / Cohen, S. L. / SPIE et al. | 1997
- 434
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Automatic classification of spatial signatures on semiconductor wafer mapsTobin, Kenneth W. / Gleason, Shaun S. / Karnowski, Thomas P. / Cohen, Susan L. / Lakhani, Fred et al. | 1997
- 445
-
Advanced inspection for 0.25-m-generation semiconductor manufacturing [3050-36]Shapiro, A. / James, T. / Trafas, B. M. / SPIE et al. | 1997
- 445
-
Advanced inspection for 0.25-μm-generation semiconductor manufacturingShapiro, Arye / James, Thomas / Trafas, Brian M. et al. | 1997
- 452
-
Improved defect detection performance at metal and contact etch levels using a new optical-comparison segmented-autothreshold technologyGarvin, James F. / Keefauver, Kevin / Tinker, Mark et al. | 1997
- 452
-
Improved defect detection performance at metal and contact etch levels using a new optical-comparison segmented-autothreshold technology [3050-37]Garvin, J. F. / Keefauver, K. / Tinker, M. / SPIE et al. | 1997
- 464
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Detecting lithography's variations: new types of defects for automatic inspection machines [3050-38]Gudeczauskas, P. / Ravid, E. / SPIE et al. | 1997
- 464
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Detecting lithography's variations: new types of defects for automatic inspection machinesGudeczauskas, Paul / Ravid, Erez et al. | 1997
- 476
-
Resist and etched line profile characterization using scatterometryRaymond, Christopher J. / Naqvi, S. Sohail H. / McNeil, John R. et al. | 1997
- 476
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Resist and etched line profile characterization using scatterometry [3050-43]Raymond, C. J. / Naqvi, S. S. H. / McNeil, J. R. / SPIE et al. | 1997
- 487
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Optimizing in-line defect monitoring using correlation with electrical failures [3050-25]Aji, P. A. / Lanier, A. / SPIE et al. | 1997
- 487
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Optimizing in-line defect monitoring using correlation with electrical failuresAji, Prashant A. / Lanier, Arnaud et al. | 1997
- 496
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Effect of reticle bias on isofocal process performance at sub-half-micron resolution [3050-11]Martin, B. / Arthur, G. G. / SPIE et al. | 1997
- 496
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Effect of reticle bias on isofocal process performance at sub-half-micron resolutionMartin, Brian / Arthur, Graham G. et al. | 1997
- 507
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Optical characterization of attenuated phase shifters [3050-39]Callegari, A. / Babich, K. / SPIE et al. | 1997
- 507
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Optical characterization of attenuated phase shiftersCallegari, Alessandro / Babich, Katherina et al. | 1997
- 515
-
Optical diffraction tomography for latent image metrology [3050-40]Hatab, Z. R. / Ahmed, N. / Naqvi, S. S. H. / McNeil, J. R. / SPIE et al. | 1997
- 515
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Optical diffraction tomography for latent image metrologyHatab, Ziad R. / Ahmed, Nasir U. / Naqvi, S. Sohail H. / McNeil, John R. et al. | 1997
- 525
-
Monte Carlo simulation of charging effects on linewidth metrology [3050-41]Ko, Y. / SPIE et al. | 1997
- 525
-
Monte Carlo simulation of charging effects on linewidth metrologyKo, Yeong-Uk et al. | 1997
- 536
-
Highly accurate CD measurement with a micro standard [3050-45]Sasada, K. / Hashimoto, N. / Mori, H. / Otaka, T. / SPIE et al. | 1997
- 536
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Highly accurate CD measurement with a micro standardSasada, Katsuhiro / Hashimoto, Nobuyoshi / Mori, Hiroyoshi / Ohtaka, Tadashi et al. | 1997
- 545
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Advanced FTIR techniques for photoresist process characterization [3050-46]Carpio, R. A. / Byers, J. D. / Petersen, J. S. / Theiss, W. / SPIE et al. | 1997
- 545
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Advanced FTIR techniques for photoresist process characterizationCarpio, Ronald A. / Byers, Jeff D. / Petersen, John S. / Theiss, Wolfgang et al. | 1997
- 557
-
Alternative method for monitoring an in-line CD SEMHerrera, Pedro P. / Dick, Susan A. / Allgair, John A. et al. | 1997
- 557
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Alternative method for monitoring an in-line CD SEM [3050-48]Herrera, P. P. / Dick, S. A. / Allgair, J. / SPIE et al. | 1997
- 565
-
E-beam-induced distortions on SiN x-ray mask membraneKrasnoperov, Nikolai L. / Chen, Zheng / Cerrina, Franco et al. | 1997
- 565
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E-beam-induced distortions on SiN x-ray mask membrane [3050-49]Krasnoperov, N. L. / Chen, Z. / Cerrina, F. / SPIE et al. | 1997
- 574
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Single-feature metrology by means of light scatter analysisBischoff, Joerg / Hehl, Karl et al. | 1997
- 574
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Single-feature metrology by means of light scatter analysis [3050-50]Bischoff, J. / Hehl, K. / SPIE et al. | 1997
- 586
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Novel approach for defect detection and reduction techniques for submicron lithography [3050-51]Orth, J. A. / Phan, K. A. / Steele, D. A. / Young, R. Y. B. / SPIE et al. | 1997
- 586
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Novel approach for defect detection and reduction techniques for submicron lithographyOrth, Jonathan A. / Phan, Khoi A. / Steele, David A. / Young, Roger Y. B. et al. | 1997
- 602
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Monitoring optical properties and thickness of PECVD SiON antireflective layer by spectroscopic ellipsometry [3050-53]Ygartua, C. / Konjuh, K. / Schuchmann, S. / MacWilliams, K. P. / SPIE et al. | 1997
- 602
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Monitoring optical properties and thickness of PECVD SiON antireflective layer by spectroscopic ellipsometryYgartua, Carlos L. / Konjuh, Kathy / Schuchmann, Shari / MacWilliams, Kenneth P. / Mordo, David et al. | 1997
- 607
-
3D imaging of VLSI wafer surfaces using a multiple-detector SEMGold, Yaron I. / Ben-Av, Radel / Wagner, Mark et al. | 1997
- 607
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3D imaging of VLSI wafer surfaces using a multiple-detector SEM [3050-54]Gold, Y. I. / Av, R. B. / Wagner, M. / SPIE et al. | 1997
- 614
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Error estimation for lattice methods of stage self-calibration [3050-56]Raugh, M. R. / SPIE et al. | 1997
- 614
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Error estimation for lattice methods of stage self-calibrationRaugh, Michael R. et al. | 1997
- 626
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Innovations in monitoring for sub-half-micron production [3050-57]Lauck, T. L. / Wiley, K. / SPIE et al. | 1997
- 626
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Innovations in monitoring for sub-half-micron productionLauck, Teresa L. / Wiley, Kristin et al. | 1997