Zr-based films for attenuated phase-shift mask [3096-43] (English)
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In:
Photomask and x-ray mask technology
3096
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354-361
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1997
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ISBN:
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ISSN:
- Conference paper / Print
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Title:Zr-based films for attenuated phase-shift mask [3096-43]
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Contributors:Matsuo, T. ( author ) / Ohkubo, K. ( author ) / Haraguchi, T. ( author ) / Ueyama, K. ( author ) / Aizaki, N. / SPIE / BACUS / Photomask Japan
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Conference:International symposium; 4th, Photomask and x-ray mask technology ; 1997 ; Kawasaki; Japan
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Published in:Photomask and x-ray mask technology , 3096 ; 354-361PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING , 3096 ; 354-361
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Publisher:
- New search for: SPIE
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Publication date:1997-01-01
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Size:8 pages
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ISBN:
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ISSN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 2
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Lithography strategies for 180-nm CMOS device fabrication (Invited Paper) [3096-01]Arnold, W. H. / SPIE / BACUS / Photomask Japan et al. | 1997
- 2
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Lithography strategies for 180-nm CMOS device fabricationArnold, William H. et al. | 1997
- 11
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Plasma etching of Cr photomasks: parametric comparisons of plasma sources and process conditions [3096-03]Constantine, C. / Johnson, D. J. / Westerman, R. J. / Coleman, T. P. / SPIE / BACUS / Photomask Japan et al. | 1997
- 11
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Plasma etching of Cr photomasks: parametric comparisons of plasma sources and process conditionsConstantine, Chris / Johnson, David J. / Westerman, Russell J. / Coleman, Thomas P. / Faure, Thomas B. et al. | 1997
- 19
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Thin resist performance comparison for advanced e-beam reticle fabricationKobayashi, Hideo / Higuchi, Takao / Asakawa, Keishi / Yokoya, Yasunori / Yamashiro, Kazuhide et al. | 1997
- 19
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Thin resist performance comparison for advanced e-beam reticle fabrication [3096-04]Kobayashi, H. / Higuchi, T. / Asakawa, K. / Yokoya, Y. / SPIE / BACUS / Photomask Japan et al. | 1997
- 37
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Application of charge-dispersing layer to reticle fabrication [3096-32]Shirabe, K. / Hoshino, E. / Watanabe, K. / SPIE / BACUS / Photomask Japan et al. | 1997
- 37
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Application of charge-dispersing layer to reticle fabricationShirabe, Kotaro / Hoshino, Eiichi / Watanabe, Keiji et al. | 1997
- 42
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CD variation sources of photomaskKim, Byung G. / Choi, Seong-Woon / Yu, Yong H. / Yoon, Hee-Sun / Sohn, Jung-Min et al. | 1997
- 42
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CD variation sources of photomask [3096-33]Kim, B. G. / Choi, S. W. / Yu, Y. H. / Yoon, H. S. / SPIE / BACUS / Photomask Japan et al. | 1997
- 53
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Improvement of ZEN 4100 [3096-34]Mitao, N. / Abe, N. / Kawata, A. / Tanaka, K. / SPIE / BACUS / Photomask Japan et al. | 1997
- 53
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Improvement of ZEN 4100Mitao, Noriyuki / Abe, Nobunori / Kawata, Atsushi / Tanaka, Kiyoshi / Yamamoto, Yuhichi / Minagawa, Toshikatsu / Uraguchi, Masahiro / Ogawa, Michio et al. | 1997
- 61
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Post apply bake optimization for 6025 masks [3096-35]Buck, P. D. / Holmstroem, R. A. / SPIE / BACUS / Photomask Japan et al. | 1997
- 61
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Post apply bake optimization for 6025 masksBuck, Peter D. / Holmstrom, Robert A. et al. | 1997
- 68
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Development of an in-situ cleaning system for an e-beam reticle writerOhtoshi, Kenji / Yamasaki, Satoshi / Tamamushi, Shuichi / Tojo, Toru / Hirano, Ryoichi / Fukudome, Yuuji / Shimomura, Naoharu / Nishimura, Shinsuke / Yoshitake, Shusuke / Ogasawara, Munehiro et al. | 1997
- 68
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Development of an in-situ cleaning system for an e-beam reticle writer [3096-05]Ohtoshi, K. / Yamasaki, S. / Tamamushi, S. / Tojo, T. / SPIE / BACUS / Photomask Japan et al. | 1997
- 72
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Performance improvement in e-beam reticle writer HL-800M [3096-06]Satoh, H. / Someda, Y. / Saitou, N. / Kawasaki, K. / SPIE / BACUS / Photomask Japan et al. | 1997
- 72
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Performance improvement in e-beam reticle writer HL-800MSatoh, Hidetoshi / Someda, Yasuhiro / Saitou, Norio / Kawasaki, Katsuhiro / Mizuno, Kazui / Kadowaki, Yasuhiro / Hoga, Morihisa / Soga, Takashi et al. | 1997
- 84
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Cleaning technology of PSM for sub-quarter-micron devices [3096-07]Handa, H. / Takahashi, M. / Miyahara, Y. / SPIE / BACUS / Photomask Japan et al. | 1997
- 84
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Cleaning technology of PSM for sub-quarter-micron devicesHanda, Hitoshi / Takahashi, Masumi / Miyahara, Yutaka et al. | 1997
- 93
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Development of a pellicle for use with an ArF excimer laserShigematsu, Shigeto / Matsuzaki, Hitomi / Nakayama, Norio / Mase, H. et al. | 1997
- 93
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Development of a pellicle for use with an ArF excimer laser [3096-08]Shigematsu, S. / Matsuzaki, H. / Nakayama, N. / Mase, H. / SPIE / BACUS / Photomask Japan et al. | 1997
- 104
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Correcting method for mechanical vibration in electron-beam lithography systemTsuji, Hiroshi / Ohta, Hiroya / Satoh, Hidetoshi / Nagata, Koji / Saitou, Norio et al. | 1997
- 104
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Correcting method for mechanical vibration in electron-beam lithography system [3096-56]Tsuji, H. / Ohta, H. / Satoh, H. / Nagata, K. / SPIE / BACUS / Photomask Japan et al. | 1997
- 116
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Multipass gray printing for the new MEBES 4500S mask lithography systemAbboud, Frank E. / Dean, Robert L. / Doering, Janine J. / Eckes, W. / Gesley, Mark A. / Hofmann, Ulrich / Mulera, Terry / Naber, Robert J. / Pastor, M. / Phillips, Wayne et al. | 1997
- 116
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Multipass gray printing for a new MEBES 4500S mask lithography system [3096-57]Abboud, F. E. / Dean, R. L. / Doering, J. J. / Eckes, W. / SPIE / BACUS / Photomask Japan et al. | 1997
- 125
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Development of an electron-beam optical column for the mask lithography systemKomagata, Tadashi / Nakagawa, Yasutoshi / Takemura, Hitoshi / Gotoh, Nobuo et al. | 1997
- 125
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Development of an electron-beam optical column for a mask lithography system [3096-58]Komagata, T. / Nakagawa, Y. / Takemura, H. / Gotoh, N. / SPIE / BACUS / Photomask Japan et al. | 1997
- 138
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Automated OPC for application in advanced lithography (Invited Paper) [3096-09]Ronse, K. / Tritchkov, A. / Randall, J. / Jonckheere, R. / SPIE / BACUS / Photomask Japan et al. | 1997
- 138
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Automated OPC for application in advanced lithographyRonse, Kurt G. / Tritchkov, Alexander V. / Randall, John / Jonckheere, Rik M. / Ghandehari, Kouros / Van den Hove, Luc et al. | 1997
- 145
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Fast chip-level OPC system on mask databaseOhnuma, Hidetoshi / Tsudaka, Keisuke / Kawahira, Hiroichi et al. | 1997
- 145
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Fast chip-level OPC system on mask database [3096-10]Ohnuma, H. / Tsudaka, K. / Kawahira, H. / SPIE / BACUS / Photomask Japan et al. | 1997
- 154
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Automated method to check sidelobe overlap projected by adjacent apertures in attenuated phase-shift masksNakajo, Kyoji / Sakemi, Junya / Moniwa, Akemi / Terasawa, Tsuneo / Hasegawa, Norio / Tsujimoto, Eiji et al. | 1997
- 154
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Automated method to check sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks [3096-54]Nakajo, K. / Sakemi, J. / Moniwa, A. / Terasawa, T. / SPIE / BACUS / Photomask Japan et al. | 1997
- 163
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Hierarchical mask data design system (PROPHET) for aerial image simulation, automatic phase-shifter placement, and subpeak overlap checking [3096-12]Tsujimoto, E. / Watanabe, T. / Sato, Y. / Moniwa, A. / SPIE / BACUS / Photomask Japan et al. | 1997
- 163
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Hierarchical mask data design system (PROPHET) for aerial image simulation, automatic phase-shifter placement, and subpeak overlap checkingTsujimoto, Eiji / Watanabe, Takahiro / Sato, Yoshio / Moniwa, Akemi / Igarashi, Yoshinobu / Nakajo, Kyoji et al. | 1997
- 173
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Proximity effect correction for reticle fabrication [3096-53]Kamikubo, T. / Abe, T. / Oogi, S. / Anze, H. / SPIE / BACUS / Photomask Japan et al. | 1997
- 173
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Proximity effect correction for reticle fabricationKamikubo, Takashi / Abe, Takayuki / Oogi, Susumu / Anze, Hirohito / Shimizu, Mitsuko / Itoh, Masamitsu / Nakasugi, Tetsuro / Iijima, Tomohiro / Hattori, Yoshiaki et al. | 1997
- 178
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New mask data processing system for ULSI fabrication [3096-55]Takenouchi, R. / Ohnuma, H. / Ashida, I. / Nozawa, S. / SPIE / BACUS / Photomask Japan et al. | 1997
- 178
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New mask data processing system for ULSI fabricationTakenouchi, Ryuji / Ohnuma, Hidetoshi / Ashida, Isao / Nozawa, Satoru et al. | 1997
- 190
-
Prospects and challenges of ArF excimer laser lithography (Invited Paper) [3096-13]Sasago, M. / SPIE / BACUS / Photomask Japan et al. | 1997
- 190
-
Prospects and challenges of ArF excimer laser lithographySasago, Masaru et al. | 1997
- 193
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Evaluating next-generation reticle demands on lithography equipment [3096-14]Hoga, M. / Nei, M. / Ebinuma, R. / SPIE / BACUS / Photomask Japan et al. | 1997
- 193
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Evaluating next-generation reticle demands on lithography equipmentHoga, Morihisa / Nei, Masahiro / Ebinuma, Ryuichi et al. | 1997
- 198
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Photomask fabrication feasibility for next-generation reticle formatKatsumata, Mikio / Kawahira, Hiroichi / Nozawa, Satoru et al. | 1997
- 198
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Photomask fabrication feasibility for next-generation reticle format [3096-15]Katsumata, M. / Kawahira, H. / Nozawa, S. / SPIE / BACUS / Photomask Japan et al. | 1997
- 206
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Dry etching with consideration to thicker reticle sizeHoshino, Eiichi / Hasegawa, Hideaki / Shishido, Kunio / Yoshioka, Nobuyuki / Aoyama, Satoshi / Hayashi, Atsushi / Sasaki, Takaei / Iso, Michael H. / Tokoro, Yasuo et al. | 1997
- 206
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Dry etching with consideration to thicker reticle size [3096-16]Hoshino, E. / Hasegawa, H. / Shishido, K. / Yoshioka, N. / SPIE / BACUS / Photomask Japan et al. | 1997
- 212
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Development of a new pellicle for use with the new generation reticleKondou, Masahiro / Tsumoto, T. / Hayashi, Tadaaki / Nagarekawa, Osamu et al. | 1997
- 212
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Development of a new pellicle for use with the new generation reticle [3096-17]Kondou, M. / Tsumoto, T. / Hayashi, T. / Nagarekawa, O. / SPIE / BACUS / Photomask Japan et al. | 1997
- 230
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Current status of the SR stepper developmentMizusawa, Nobutoshi / Watanabe, Yutaka / Hara, Shinichi / Saitoh, Kenji / Maehara, Hiroshi / Amemiya, Mitsuaki / Uzawa, Shunichi et al. | 1997
- 230
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Current status of the SR stepper development (Invited Paper) [3096-18]Mizusawa, N. / Watanabe, Y. / Hara, S. / Saitoh, K. / SPIE / BACUS / Photomask Japan et al. | 1997
- 240
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Antireflection and opaque coating film materials for Ta/SiC x-ray masks [3096-19]Iba, Y. / Kumasaka, F. / Aoyama, H. / Taguchi, T. / SPIE / BACUS / Photomask Japan et al. | 1997
- 240
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Antireflection and opaque coating film materials for Ta/SiC x-ray masksIba, Yoshihisa / Kumasaka, Fumiaki / Aoyama, Hajime / Taguchi, Takao / Yamabe, Masaki et al. | 1997
- 245
-
Improving stress stability of Ta film for x-ray mask absorbers [3096-20]Oda, M. / Sakatani, M. / Uchiyama, S. / Matsuda, T. / SPIE / BACUS / Photomask Japan et al. | 1997
- 245
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Improving stress stability of Ta film for x-ray mask absorbersOda, Masatoshi / Sakatani, Miho / Uchiyama, Shingo / Matsuda, Tadahito et al. | 1997
- 251
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Silicon projection mask-making technology for e-beam lithography [3096-21]Amemiya, I. / Ohhashi, K. / Yasumatsu, S. / Matsui, S. / SPIE / BACUS / Photomask Japan et al. | 1997
- 251
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Silicon projection mask-making technology for e-beam lithographyAmemiya, Isao / Ohhashi, Kazuhiro / Yasumatsu, S. / Matsui, Shigekazu / Nagarekawa, Osamu et al. | 1997
- 260
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Analysis of x-ray mask distortion [3096-36]Tanaka, Y. / Yoshihara, T. / Tsuboi, S. / Fujii, K. / SPIE / BACUS / Photomask Japan et al. | 1997
- 260
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Analysis of x-ray mask distortionTanaka, Yuusuke / Yoshihara, Takuya / Tsuboi, Shinji / Fujii, Kiyoshi / Suzuki, Katsumi et al. | 1997
- 269
-
Repairing Ta absorber x-ray masks with gas-assisted focused-ion-beam etchingOkada, Ikuo / Saitoh, Yasunao / Hamashima, Makoto / Sekimoto, Misao / Matsuda, Tadahito et al. | 1997
- 269
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Repairing Ta absorber x-ray masks with gas-assisted focused-ion-beam etching [3096-38]Okada, I. / Saitoh, Y. / Hamashima, M. / Sekimoto, M. / SPIE / BACUS / Photomask Japan et al. | 1997
- 275
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Mask bias effects in e-beam cell-projection lithography [3096-39]Ema, T. / Yamashita, H. / Nakajima, K. / Nozue, H. / SPIE / BACUS / Photomask Japan et al. | 1997
- 275
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Mask bias effects in e-beam cell projection lithographyEma, Takahiro / Yamashita, Hiroshi / Nakajima, Ken / Nozue, Hiroshi et al. | 1997
- 286
-
ArF excimer-laser exposure durability of chromium-fluoride-attenuated phase-shift masks [3096-22]Seki, Y. / Ushioda, J. / Saito, T. / Maeda, K. / SPIE / BACUS / Photomask Japan et al. | 1997
- 286
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ArF excimer-laser exposure durability of chromium-fluoride-attenuated phase-shift masksSeki, Yuko / Ushioda, Jun / Saito, Takashi / Maeda, Katsumi / Nakano, Kaichiro / Iwasa, Shigeyuki / Ohfuji, Takeshi / Tanabe, Hiroshi et al. | 1997
- 294
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Stability of CrFx films for phase-shifting maskKim, Eunah / Hong, Seungbum / Jiang, Zhong-Tao / Lim, Sung-Chul / Woo, Sang-Gyun / Koh, Young-Bum / No, Kwangsoo et al. | 1997
- 294
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Stability of CrF~x films for phase-shifting mask [3096-23]Kim, E. / Hong, S. / Jiang, Z.-T. / Lim, S. / SPIE / BACUS / Photomask Japan et al. | 1997
- 298
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Effect of lens aberration on hole pattern fabrication using halftone phase-shifting masks [3096-24]Otaka, A. / Kawai, Y. / Sakakibara, Y. / SPIE / BACUS / Photomask Japan et al. | 1997
- 298
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Effect of lens aberration on hole pattern fabrication using halftone phase-shifting masksOtaka, Akihiro / Kawai, Yoshio / Sakakibara, Yutaka et al. | 1997
- 308
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Development of focused-ion-beam repair for quartz defects on alternating phase-shift masksMatsumoto, Masami / Abe, Tsukasa / Yokoyama, Toshifumi / Miyashita, Hiroyuki / Hayashi, Naoya / Sano, Hisatake et al. | 1997
- 308
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Development of focused-ion-beam repair for quartz defects on alternating phase-shift masks [3096-25]Matsumoto, M. / Abe, T. / Yokoyama, T. / Miyashita, H. / SPIE / BACUS / Photomask Japan et al. | 1997
- 322
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Chemically enhanced focused-ion-beam (FIB) repair of opaque defects on chrome photomasks [3096-26]Casey, J. D. / Doyle, A. F. / Stewart, D. K. / Ferranti, D. C. / SPIE / BACUS / Photomask Japan et al. | 1997
- 322
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Chemically enhanced focused-ion-beam (FIB) repair of opaque defects on chrome photomasksCasey, J. David / Doyle, Andrew F. / Stewart, Diane K. / Ferranti, David C. et al. | 1997
- 333
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Large assist feature phase-shift mask for sub-quarter-micrometer window pattern formation [3096-40]Ishida, S. / Yasuzato, T. / Tanabe, H. / Kasama, K. / SPIE / BACUS / Photomask Japan et al. | 1997
- 333
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Large assist feature phase-shift mask for sub-quarter-micrometer window pattern formationIshida, Shinji / Yasuzato, Tadao / Tanabe, Hiroyoshi / Kasama, Kunihiko et al. | 1997
- 344
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Leaking light through embedded shifter-type opaque ring for attenuated phase-shift maskHirooka, Shoichi / Hasebe, Shigeru / Tsutsui, Tomohiro / Nojima, Shigeki / Aoyama, Hisako / Watanabe, Hidehiro et al. | 1997
- 344
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Leaking light through embedded shifter-type opaque ring for attenuated phase-shift mask [3096-42]Hirooka, S. / Hasebe, S. / Tsutsui, T. / Nojima, S. / SPIE / BACUS / Photomask Japan et al. | 1997
- 354
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Zr-based films for attenuated phase-shift mask [3096-43]Matsuo, T. / Ohkubo, K. / Haraguchi, T. / Ueyama, K. / SPIE / BACUS / Photomask Japan et al. | 1997
- 354
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Zr-based films for attenuated phase-shift maskMatsuo, Tadashi / Ohkubo, Kinji / Haraguchi, Takashi / Ueyama, Kohsuke et al. | 1997
- 362
-
Proposal for pattern layout rule in application of alternating phase-shift mask [3096-44]Nakae, A. / Nakao, S. / Matsui, Y. / SPIE / BACUS / Photomask Japan et al. | 1997
- 362
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Proposal for pattern layout rule in application of alternating phase-shift maskNakae, Akihiro / Nakao, Shuji / Matsui, Yasuji et al. | 1997
- 375
-
Effect of phase error on 180-nm and 250-nm grouped-line KrF lithography using an alternating phase-shift mask [3096-45]Petersen, J. S. / Williams, A. M. / Rich, G. K. / Miller, D. A. / SPIE / BACUS / Photomask Japan et al. | 1997
- 375
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Effect of phase error on 180-nm and 250-nm grouped-line KrF lithography using an alternating phase-shift maskPetersen, John S. / Williams, Alvina M. / Rich, Georgia K. / Miller, Daniel A. / Martinez, Arturo M. et al. | 1997
- 383
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0.35-m i-line attenuated phase-shift mask (PSM) repair by focused-ion-beam technology [3096-46]Raphaelian, M. L. / Ellis, M. / Ferranti, D. C. / Stewart, D. K. / SPIE / BACUS / Photomask Japan et al. | 1997
- 383
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0.35-μm i-line attenuated phase-shift mask (PSM) repair by focused-ion-beam technologyRaphaelian, Mark L. / Ellis, M. F. / Ferranti, David C. / Stewart, Diane K. et al. | 1997
- 398
-
Focused-ion-beam (FIB) etching of quartz and carbon for Levenson mask repairNakamura, Hiroko / Komano, Haruki / Higashikawa, Iwao et al. | 1997
- 398
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Focused-ion-beam (FIB) etching of quartz and carbon for Levenson mask repair [3096-47]Nakamura, H. / Komano, H. / Higashikawa, I. / SPIE / BACUS / Photomask Japan et al. | 1997
- 404
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Performance of cell-shift defect inspection technique [3096-27]Morikawa, Y. / Ogawa, T. / Tsuchiya, K. / Noguchi, S. / SPIE / BACUS / Photomask Japan et al. | 1997
- 404
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Performance of cell-shift defect inspection techniqueMorikawa, Yasutaka / Ogawa, Takashi / Tsuchiya, Katsuhide / Noguchi, Shigeru / Nakashima, Katsuyoshi et al. | 1997
- 415
-
New die-to-database mask inspection system with i-line optics for 256-Mb and 1-Gb DRAMsTabata, Mitsuo / Yamashita, Kyoji / Tsuchiya, Hideo / Nomura, Takehiko / Inoue, Hiromu / Watanabe, Tomohide / Tojo, Toru / Yoshino, Hisakazu et al. | 1997
- 415
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New die-to-database mask inspection system with i-line optics for 256-Mb and 1-Gb DRAMs [3096-28]Tabata, M. / Yamashita, K. / Tsuchiya, H. / Nomura, T. / SPIE / BACUS / Photomask Japan et al. | 1997
- 423
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Application of image-processing software to characterize the photomask key parameters for future technologies [3096-30]Tran, A. / Schmidt, M. R. / Farnsworth, J. N. / Yan, P.-Y. / SPIE / BACUS / Photomask Japan et al. | 1997
- 423
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Application of image-processing software to characterize the photomask key parameters for future technologiesTran, An / Schmidt, Michael R. / Farnsworth, Jeff N. / Yan, Pei-yang et al. | 1997
- 433
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Advanced mask metrology system for up to 4-Gb DRAMOtotake, Taro / Matsubara, Eiji / Hosoi, Keiichi et al. | 1997
- 433
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Advanced mask metrology system for up to 4-Gb DRAM [3096-31]Ototake, T. / Matsubara, E. / Hosoi, K. / SPIE / BACUS / Photomask Japan et al. | 1997
- 445
-
Characterization of an advanced performance reticle defect inspection algorithmWiley, James N. / Aquino, Christopher M. / Burnham, Douglas V. / Vacca, Anthony et al. | 1997
- 445
-
Characterization of an advanced-performance reticle defect inspection algorithm [3096-48]Wiley, J. N. / Aquino, C. / Burnham, D. V. / Vacca, A. / SPIE / BACUS / Photomask Japan et al. | 1997
- 462
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Image sensing method and defect detection algorithm for a 256-Mb and 1-Gb DRAM mask inspection system [3096-49]Inoue, H. / Okuda, K. / Nomura, T. / Tsuchiya, H. / SPIE / BACUS / Photomask Japan et al. | 1997
- 462
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Image sensing method and defect detection algorithm for a 256-Mb and 1-Gb DRAM mask inspection systemInoue, Hiromu / Okuda, Kentaro / Nomura, Takehiko / Tsuchiya, Hideo / Tabata, Mitsuo et al. | 1997
- 470
-
Database inspection capability for the high-grade device [3096-50]Park, N.-K. / Bae, H.-S. / Chang, J. / Yoo, S.-W. / SPIE / BACUS / Photomask Japan et al. | 1997
- 470
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Database inspection capability for the high-grade devicePark, NamKyu / Bae, Hwa-Sup / Chang, Jong-woon / Yoo, Seung-Woo et al. | 1997
- 480
-
Real-time line-width measurements: a new feature for reticle inspection systemsEran, Yair / Greenberg, Gad / Joseph, Amnon / Lustig, Cornel / Mizrahi, Eyal et al. | 1997
- 480
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Real-time line-width measurements: a new feature for reticle inspection systems [3096-51]Eran, Y. / Greenberg, G. / Joseph, A. / Lustig, C. / SPIE / BACUS / Photomask Japan et al. | 1997
- 492
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Evaluation results of the novel reticle pattern defect inspection system for 1-Gb deviceAwamura, Daikichi / Nakashima, Katsuyoshi / Hada, Yasunori / Matsuyama, Takayoshi / Kobayashi, Kenichi et al. | 1997