Fabrication of polycrystalline diamond film resonators [3511-17] (English)
- New search for: Wang, X.
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- New search for: Xie, J.
- New search for: Wang, W.
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- New search for: Wang, X.
- New search for: Yang, Y.
- New search for: Xie, J.
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In:
Micromachining and microfabrication process technology
3511
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169-173
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1998
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ISBN:
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ISSN:
- Conference paper / Print
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Title:Fabrication of polycrystalline diamond film resonators [3511-17]
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Contributors:
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Conference:Meeting; 4th, Micromachining and microfabrication process technology ; 1998 ; Santa Clara; CA
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Published in:Micromachining and microfabrication process technology , 3511 ; 169-173PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING , 3511 ; 169-173
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Publisher:
- New search for: SPIE
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Publication date:1998-01-01
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Size:5 pages
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ISBN:
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ISSN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
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Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 2
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Microassembly technologies for MEMS [3511-200]Cohn, M. B. / Boehringer, K. F. / Noworolski, J. M. / Singh, A. / SPIE et al. | 1998
- 2
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Microassembly technologies for MEMSCohn, Michael B. / Boehringer, Karl F. / Noworolski, J. Mark / Singh, Angad / Keller, Chris G. / Goldberg, Kenneth A. / Howe, Roger T. et al. | 1998
- 17
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Finding markets for microstructuresKnutti, James W. et al. | 1998
- 17
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Finding markets for microstructures [3511-201]Knutti, J. W. / SPIE et al. | 1998
- 24
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Micromachining technologies for miniaturized communication devices [3511-202]Nguyen, C. T.-C. / SPIE et al. | 1998
- 24
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Micromachining technologies for miniaturized communication devicesNguyen, Clark T. et al. | 1998
- 40
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Converting MEMS technology into profitsBryzek, Janusz et al. | 1998
- 40
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Converting MEMS technology into profits [3511-01]Bryzek, J. / SPIE et al. | 1998
- 50
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Microstructures fabricated by laser-induced polymerizationHuang, Xinming / Warrington, Robert O. / Friedrich, Craig R. et al. | 1998
- 50
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Microstructures fabricated by laser-induced polymerization [3511-02]Huang, X. / Warrington, R. O. / Friedrich, C. R. / SPIE et al. | 1998
- 56
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NC-controlled production of smooth 3D surfaces in brittle materials with 193-nm excimer laserToenshoff, Hans K. / Graumann, Christoph / Hesener, Hanno / Rinke, Marcus et al. | 1998
- 56
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NC-controlled production of smooth 3D surfaces in brittle materials with 193-nm excimer laser [3511-03]Toenshoff, H. K. / Graumann, C. / Hesener, H. / Rinke, M. / SPIE et al. | 1998
- 67
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Fabrication of binary microlens array by excimer laser micromachining [3511-04]Lin, F. H. H. / Huang, J. H. / Chou, E. H. Y. / Yang, C. R. / SPIE et al. | 1998
- 67
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Fabrication of binary microlens array by excimer laser micromachiningLin, Frank H. S. / Huang, J. H. / Chou, Eric H. Y. / Yang, Chii-Rong / Chou, Bruce C. S. / Luo, Roger G. S. / Kuo, Wen-Kai / Chang, Jer-Wei / Lu, Mao-Hong / Huang, Wen-Hsiung et al. | 1998
- 74
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Fabrication of ordered nanostructure based on anodic porous aluminaMasuda, Hideki / Nakao, Masashi / Tamamura, Toshiaki / Asoh, Hidetaka et al. | 1998
- 74
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Fabrication of ordered nanostructure based on anodic porous alumina (Invited Paper) [3511-05]Masuda, H. / Nakao, M. / Tamamura, T. / Asoh, H. / SPIE et al. | 1998
- 82
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Galvanic etching of siliconAshruf, Colin M. A. / French, Patrick J. / Sarro, Pasqualina M. / Kelly, John J. et al. | 1998
- 82
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Galvanic etching of silicon [3511-06]Ashruf, C. M. A. / French, P. J. / Sarro, P. M. / Kelly, J. J. / SPIE et al. | 1998
- 88
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Diffusion-induced dislocations in highly boron-doped silicon layers used for bulk micromachining applications [3511-07]Gaiseanu, F. / Esteve, J. / Kissinger, G. / Kruger, D. / SPIE et al. | 1998
- 88
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Diffusion-induced dislocations in highly boron-doped silicon layers used for bulk micromachining applicationsGaiseanu, Florin / Esteve, Jaume / Kissinger, Gudrun / Kruger, D. et al. | 1998
- 97
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Advanced silicon trench etching in MEMS applicationsKuehl, Karl / Vogel, Steffan / Schaber, Ulrich / Schafflik, Rainer / Hillerich, Bernhard et al. | 1998
- 97
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Advanced silicon trench etching in MEMS applications [3511-09]Kuehl, K. / Vogel, S. / Schaber, U. / Schafflik, R. / SPIE et al. | 1998
- 108
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Antistiction coatings for surface micromachines (Invited Paper) [3511-10]Maboudian, R. / SPIE et al. | 1998
- 108
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Antistiction coatings for surface micromachinesMaboudian, Roya et al. | 1998
- 114
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Thin Teflon-like films for MEMS: film properties and reliability studies [3511-11]Smith, B. K. / Brown, C. D. / LaVigne, G. / Sniegowski, J. J. / SPIE et al. | 1998
- 114
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Thin Teflon-like films for MEMS: film properties and reliability studiesSmith, Bradley K. / Brown, Craig D. / LaVigne, Glen / Sniegowski, Jeffry J. et al. | 1998
- 125
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High-yield assembly of hinged 3D optical MEMS devices using magnetic actuation [3511-12]Yi, Y. / Liu, C. / SPIE et al. | 1998
- 125
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High-yield assembly of hinged 3D optical MEMS devices using magnetic actuationYi, Yong / Liu, Chang et al. | 1998
- 135
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Automatic microassembly of radar sensors for automotive applicationsNienhaus, Matthias / Ehrfeld, Wolfgang / Michel, Frank / Graeff, V. / Wolf, Andrej et al. | 1998
- 135
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Automatic microassembly of radar sensors for automotive applications [3511-13]Nienhaus, M. / Ehrfeld, W. / Michel, F. / Graeff, V. / SPIE et al. | 1998
- 143
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Silicon surface micromachining by anhydrous HF gas-phase etching with methanol [3511-14]Jang, W. I. / Choi, C. A. / Lee, C. S. / Hong, Y. S. / SPIE et al. | 1998
- 143
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Silicon surface micromachining by anhydrous HF gas-phase etching with methanolJang, Won-Ick / Choi, Chang-Auck / Lee, Chang S. / Hong, Yoonshik / Lee, Jong-Hyun / Baek, Jong T. / Kim, Bo Woo et al. | 1998
- 152
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Silicon microlenses for IR image sensors (Invited Paper) [3511-15]Ravindra, N. M. / Tong, F. M. / Pattnaik, D. K. / Ivanov, D. / SPIE et al. | 1998
- 152
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Silicon microlenses for IR image sensorsRavindra, Nuggehalli M. / Tong, Fei Ming / Pattnaik, Dhiren K. / Ivanov, Dentcho I. / Levy, Roland A. / Aryusook, K. / Patel, Vipulkumar et al. | 1998
- 162
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Combining the best of bulk and surface micromachining using Si (111) substratesFleming, James G. et al. | 1998
- 162
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Combining the best of bulk and surface micromachining using Si {111} substrates [3511-16]Fleming, J. G. / SPIE et al. | 1998
- 169
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Fabrication of polycrystalline diamond film resonators [3511-17]Wang, X. / Yang, Y. / Xie, J. / Wang, W. / SPIE et al. | 1998
- 169
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Fabrication of polycrystalline diamond film resonatorsWang, Xiaodong / Yang, Yirong / Xie, Jianfang / Wang, Weiyuan / Ren, Zongxin et al. | 1998
- 174
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Growth and characterization of shape memory alloy thin films for micropositioning and microactuationDavies, Sam T. / Tsuchiya, Kazuyoshi et al. | 1998
- 174
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Growth and characterization of shape memory alloy thin films for micropositioning and microactuation [3511-18]Davies, S. T. / Tsuchiya, K. / SPIE et al. | 1998
- 183
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Novel fabrication of comb actuator using RIE of polysilicon and (110) Si anisotropic bulk etching in KOHLim, Hyung-Taek / Kim, Yong-Kweon et al. | 1998
- 183
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Novel fabrication of comb actuator using RIE of polysilicon and (110) Si anisotropic bulk etching in KOH [3511-19]Lim, H.-T. / Kim, Y.-K. / SPIE et al. | 1998
- 192
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Advances in LIGA-based post-mold fabrication (Invited Paper) [3511-20]Christenson, T. R. / SPIE et al. | 1998
- 192
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Advances in LIGA-based post mold fabricationChristenson, Todd R. et al. | 1998
- 204
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Fabrication of miniaturized biotechnical devices [3511-21]Niggemann, M. / Ehrfeld, W. / Weber, L. / SPIE et al. | 1998
- 204
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Fabrication of miniaturized biotechnical devicesNiggemann, Monika / Ehrfeld, Wolfgang / Weber, Lutz et al. | 1998
- 214
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Uniform and simultaneous fabrication of high-precision and high-density orifice, channel, and reservoirs for ink-jet printheads [3511-22]Yoon, J.-B. / Lee, J.-D. / Han, C.-H. / Yoon, E. / SPIE et al. | 1998
- 214
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Uniform and simultaneous fabrication of high-precision and high-density orifice, channel, and reservoirs for ink-jet printheadsYoon, Jun-Bo / Lee, Jae-Duk / Han, Chul-Hi / Yoon, Euisik / Kim, Choong-Ki et al. | 1998
- 225
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Fabrication of freestanding microstructures using UV lithography and double-electroplating techniqueBaek, Chang-Wook / Kim, Yong-Kweon et al. | 1998
- 225
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Fabrication of freestanding microstructures using UV lithography and double-electroplating technique [3511-23]Baek, C.-W. / Kim, Y.-K. / SPIE et al. | 1998
- 233
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Novel and high-yield fabrication of electroplated 3D microcoils for MEMS and microelectronics [3511-24]Yoon, J.-B. / Han, C.-H. / Yoon, E. / Kim, C.-K. / SPIE et al. | 1998
- 233
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Novel and high-yield fabrication of electroplated 3D microcoils for MEMS and microelectronicsYoon, Jun-Bo / Han, Chul-Hi / Yoon, Euisik / Kim, Choong-Ki et al. | 1998
- 242
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High-aspect-ratio single-crystal Si microelectromechanical systemsWeigold, Jason W. / Pang, Stella W. et al. | 1998
- 242
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High-aspect-ratio single-crystal Si microelectromechanical systems (Invited Paper) [3511-25]Weigold, J. W. / Pang, S. W. / SPIE et al. | 1998
- 252
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Selective deep-Si-trench etching with dimensional controlShul, Randy J. / Willison, Christi L. / Zhang, Lei et al. | 1998
- 252
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Selective deep-Si-trench etching with dimensional control [3511-26]Shul, R. J. / Willison, C. G. / Zhang, L. / SPIE et al. | 1998
- 262
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Microfabricated silicon gas chromatographic microchannels: fabrication and performanceMatzke, Carolyn M. / Kottenstette, Richard J. / Casalnuovo, Stephen A. / Frye-Mason, Gregory C. / Hudson, Mary L. / Sasaki, Darryl Y. / Manginell, Ronald P. / Wong, C. Channy et al. | 1998
- 262
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Microfabricated silicon gas chromatographic microchannels: fabrication and performance [3511-27]Matzke, C. M. / Kottenstette, R. J. / Casalnuovo, S. A. / Frye-Mason, G. C. / SPIE et al. | 1998
- 269
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Microfabrication of membrane-based devices by HARSE and combined HARSE/wet etchingManginell, Ronald P. / Frye-Mason, Gregory C. / Schubert, W. K. / Shul, Randy J. / Willison, Christi L. et al. | 1998
- 269
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Microfabrication of membrane-based devices by HARSE and combined HARSE/wet etching [3511-28]Manginell, R. P. / Frye-Mason, G. C. / Schubert, W. K. / Shul, R. J. / SPIE et al. | 1998
- 277
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CMOS compatibiltity of high-aspect-ratio micromachining (HARM) in bonded silicon-on-insulator (BSOI)McNie, Mark E. / King, David O. et al. | 1998
- 277
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CMOS compatibiltity of high-aspect-ratio micromachining (HARM) in bonded silicon-on-insulator (BSOI) [3511-29]McNie, M. E. / King, D. O. / SPIE et al. | 1998
- 288
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Design criteria of buckling microbridges [3511-30]Fang, W. / Hu, H. / Lee, C.-H. / SPIE et al. | 1998
- 288
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Design criteria of buckling microbridgesFang, Weileun / Hu, Hsin-Hwa / Lee, Chun-Hsien et al. | 1998
- 297
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Planarization and trench filling on severe surface topography with thick photoresist for MEMSYoon, Jun-Bo / Oh, Gilbert Y. / Han, Chul-Hi / Yoon, Euisik / Kim, Choong-Ki et al. | 1998
- 297
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Planarization and trench filling on severe surface topography with thick photoresist for MEMS [3511-31]Yoon, J.-B. / Oh, G. Y. / Han, C.-H. / Yoon, E. / SPIE et al. | 1998
- 307
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Optical properties of micromachined polysilicon reflective surfaces with etching holes [3511-32]Zou, J. / Byrne, C. / Liu, C. / Brady, D. J. / SPIE et al. | 1998
- 307
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Optical properties of micromachined polysilicon reflective surfaces with etching holesZou, Jun / Byrne, Colin / Liu, Chang / Brady, David J. et al. | 1998
- 315
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Control and modeling of stress in multistacked polysilicon films considering oxidation effect [3511-33]Lee, C. S. / Jang, W. I. / Choi, C. A. / Hong, Y. S. / SPIE et al. | 1998
- 315
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Control and modeling of stress in multistacked polysilicon films considering oxidation effectLee, Chang S. / Jang, Won-Ick / Choi, Chang-Auck / Hong, Yoonshik / Lee, Jong-Hyun / No, Kwangsoo / Wee, Dang M. et al. | 1998
- 325
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MEMS assembly apparatus with a suction glass needle [3511-34]Lu, D. / Huang, H. / Shen, B. / Yang, L. / SPIE et al. | 1998
- 325
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MEMS assembly apparatus with a suction glass needleLu, Dunwu / Huang, Huijie / Shen, Beijun / Yang, Liangmin / Liu, Zengshui / Du, Longlong et al. | 1998
- 330
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Development of a microforming system using mold technology and cutting technology [3511-35]Aoki, I. / Takahashi, T. / SPIE et al. | 1998
- 330
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Development of a microforming system using mold technology and cutting technologyAoki, Isamu / Takahashi, Toshinori et al. | 1998
- 337
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Anisotropic etching of (111)-oriented silicon and applications [3511-36]Chou, B. C. S. / Chen, C.-N. / Shie, J.-S. / Huang, W.-H. / SPIE et al. | 1998
- 337
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Anisotropic etching of (111)-oriented silicon and applicationsChou, Bruce C. S. / Chen, Chun-Nan / Shie, Jin-Shown / Huang, Wen-Hsiung / Chen, Chien-Jen et al. | 1998
- 342
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PMMA microstructure as KrF excimer-laser LIGA material [3511-37]Yang, C. R. / Chou, B. C. S. / Chou, E. H. Y. / Lin, F. H. H. / SPIE et al. | 1998
- 342
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PMMA microstructure as KrF excimer-laser LIGA materialYang, Chii-Rong / Chou, Bruce C. S. / Chou, Hsiao-Yu / Lin, Frank H. S. / Kuo, Wen-Kai / Luo, Roger G. S. / Chang, Jer-Wei / Wei, Z. J. et al. | 1998
- 349
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Composite cantilever beam-mass structure gyroscope by a novel etching technologyLi, Xinxin / Bao, Minhang / Yang, Heng / Shen, Shaoqun / Wang, Weiyuan et al. | 1998
- 349
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Composite cantilever beam-mass structure gyroscope by a novel etching technology [3511-38]Li, X. / Bao, M. / Yang, H. / Shen, S. / SPIE et al. | 1998
- 357
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High-aspect-ratio fine-line metallizationChang, Chienliu / Chang, Peizen / Yen, Kaihsiang / Lu, Sheyshi et al. | 1998
- 357
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High-aspect-ratio fine-line metallization [3511-39]Chang, C. / Chang, P. / Yen, K. / Lu, S. / SPIE et al. | 1998
- 364
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Transport limitations in electrodeposition for LIGA microdevice fabrication [3511-40]Griffiths, S. K. / Nilson, R. H. / Bradshaw, R. W. / Ting, A. / SPIE et al. | 1998
- 364
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Transport limitations in electrodeposition for LIGA microdevice fabricationGriffiths, Stewart K. / Nilson, Robert H. / Bradshaw, R. W. / Ting, Aili / Bonivert, William D. / Hachman, John T. / Hruby, Jill M. et al. | 1998
- 376
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Microarray collimators for x rays and neutronsCimmino, Alberto / Allman, Brendan E. / Klein, Anthony G. / Hamilton, William A. / Anderson, Ian S. / Hamelin, Bernard / Hoghoj, Peter / Bastie, Pierre et al. | 1998
- 376
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Microarray collimators for x rays and neutrons [3511-42]Cimmino, A. / Allman, B. E. / Klein, A. G. / Hamilton, W. A. / SPIE et al. | 1998
- 385
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Photographic method for the fabrication of surface-relief diffractive optical elements [3511-46]Navarrete-Garcia, E. / Calixto, S. / SPIE et al. | 1998
- 385
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Photographic method for the fabrication of surface-relief diffractive optical elementsNavarrete-Garcia, Enrique / Calixto-Carrera, Sergio et al. | 1998
- 393
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Square microchannel arrays for focusing neutrons and x rays [3511-47]Cimmino, A. / Allman, B. E. / Brumby, S. P. / Irving, T. H. K. / SPIE et al. | 1998
- 393
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Square microchannel arrays for focusing neutrons and x raysCimmino, Alberto / Allman, Brendan E. / Brumby, Steven P. / Irving, Thomas H. K. / Klein, Anthony G. / Nugent, Keith A. / Anderson, Ian S. / Hoghoj, Peter / Peele, Andrew G. et al. | 1998