Optimisation of doped microcrystalline silicon films deposited at very low temperatures by hot-wire CVD (English)
- New search for: Voz, C.
- New search for: Peiro, D.
- New search for: Bertomeu, J.
- New search for: Soler, D.
- New search for: Fonrodona, M.
- New search for: Andreu, J.
- New search for: Voz, C.
- New search for: Peiro, D.
- New search for: Bertomeu, J.
- New search for: Soler, D.
- New search for: Fonrodona, M.
- New search for: Andreu, J.
- New search for: Thonissen, M.
- New search for: Nassiopoulou, A.
In:
Microcrystalline and nanocrystalline semiconductors
;
278-283
;
2000
-
ISSN:
- Conference paper / Print
-
Title:Optimisation of doped microcrystalline silicon films deposited at very low temperatures by hot-wire CVD
-
Contributors:Voz, C. ( author ) / Peiro, D. ( author ) / Bertomeu, J. ( author ) / Soler, D. ( author ) / Fonrodona, M. ( author ) / Andreu, J. ( author ) / Thonissen, M. / Nassiopoulou, A.
-
Conference:Symposium I, Microcrystalline and nanocrystalline semiconductors ; 1999 ; Strasbourg, France
-
Published in:MATERIALS SCIENCE AND ENGINEERING B ; 69-70 ; 278-283
-
Publisher:
- New search for: Elsevier
-
Publication date:2000-01-01
-
Size:6 pages
-
Remarks:Held as part of the European Materials Research Society 1999 Spring Meeting
-
ISSN:
-
Type of media:Conference paper
-
Type of material:Print
-
Language:English
-
Keywords:
-
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.