A study on stepper's performance enhancements (English)
- New search for: Mori, Ken-Ichiro
- New search for: Shigenobu, Atsushi
- New search for: Motojima, Junichi
- New search for: Suda, Hiromi
- New search for: Mori, Ken-Ichiro
- New search for: Shigenobu, Atsushi
- New search for: Motojima, Junichi
- New search for: Suda, Hiromi
In:
Optical Microlithography XXXII
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109610I-109610I-11
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2019
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ISBN:
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ISSN:
- Conference paper / Print
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Title:A study on stepper's performance enhancements
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Contributors:Mori, Ken-Ichiro ( author ) / Shigenobu, Atsushi ( author ) / Motojima, Junichi ( author ) / Suda, Hiromi ( author )
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Conference:Optical Microlithography XXXII
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Published in:Optical Microlithography XXXII ; 109610I-109610I-11Proceedings of SPIE, the International Society for Optical Engineering ; 10961 ; 109610I-109610I-11
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Publisher:
- New search for: SPIE
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Publication date:2019-01-01
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Size:109610I-109610I-11
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ISBN:
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ISSN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 109610A
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Improved wafer alignment model algorithm for better on-product overlayJeong, Ik-Hyun / Kim, Hyun-Sok / Kong, Yeong-Oh / Song, Ji-Hyun / Ju, Jae-Wuk / Kim, Young-Sik / Lambregts, Cees / Yu, Miao / Rahman, Rizvi / Karssemeijer, Leendertjan et al. | 2019
- 109610B
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Efficient search of layout hotspot patterns for matching SEM images using multilevel pixelationTseng, Sean Shang-En / Chang, Wei-Chun / Jiang, Iris Hui-Ru / Zhu, Jun / Shiely, James P. et al. | 2019
- 109610D
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Analytical solutions for the deformation of a photoresist filmGranik, Yuri et al. | 2019
- 109610F
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Compact modeling of negative tone development resist with photo decomposable quencherChen, Ao / Koh, Kar Kit / Foong, Yee Mei / Morgenfeld, Bradley / Chen, Jun / Lee, Sandra / Chen, Xi / Omar, Hesham / Feng, Mu / Wang, ChangAn et al. | 2019
- 109610G
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Improved validation and optimization of physics-based NTD compact modeling flowsLatinwo, Folarin / Yang, Delian / Wu, Cheng-En (Rich) / Brooker, Peter / Chen, Yulu / Song, Hua / Lucas, Kevin et al. | 2019
- 109610H
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Thin film characterization for advanced patterningZhu, Zhimin / Ye, Xianggui / Simmons, Sean / Frank, Catherine / Limmer, Tim / Lamb, James et al. | 2019
- 109610I
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A study on stepper's performance enhancementsMori, Ken-Ichiro / Shigenobu, Atsushi / Motojima, Junichi / Suda, Hiromi et al. | 2019
- 109610K
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Holistic feedforward control for the 5 nm logic node and beyondMegens, Henry / Brinkhof, Ralph / Aarts, Igor / Kok, Haico / Karssemeijer, Leendertjan / ten Haaf, Gijs / Lee, Shawn / Slotboom, Daan / de Ruiter, Chris / Lyulina, Irina et al. | 2019
- 109610M
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Automatic parameter setting for lens aberration control during product lot exposureKanakutsu, Yutaka / Koizumi, Yukio / Ikezawa, Hironori / Eto, Shigeru / Ikeda, Junji / Takeuchi, Takenori / Matsuyama, Tomoyuki / Stan, Edward / Hiltunen, Ronald et al. | 2019
- 109610N
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Metrology and deep learning integrated solution to drive OPC model accuracy improvementYuan, Wei / Lu, Yifei / Zhao, Yuhang / Chen, Shoumian / Li, Ming / Hu, Hongmei / Yao, Shuxin / Liu, Zhunhua / Li, Qiaoqiao / Tian, Yu et al. | 2019
- 109610O
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Optimal feature vector design for computational lithographyShi, Xuelong / Zhao, YuHang / Cheng, Shoumian / Li, Ming / Yuan, Wei / Yao, Leon / Zhao, Wenhao / Xiao, Yanjun / Kang, Xiaohui / Li, Angmar et al. | 2019
- 109610P
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SRAF rule extraction and insertion based on inverse lithography technologySu, Xiaojing / Gao, Pengzheng / Wei, Yayi / Shi, Weijie et al. | 2019
- 109610R
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Localized source and mask optimization with narrow-band level-set methodShen, Yijiang et al. | 2019
- 109610S
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An OPC approach to improve logic gate features corner fidelityLin, Ping-Hung / Chao, Tzu-Chi / Yeh, Shin-Shing / Mai, Yung-Ching / Lin, Lawrence / Lai, Nelson et al. | 2019
- 109610T
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A programmable UVLED array with a collimated optics as transform lens as light field adjustable sourceHuang, Jiun-Woei et al. | 2019
- 109610V
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Modeling of dynamic image performance for lithographic projection lensYang, Zhiyong / Shi, Yating / Jiang, Hao / Liu, Shiyuan et al. | 2019
- 109610X
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Extremely long life excimer laser chamber technology for multi-patterning lithographyTsushima, Hiroaki / Fujimaki, Yousuke / Kiyota, Yasuaki / Tanaka, Makoto / Itou, Takashi / Asayama, Takeshi / Kurosu, Akihiko / Tanaka, Satoshi / Ohta, Takeshi / Bushida, Satoru et al. | 2019
- 109610Z
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Robust alignment mark design for DRAM using a holistic computational approachLi, Danying / Zhang, Stella / Chen, Chia-Huang / Zhang, Youping / Huang, Alex / Xu, David / Wang, Yufeng / Shi, Zhen / Wang, Shi-lu / Tsao, Sheng-Tsung et al. | 2019
- 1096101
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Front Matter: Volume 10961| 2019
- 1096105
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Automatic correction of lithography hotspots with a deep generative modelSim, Woojoo / Lee, Kibok / Yang, Dingdong / Jeong, Jaeseung / Hong, Ji-Suk / Lee, Sooryong / Lee, Honglak et al. | 2019
- 1096106
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Predictable etch model using machine learningKim, Youngchang / Jung, Sunwook / Kwak, DooHwan / Liubich, Vlad / Fenger, Germain et al. | 2019
- 1096107
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Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learningChien, Sheng-Wei / Cai, Jia-Syun / Lee, Chien-Lin / Tsai, Kuen-Yu / Shiely, James / St. John, Matt et al. | 2019
- 1096109
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Pairing wafer leveling metrology from a lithographic apparatus with deep learning to enable cost effective dense wafer alignment metrologySchmitt-Weaver, Emil / Bhattacharyya, Kaustuve et al. | 2019
- 1096110
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Improvement of spectrum measurement accuracy by high resolution spectrometer for DUV laserHattori, Masakazu / Hu, Sophia / Kudo, Takehito / Oga, Toshihiri / Mizoguchi, Hakaru et al. | 2019