Influence of chemical effect on the K-to-K X-ray intensity ratios of Ti,V, Cr and Fe in TiC,VC, CrB, CrB~2 and FeB (English)
- New search for: Raj, S.
- New search for: Padhi, H. C.
- New search for: Polasik, M.
- New search for: Raj, S.
- New search for: Padhi, H. C.
- New search for: Polasik, M.
In:
NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH SECTION B
;
145
, 4
;
485-491
;
1998
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ISSN:
- Article (Journal) / Print
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Title:Influence of chemical effect on the K-to-K X-ray intensity ratios of Ti,V, Cr and Fe in TiC,VC, CrB, CrB~2 and FeB
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Contributors:
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Published in:NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH SECTION B ; 145, 4 ; 485-491
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Publisher:
- New search for: ELSEVIER
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Publication date:1998-01-01
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Size:7 pages
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ISSN:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 539.7
- Further information on Dewey Decimal Classification
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Classification:
DDC: 539.7 -
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents – Volume 145, Issue 4
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 485
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Influence of chemical effect on the Kb-to-Ka X-ray intensity ratios of Ti,V, Cr and Fe in TiC,VC, CrB, CrB2 and FeBRaj, S. et al. | 1998
- 485
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Influence of chemical effect on the K-to-K X-ray intensity ratios of Ti,V, Cr and Fe in TiC,VC, CrB, CrB~2 and FeBRaj, S. / Padhi, H. C. / Polasik, M. et al. | 1998
- 492
-
Depth of origin of sputtered atoms for elemental targetsShulga, V.I. et al. | 1998
- 503
-
Ta cluster bombardment of graphite: molecular dynamics study of penetration and damageHenkel, M. et al. | 1998
- 509
-
Near-surface K-Auger emission in low-energy scattering of highly charged ions with surfacesDucrée, J. et al. | 1998
- 522
-
Ion-beam densification of hydroxyapatite thin filmsLopatin, C.M. et al. | 1998
- 532
-
High resolution transmission electron microscopy of GeV heavy ion irradiated graphiteDunlop, A. et al. | 1998
- 539
-
Characteristics of PIXEchanneling and its application to ZnSe thin filmsSalonen, R. et al. | 1998
- 545
-
Comparative analysis of the low-energy He+ions scattering on Al and Al2O3 surfacesFomin, V.M. et al. | 1998
- 553
-
Depth profiling of hydrogen in amorphous media and applicable to quartz air filtersCastaneda, Carlos M. et al. | 1998
- 562
-
Oxygen profiling in Czochralski-grown silicon substrates submitted to a rapid thermal annealing by using charged particles activation analysisErramli, H. et al. | 1998
- 567
-
Energy dependence of X-ray capillary performanceSánchez, Héctor Jorge et al. | 1998
- 573
-
Comparison of the least squares and the maximum likelihood estimators for gamma-spectrometryMuravsky, V.A. et al. | 1998
- 578
-
Evaluation of non-Rutherford proton elastic scattering cross section for siliconGurbich, A.F. et al. | 1998